Inventor · disambiguated record
Joachim Hartjes
Also filed as: HARTJES JOACHIM
30 granted patents·5 pending applications·47 citations·filing 2007–2023
94Inventor score
Top patents by PatentIndex Score
35 records- 0192US8587767B2Illumination optics for EUV microlithography and related system and apparatusFIOLKA DAMIAN·Filed 2010·Granted Nov 19, 2013·12 cites·22 claims
- 0283US9207541B2Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2013·Granted Dec 8, 2015·6 cites·25 claims
- 0381US9134501B2Optical element unit and method of supporting an optical elementSCHAFFER DIRK·Filed 2007·Granted Sep 15, 2015·7 cites·42 claims
- 0477US9500957B2Arrangement for thermal actuation of a mirror in a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Nov 22, 2016·2 cites·24 claims
- 0575US9759550B2Projection exposure apparatus for microlithography comprising an optical distance measurement systemZEISS CARL SMT GMBH·Filed 2015·Granted Sep 12, 2017·2 cites·20 claims
- 0673US10012911B2Projection exposure apparatus with wavefront measuring device and optical wavefront manipulatorZEISS CARL SMT GMBH·Filed 2017·Granted Jul 3, 2018·1 cites·20 claims
- 0772US12339587B2Facet assembly for a facet mirrorZEISS CARL SMT GMBH·Filed 2022·Granted Jun 24, 2025·0 cites·21 claims
- 0872US9465208B2Facet mirror deviceZEISS CARL SMT GMBH·Filed 2013·Granted Oct 11, 2016·3 cites·25 claims
- 0971US12436361B2Projection exposure apparatus for semiconductor lithographyZEISS CARL SMT GMBH·Filed 2022·Granted Oct 7, 2025·0 cites·20 claims
- 1070US9846375B2Lithography apparatus with segmented mirrorZEISS CARL SMT GMBH·Filed 2014·Granted Dec 19, 2017·1 cites·17 claims
- 1168US12271117B2Support for an optical elementZEISS CARL SMT GMBH·Filed 2023·Granted Apr 8, 2025·0 cites·20 claims
- 1268US10146138B2Method for producing an optical element for an optical system, in particular for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2017·Granted Dec 4, 2018·1 cites·15 claims
- 1368US9063336B2Optical element having a plurality of reflective facet elementsKIRCH MARC·Filed 2012·Granted Jun 23, 2015·3 cites·29 claims
- 1465US8441747B2Optical module with minimized overrun of the optical elementHEINTEL WILLI·Filed 2007·Granted May 14, 2013·6 cites·15 claims
- 1564US11307503B2Support of an optical unitZEISS CARL SMT GMBH·Filed 2020·Granted Apr 19, 2022·0 cites·20 claims
- 1663US11054755B2Optical module with an anticollision device for module componentsZEISS CARL SMT GMBH·Filed 2019·Granted Jul 6, 2021·1 cites·20 claims
- 1762US9482959B2EUV microlithography illumination optical system and EUV attenuator for sameSCHMIDTS NICOLAS·Filed 2011·Granted Nov 1, 2016·2 cites·24 claims
- 1861US11320314B2Method and device for determining the heating state of an optical element in an optical system for microlithographyZEISS CARL SMT GMBH·Filed 2021·Granted May 3, 2022·0 cites·20 claims
- 1960US11467500B2Optical arrangement and method for repairing the optical arrangement after a shock loadZEISS CARL SMT GMBH·Filed 2020·Granted Oct 11, 2022·0 cites·19 claims
- 2058US10613443B2Optical system, lithography apparatus and methodZEISS CARL SMT GMBH·Filed 2019·Granted Apr 7, 2020·0 cites·20 claims
- 2158US10288894B2Optical component for use in a radiation source module of a projection exposure systemZEISS CARL SMT GMBH·Filed 2017·Granted May 14, 2019·0 cites·20 claims
- 2258US9671584B2Method and cooling system for cooling an optical element for EUV applicationsZEISS CARL SMT GMBH·Filed 2014·Granted Jun 6, 2017·0 cites·20 claims
- 2353US11137687B2Optical arrangement for EUV radiation with a shield for protection against the etching effect of a plasmaZEISS CARL SMT GMBH·Filed 2020·Granted Oct 5, 2021·0 cites·15 claims
- 2452US9599910B2Facet mirror deviceZEISS CARL SMT GMBH·Filed 2013·Granted Mar 21, 2017·0 cites·36 claims
- 2552US2022214627A1Assembly in an optical system, in particular of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2022·Application pending·0 cites
- 2651US10162270B2Projection exposure apparatus comprising a measuring system for measuring an optical elementZEISS CARL SMT GMBH·Filed 2014·Granted Dec 25, 2018·0 cites·25 claims
- 2749US2016109679A1Optical Element Unit And Method Of Supporting An Optical ElementZEISS CARL SMT GMBH·Filed 2015·Application pending·0 cites
- 2845US9423590B2Liquid cooled EUV reflectorZEISS CARL SMT GMBH·Filed 2013·Granted Aug 23, 2016·0 cites·11 claims
- 2944US8345219B2Method and apparatus for setting an illumination optical unitZEISS CARL SMT GMBH·Filed 2012·Granted Jan 1, 2013·0 cites·11 claims
- 3042US2012287414A1Facet mirror for use in microlithographyFIOLKA DAMIAN·Filed 2012·Application pending·0 cites
- 3141US2013182264A1Projection Exposure Tool for Microlithography and Method for Microlithographic ExposureHETZLER JOCHEN·Filed 2013·Application pending·0 cites
- 3239US8831170B2Mirror with a mirror carrier and projection exposure apparatusWEVERS RUTGER·Filed 2007·Granted Sep 9, 2014·0 cites·31 claims
- 3337US10162267B2Projection exposure apparatus including mechanism to reduce influence of pressure fluctuationsZEISS CARL SMT GMBH·Filed 2015·Granted Dec 25, 2018·0 cites·31 claims
- 3437US2011019171A1Optical unit having adjustable force action on an optical moduleZEISS CARL SMT AG·Filed 2010·Application pending·0 cites
- 3530US9684243B2Blocking element for protecting optical elements in projection exposure apparatusesZEISS CARL SMT GMBH·Filed 2015·Granted Jun 20, 2017·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →