Inventor · disambiguated record
Kana Fujii
Also filed as: FUJII KANA
17 granted patents·1 pending application·27 citations·filing 2010–2016
89Inventor score
Top patents by PatentIndex Score
18 records- 0197US9897922B2Method of forming pattern and developer for use in the methodFUJIFILM CORP·Filed 2016·Granted Feb 20, 2018·10 cites·12 claims
- 0285US9482958B2Method of forming pattern and developer for use in the methodFUJIFILM CORP·Filed 2015·Granted Nov 1, 2016·2 cites·12 claims
- 0384US8647812B2Pattern forming method, chemical amplification resist composition and resist filmFUJII KANA·Filed 2011·Granted Feb 11, 2014·5 cites·21 claims
- 0478US9097973B2Method of forming pattern and developer for use in the methodENOMOTO YUICHIRO·Filed 2011·Granted Aug 4, 2015·2 cites·8 claims
- 0572US10248019B2Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist filmFUJIFILM CORP·Filed 2012·Granted Apr 2, 2019·1 cites·9 claims
- 0672US9709892B2Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the sameKATAOKA SHOHEI·Filed 2011·Granted Jul 18, 2017·2 cites·9 claims
- 0766US8877423B2Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the sameFUJII KANA·Filed 2010·Granted Nov 4, 2014·1 cites·13 claims
- 0864US9551935B2Pattern forming method and resist compositionKATO KEITA·Filed 2011·Granted Jan 24, 2017·1 cites·34 claims
- 0964US9122151B2Resist composition, resist film therefrom and method of forming negative pattern using the compositionFUJII KANA·Filed 2012·Granted Sep 1, 2015·1 cites·12 claims
- 1064US8795945B2Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the sameFUJII KANA·Filed 2011·Granted Aug 5, 2014·1 cites·16 claims
- 1164US8741542B2Actinic ray-sensitive or radiation-sensitive resin composition, film formed using the composition and pattern forming method using the sameTSUCHIMURA TOMOTAKA·Filed 2010·Granted Jun 3, 2014·1 cites·11 claims
- 1248US8871642B2Method of forming pattern and developer for use in the methodENOMOTO YUICHIRO·Filed 2011·Granted Oct 28, 2014·0 cites·29 claims
- 1347US8859192B2Negative pattern forming method and resist patternFUJIFILM CORP·Filed 2013·Granted Oct 14, 2014·0 cites·9 claims
- 1438US10126653B2Pattern forming method and resist compositionIWATO KAORU·Filed 2011·Granted Nov 13, 2018·0 cites·20 claims
- 1537US8349535B2Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern therewithFUJIFILM CORP·Filed 2010·Granted Jan 8, 2013·0 cites·9 claims
- 1635US8541161B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same and pattern forming methodFUJII KANA·Filed 2010·Granted Sep 24, 2013·0 cites·10 claims
- 1734US8642245B2Actinic-ray- or radiation-sensitive resin composition and method of forming a pattern using the sameFUJII KANA·Filed 2012·Granted Feb 4, 2014·0 cites·18 claims
- 1833US2012219758A1Resist composition, resist film therefrom and method of forming negative pattern using the compositionODANI TADAHIRO·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →