Inventor · disambiguated record
Jozef Petrus Henricus Benschop
Also filed as: BENSCHOP JOZEF P H · BENSCHOP JOZEF PETRUS HENRICUS · BENSHOP JOZEF P H
32 granted patents·2 pending applications·546 citations·filing 1987–2024
97Inventor score
Top patents by PatentIndex Score
34 records- 0199US7161659B2Dual stage lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Jan 9, 2007·271 cites·14 claims
- 0297US10228615B2Membranes for use within a lithographic apparatus and a lithographic apparatus comprising such a membraneASML NETHERLANDS BV·Filed 2015·Granted Mar 12, 2019·17 cites·28 claims
- 0397US9335638B2Lithographic apparatus, programmable patterning device and lithographic methodASML NETHERLANDS BV·Filed 2013·Granted May 10, 2016·19 cites·24 claims
- 0496US11194256B2Optical diffraction component for suppressing at least one target wavelength by destructive interferenceZEISS CARL SMT GMBH·Filed 2020·Granted Dec 7, 2021·5 cites·20 claims
- 0596US10698312B2Membranes for use within a lithographic apparatus and a lithographic apparatus comprising such a membraneASML NETHERLANDS BV·Filed 2019·Granted Jun 30, 2020·8 cites·23 claims
- 0695US8842293B2Level sensor arrangement for lithographic apparatus and device manufacturing methodDEN BOEF ARIE JEFFREY·Filed 2010·Granted Sep 23, 2014·16 cites·15 claims
- 0794US8531648B2Lithographic apparatus, programmable patterning device and lithographic methodDE JAGER PIETER WILLEM HERMAN·Filed 2009·Granted Sep 10, 2013·25 cites·34 claims
- 0891USRE43576EDual stage lithographic apparatus and device manufacturing methodVAN DEN BRINK MARINUS AART·Filed 2009·Granted Aug 14, 2012·10 cites·33 claims
- 0991US7760324B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Jul 20, 2010·19 cites·15 claims
- 1087US10852640B2Optical diffraction component for suppressing at least one target wavelength by destructive interferenceZEISS CARL SMT GMBH·Filed 2020·Granted Dec 1, 2020·2 cites·31 claims
- 1186US4845352AScanning differential phase contrast microscopePHILIPS CORP·Filed 1987·Granted Jul 4, 1989·55 cites·7 claims
- 1285US12500063B2Method and apparatus for inspectionASML NETHERLANDS BV·Filed 2024·Granted Dec 16, 2025·0 cites·20 claims
- 1382US5854780AOptical scanning device using a plurality of scanning spotsPHILIPS CORP·Filed 1993·Granted Dec 29, 1998·33 cites·13 claims
- 1476USRE45576EDual stage lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted Jun 23, 2015·1 cites·34 claims
- 1574US11875966B2Method and apparatus for inspectionASML NETHERLANDS BV·Filed 2021·Granted Jan 16, 2024·0 cites·22 claims
- 1673US8654311B2Lithographic apparatus and device manufacturing methodSEWELL HARRY·Filed 2009·Granted Feb 18, 2014·3 cites·18 claims
- 1770US7173687B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2005·Granted Feb 6, 2007·2 cites·21 claims
- 1869US8339571B2Lithographic method and apparatusSEWELL HARRY·Filed 2008·Granted Dec 25, 2012·2 cites·38 claims
- 1967US6999161B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2003·Granted Feb 14, 2006·8 cites·21 claims
- 2066USRE47943EDual stage lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Apr 14, 2020·0 cites·35 claims
- 2165US8902403B2Lithographic apparatus and device manufacturing methodLEENDERS MARTINUS HENDRIKUS ANTONIUS·Filed 2011·Granted Dec 2, 2014·1 cites·23 claims
- 2261US5579298AOptical scanner having symmetry about an oblique dividerPHILIPS CORP·Filed 1996·Granted Nov 26, 1996·15 cites·21 claims
- 2359USRE46933EDual stage lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2015·Granted Jul 3, 2018·0 cites·34 claims
- 2458US11094502B2Method and apparatus for inspectionASML NETHERLANDS BV·Filed 2016·Granted Aug 17, 2021·0 cites·20 claims
- 2558US4861982AScanning optical microscope with position detection gratingPHILIPS CORP·Filed 1988·Granted Aug 29, 1989·21 cites·8 claims
- 2654US7394524B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2006·Granted Jul 1, 2008·0 cites·32 claims
- 2752US7110087B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Sep 19, 2006·2 cites·22 claims
- 2852US6597431B2Lithographic projection apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2001·Granted Jul 22, 2003·4 cites·16 claims
- 2948US2009225289A1Lithographic apparatus and methodsASML NETHERLANDS BV·Filed 2009·Application pending·0 cites
- 3046US6512732B1Device for optically scanning information tracks on a plane using two subbeamsKONINKL PHILIPS ELECTRONICS NV·Filed 1996·Granted Jan 28, 2003·7 cites·9 claims
- 3145US2006285097A1Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
- 3240US9304401B2Measurement of the position of a radiation beam spot in lithographyPEETERS FELIX GODFRIED PETER·Filed 2012·Granted Apr 5, 2016·0 cites·20 claims
- 3339US8675210B2Level sensor, lithographic apparatus, and substrate surface positioning methodDEN BOEF ARIE JEFFREY·Filed 2012·Granted Mar 18, 2014·0 cites·9 claims
- 3434US8941815B2Substrate table for a lithographic apparatus, lithographic apparatus, method of using a substrate table and device manufacturing methodLAFARRE RAYMOND WILHELMUS LOUIS·Filed 2010·Granted Jan 27, 2015·0 cites·21 claims
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