Inventor · disambiguated record
Jun Shinagawa
Also filed as: SHINAGAWA JUN · SHINAGAWA JUN-ICHI
14 granted patents·11 pending applications·83 citations·filing 1992–2025
88Inventor score
Files withTOKYO ELECTRON LTD19HOLLAND JOHN PATRICK3CHUBA ELECTRIC POWER COMPANY I1KIM JISOO1KOSHIISHI AKIRA1
Top patents by PatentIndex Score
25 records- 0194US9177756B2E-beam enhanced decoupled source for semiconductor processingHOLLAND JOHN PATRICK·Filed 2012·Granted Nov 3, 2015·23 cites·19 claims
- 0292US11869756B2Virtual metrology enhanced plasma process optimization methodTOKYO ELECTRON LTD·Filed 2021·Granted Jan 9, 2024·3 cites·20 claims
- 0387US9111728B2E-beam enhanced decoupled source for semiconductor processingHOLLAND JOHN PATRICK·Filed 2012·Granted Aug 18, 2015·8 cites·20 claims
- 0485US12112107B2Virtual metrology for wafer result predictionTOKYO ELECTRON LTD·Filed 2020·Granted Oct 8, 2024·2 cites·12 claims
- 0583US10916411B2Sensor-to-sensor matching methods for chamber matchingTOKYO ELECTRON LTD·Filed 2019·Granted Feb 9, 2021·3 cites·20 claims
- 0676US2025291849A1Recording medium, information processing apparatus, and information processing methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0776US2025292119A1Recording medium, information processing apparatus, and information processing methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0872US10622219B2Methods and systems for chamber matching and monitoringTOKYO ELECTRON LTD·Filed 2017·Granted Apr 14, 2020·1 cites·18 claims
- 0971US10438805B2Methods and systems for chamber matching and monitoringTOKYO ELECTRON LTD·Filed 2017·Granted Oct 8, 2019·1 cites·18 claims
- 1070US5319311ACable fault location method with discharge delay compensation using multiple pulses with different rates of voltage increaseCHUBA ELECTRIC POWER COMPANY I·Filed 1992·Granted Jun 7, 1994·42 cites·8 claims
- 1159US12032355B2Virtual metrology model based seasoning optimizationTOKYO ELECTRON LTD·Filed 2022·Granted Jul 9, 2024·0 cites·20 claims
- 1259US2025293095A1System and method of pulse scoringTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1358US2025226192A1Method and system for plasma processTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1458US2025266250A1Profile simulation calibration with in-situ sensor dataTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1557US2024420359A1Profile detecting method and profile detecting apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1656US2025271830A1Radio frequency sensor calibration by virtual metrologyTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1756US2024203713A1In-situ diagnosis of plasma systemTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1853US12300477B2Autonomous operation of plasma processing toolTOKYO ELECTRON LTD·Filed 2022·Granted May 13, 2025·0 cites·19 claims
- 1953US8980046B2Semiconductor processing system with source for decoupled ion and radical controlKOSHIISHI AKIRA·Filed 2012·Granted Mar 17, 2015·0 cites·21 claims
- 2053US2025216336A1Fault detection and classification (fdc) for endpoint detection (epd) by reflectometryTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2149US12400888B2Data fusion of multiple sensorsTOKYO ELECTRON LTD·Filed 2022·Granted Aug 26, 2025·0 cites·21 claims
- 2249US11669079B2Tool health monitoring and classifications with virtual metrology and incoming wafer monitoring enhancementsTOKYO ELECTRON LTD·Filed 2021·Granted Jun 6, 2023·0 cites·21 claims
- 2345US8592318B2Pitch reduction using oxide spacerKIM JISOO·Filed 2008·Granted Nov 26, 2013·0 cites·18 claims
- 2441US2012258607A1E-Beam Enhanced Decoupled Source for Semiconductor ProcessingHOLLAND JOHN PATRICK·Filed 2012·Application pending·0 cites
- 2541US2021050191A1Methods and systems for plasma processing tool matching after preventative maintenanceTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →