Inventor · disambiguated record
Johannes D. De Veer
Also filed as: DE VEER JOHANNES D
12 granted patents·238 citations·filing 2003–2020
91Inventor score
Top patents by PatentIndex Score
12 records- 0197US11309202B2Overlay metrology on bonded wafersKLA CORP·Filed 2020·Granted Apr 19, 2022·5 cites·39 claims
- 0296US9310290B2Multiple angles of incidence semiconductor metrology systems and methodsKLA TENCOR CORP·Filed 2015·Granted Apr 12, 2016·18 cites·35 claims
- 0396US9228943B2Dynamically adjustable semiconductor metrology systemKLA TENCOR CORP·Filed 2012·Granted Jan 5, 2016·31 cites·41 claims
- 0496US8860937B1Metrology systems and methods for high aspect ratio and large lateral dimension structuresKLA TENCOR CORP·Filed 2013·Granted Oct 14, 2014·35 cites·19 claims
- 0595US9404872B1Selectably configurable multiple mode spectroscopic ellipsometryWANG HAIMING·Filed 2012·Granted Aug 2, 2016·29 cites·30 claims
- 0694US6999180B1Optical film topography and thickness measurementKLA TENCOR TECH CORP·Filed 2003·Granted Feb 14, 2006·84 cites·22 claims
- 0793US8896832B2Discrete polarization scatterometryHILL ANDREW V·Filed 2011·Granted Nov 25, 2014·25 cites·35 claims
- 0888US9116103B2Multiple angles of incidence semiconductor metrology systems and methodsKLA TENCOR CORP·Filed 2013·Granted Aug 25, 2015·7 cites·34 claims
- 0968US8797534B2Optical system polarizer calibrationKLA TENCOR CORP·Filed 2013·Granted Aug 5, 2014·1 cites·20 claims
- 1066US9146156B2Light source tracking in optical metrology systemZHUANG GUORONG V·Filed 2011·Granted Sep 29, 2015·3 cites·21 claims
- 1144US10151631B2Spectroscopy with tailored spectral samplingKLA TENCOR CORP·Filed 2017·Granted Dec 11, 2018·0 cites·25 claims
- 1243US8570514B2Optical system polarizer calibrationDE VEER JOHANNES D·Filed 2011·Granted Oct 29, 2013·0 cites·1 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →