Inventor · disambiguated record
Junichi Arami
Also filed as: ARAMI JUNICHI
38 granted patents·10 pending applications·3,376 citations·filing 1991–2024
98Inventor score
Top patents by PatentIndex Score
48 records- 0198US6156151APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1997·Granted Dec 5, 2000·498 cites·20 claims
- 0297US6035804AProcess chamber apparatusTOKYO ELECTRON LTD·Filed 1998·Granted Mar 14, 2000·452 cites·12 claims
- 0397US5958140AOne-by-one type heat-processing apparatusTOKYO ELECTRON LTD·Filed 1996·Granted Sep 28, 1999·297 cites·22 claims
- 0496US7273526B2Thin-film deposition apparatusASM JAPAN·Filed 2004·Granted Sep 25, 2007·90 cites·31 claims
- 0596US5591269AVacuum processing apparatusTOKYO ELECTRON LTD·Filed 1994·Granted Jan 7, 1997·337 cites·18 claims
- 0695US5575853AVacuum exhaust system for processing apparatusTOKYO ELECTRON LTD·Filed 1995·Granted Nov 19, 1996·210 cites·8 claims
- 0795US5542559APlasma treatment apparatusTOKYO ELECTRON LTD·Filed 1994·Granted Aug 6, 1996·254 cites·16 claims
- 0894US6014943APlasma process deviceTOKYO ELECTRON LTD·Filed 1997·Granted Jan 18, 2000·103 cites·12 claims
- 0990US5275683AMount for supporting substrates and plasma processing apparatus using the sameTOKYO ELECTRON LTD·Filed 1992·Granted Jan 4, 1994·122 cites·14 claims
- 1089US5660671AMagnetron plasma processing apparatus and processing methodTOKYO ELECTRON LTD·Filed 1994·Granted Aug 26, 1997·49 cites·5 claims
- 1189US5290381APlasma etching apparatusTOKYO ELECTRON LTD·Filed 1991·Granted Mar 1, 1994·116 cites·16 claims
- 1288US7717061B2Gas switching mechanism for plasma processing apparatusTOKYO ELECTRON LTD·Filed 2005·Granted May 18, 2010·20 cites·9 claims
- 1388US6764575B1Magnetron plasma processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Jul 20, 2004·36 cites·13 claims
- 1486US5539179AElectrostatic chuck having a multilayer structure for attracting an objectTOKYO ELECTRON LTD·Filed 1991·Granted Jul 23, 1996·96 cites·4 claims
- 1584US5904872AHeating device, method of manufacturing the same, and processing apparatus using the sameTOKYO ELECTRON LTD·Filed 1995·Granted May 18, 1999·72 cites·44 claims
- 1684US5250137APlasma treating apparatusTOKYO ELECTRON LTD·Filed 1991·Granted Oct 5, 1993·87 cites·12 claims
- 1783US5665260ACeramic electrostatic chuck with built-in heaterSHINETSU CHEMICAL CO·Filed 1994·Granted Sep 9, 1997·89 cites·6 claims
- 1882US5255153AElectrostatic chuck and plasma apparatus equipped therewithTOKYO ELECTRON LTD·Filed 1991·Granted Oct 19, 1993·78 cites·16 claims
- 1982US5240556ASurface-heating apparatus and surface-treating methodTOKYO ELECTRON LTD·Filed 1992·Granted Aug 31, 1993·75 cites·27 claims
- 2080US9653357B2Plasma etching apparatusDISCO CORP·Filed 2014·Granted May 16, 2017·4 cites·13 claims
- 2179US5234527ALiquid level detecting device and a processing apparatusTOKYO ELECTRON LTD·Filed 1991·Granted Aug 10, 1993·39 cites·18 claims
- 2278US5938850ASingle wafer heat treatment apparatusTOKYO ELECTRON LTD·Filed 1996·Granted Aug 17, 1999·57 cites·11 claims
- 2377US5221403ASupport table for plate-like body and processing apparatus using the tableTOKYO ELECTRON LTD·Filed 1991·Granted Jun 22, 1993·60 cites·20 claims
- 2475US2024312828A1Apparatus and method for processing waferPIOTECH INC·Filed 2024·Application pending·0 cites
- 2574US9379015B2Wafer processing methodDISCO CORP·Filed 2013·Granted Jun 28, 2016·3 cites·3 claims
- 2674US7481902B2Substrate processing apparatus and method, high speed rotary valve and cleaning methodTOKYO ELECTRON LTD·Filed 2004·Granted Jan 27, 2009·16 cites·2 claims
- 2765US12020975B2Apparatus and method for processing waferPIOTECH INC·Filed 2021·Granted Jun 25, 2024·0 cites·7 claims
- 2865US5618350AProcessing apparatusTOKYO ELECTRON LTD·Filed 1996·Granted Apr 8, 1997·27 cites·8 claims
- 2965US5376211AMagnetron plasma processing apparatus and processing methodTOKYO ELECTRON LTD·Filed 1991·Granted Dec 27, 1994·14 cites·5 claims
- 3063US2023274957A1Multi-station processing chamber for semiconductorPIOTECH CO LTD·Filed 2023·Application pending·0 cites
- 3162US5387893APermanent magnet magnetic circuit and magnetron plasma processing apparatusTOKYO ELECTRON LTD·Filed 1993·Granted Feb 7, 1995·16 cites·7 claims
- 3259US7658801B2Heat treatment apparatusTOKYO ELECTRON LTD·Filed 2004·Granted Feb 9, 2010·6 cites·12 claims
- 3359US5566043ACeramic electrostatic chuck with built-in heaterSHINETSU CHEMICAL CO·Filed 1994·Granted Oct 15, 1996·31 cites·10 claims
- 3454US2007264427A1Thin film formation by atomic layer growth and chemical vapor depositionASM JAPAN·Filed 2006·Application pending·0 cites
- 3553US11437253B2Wafer pedestal with contact arrayPIOTECH INC·Filed 2020·Granted Sep 6, 2022·0 cites·10 claims
- 3652US11731145B2Multiple section showerhead assemblyPIOTECH INC·Filed 2020·Granted Aug 22, 2023·0 cites·11 claims
- 3751US11562891B2Method of temperature measurement used in radio-frequency processing apparatus for semiconductorPIOTECH INC·Filed 2019·Granted Jan 24, 2023·0 cites·2 claims
- 3851US2025179641A1Semiconductor deviceJIANGSU LEADMICRO NANO TECH CO LTD·Filed 2023·Application pending·0 cites
- 3950US11088012B2Wafer susceptor apparatus with thermal insulation and method for manufacturing the samePIOTECH INC·Filed 2019·Granted Aug 10, 2021·0 cites·7 claims
- 4050US5474643APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1993·Granted Dec 12, 1995·10 cites·6 claims
- 4150US2013344244A1Method for cleaning gas conveying device, and method and reaction device for film growthDU ZHIYOU·Filed 2012·Application pending·0 cites
- 4250US2020203197A1Multi-station processing chamber for semiconductorPIOTECH CO LTD·Filed 2019·Application pending·0 cites
- 4348US2021398779A1Apparatus, system, and method for impedance adjustment of processing stationPIOTECH INC·Filed 2021·Application pending·0 cites
- 4447US2010271745A1Electrostatic chuck and base for plasma reactor having improved wafer etch rateADVANCED MICRO FAB EQUIP INC·Filed 2009·Application pending·0 cites
- 4544US6062810ATurbomolecular pumpEBARA CORP·Filed 1998·Granted May 16, 2000·12 cites·5 claims
- 4641US2019341280A1Waffer pedestal with heating mechanism and reaction chamber including the samePIOTECH CO LTD·Filed 2019·Application pending·0 cites
- 4739US2019057842A1Rf signal transmitting device used in plasma processing apparatusPIOTECH CO LTD·Filed 2018·Application pending·0 cites
- 4831US5888338AMagnetron plasma processing apparatus and processing methodTOKYO ELECTRON LTD·Filed 1997·Granted Mar 30, 1999·0 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →