Inventor · disambiguated record
Kazuya Nagaseki
Also filed as: NAGASEKI KAZUYA
70 granted patents·30 pending applications·1,866 citations·filing 1993–2025
99Inventor score
Top patents by PatentIndex Score
100 records- 0197US10553407B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Feb 4, 2020·47 cites·14 claims
- 0297US6544380B2Plasma treatment method and apparatusTOKYO ELECTRON LTD·Filed 2002·Granted Apr 8, 2003·104 cites·3 claims
- 0397US6074518APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1999·Granted Jun 13, 2000·276 cites·3 claims
- 0497US5919332APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1996·Granted Jul 6, 1999·445 cites·15 claims
- 0596US11387077B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Jul 12, 2022·3 cites·13 claims
- 0696US5942075APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1996·Granted Aug 24, 1999·277 cites·16 claims
- 0796US5698062APlasma treatment apparatus and methodTOKYO ELECTRON LTD·Filed 1995·Granted Dec 16, 1997·161 cites·3 claims
- 0895US7654010B2Substrate processing system, substrate processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2007·Granted Feb 2, 2010·27 cites·10 claims
- 0995US7585386B2Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing methodOCTEC INC·Filed 2005·Granted Sep 8, 2009·33 cites·12 claims
- 1091US11613432B2Processing system and method using transporting device facilitating replacement of consumable partTOKYO ELECTRON LTD·Filed 2021·Granted Mar 28, 2023·2 cites·14 claims
- 1191US6391147B2Plasma treatment method and apparatusTOKYO ELECTRON LTD·Filed 2000·Granted May 21, 2002·49 cites·5 claims
- 1289US12087591B2Plasma processing apparatus and systemTOKYO ELECTRON LTD·Filed 2022·Granted Sep 10, 2024·1 cites·18 claims
- 1389US11170979B2Plasma etching method and plasma etching apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Nov 9, 2021·4 cites·17 claims
- 1488US7625494B2Plasma etching method and plasma etching unitTOKYO ELECTRON LTD·Filed 2004·Granted Dec 1, 2009·35 cites·14 claims
- 1588US6106737APlasma treatment method utilizing an amplitude-modulated high frequency powerTOKYO ELECTRON LTD·Filed 1998·Granted Aug 22, 2000·66 cites·4 claims
- 1687US11443924B2Upper electrode and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Sep 13, 2022·2 cites·15 claims
- 1787US7749914B2Plasma etching methodTOKYO ELECTRON LTD·Filed 2004·Granted Jul 6, 2010·39 cites·6 claims
- 1886US7922862B2Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing methodOCTEC INC·Filed 2009·Granted Apr 12, 2011·9 cites·18 claims
- 1986US7338576B2Plasma processing deviceTOKYO ELECTRON LTD·Filed 2002·Granted Mar 4, 2008·41 cites·12 claims
- 2084US12154793B2Etching apparatus and etching methodTOKYO ELECTRON LTD·Filed 2020·Granted Nov 26, 2024·1 cites·20 claims
- 2182US10763126B2Etching apparatus and etching methodTOKYO ELECTRON LTD·Filed 2019·Granted Sep 1, 2020·2 cites·8 claims
- 2278US9390943B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Jul 12, 2016·4 cites·10 claims
- 2378US7794616B2Etching gas, etching method and etching gas evaluation methodTOKYO ELECTRON LTD·Filed 2005·Granted Sep 14, 2010·5 cites·10 claims
- 2478US2025273446A1Exhaust device, processing apparatus, and exhausting methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 2577US8221579B2Method of reusing a consumable part for use in a plasma processing apparatusNAGAYAMA NOBUYUKI·Filed 2010·Granted Jul 17, 2012·3 cites·8 claims
- 2677US5539274AElectron beam excited plasma systemTOKYO ELECTRON LTD·Filed 1994·Granted Jul 23, 1996·32 cites·35 claims
- 2776US7767055B2Capacitive coupling plasma processing apparatusTOKYO ELECTRON LTD·Filed 2005·Granted Aug 3, 2010·5 cites·17 claims
- 2876US7470998B2Semiconductor device and method of manufacturing the sameOCTEC INC·Filed 2006·Granted Dec 30, 2008·6 cites·7 claims
- 2976US2025191877A1Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 3076US2025108525A1Part transporting device and processing systemTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 3175US12033832B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Jul 9, 2024·0 cites·19 claims
- 3275US9978566B2Plasma etching methodTOKYO ELECTRON LTD·Filed 2016·Granted May 22, 2018·2 cites·6 claims
- 3375US7230202B2Plasma processing apparatus, electrode unit, feeder member and radio frequency feeder rodTOKYO ELECTRON LTD·Filed 2004·Granted Jun 12, 2007·9 cites·25 claims
- 3474US2024207882A1Film forming apparatus and method for manufacturing part having film containing siliconTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 3573US8475622B2Method of reusing a consumable part for use in a plasma processing apparatusNAGAYAMA NOBUYUKI·Filed 2012·Granted Jul 2, 2013·2 cites·6 claims
- 3673US2024254620A1Restoring method of consumed componentTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 3773US2024234099A1Forming method of component and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 3872US11699573B2Plasma processing methodTOKYO ELECTRON LTD·Filed 2021·Granted Jul 11, 2023·0 cites·19 claims
- 3972US7022616B2High speed silicon etching methodTOSHIBA KK·Filed 2001·Granted Apr 4, 2006·15 cites·18 claims
- 4072US2025226190A1Stage and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 4170US11919032B2Film forming apparatus and method for manufacturing part having film containing siliconTOKYO ELECTRON LTD·Filed 2021·Granted Mar 5, 2024·0 cites·25 claims
- 4269US12322578B2Exhaust device, processing apparatus, and exhausting methodTOKYO ELECTRON LTD·Filed 2021·Granted Jun 3, 2025·0 cites·15 claims
- 4368US12288676B2Stage and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Apr 29, 2025·0 cites·8 claims
- 4468US7473377B2Plasma processing methodTOKYO ELECTRON LTD·Filed 2004·Granted Jan 6, 2009·14 cites·66 claims
- 4568US7023002B2Surface treating device and surface treating methodTOKYO ELECTRON LTD·Filed 2004·Granted Apr 4, 2006·11 cites·17 claims
- 4668US5368676APlasma processing apparatus comprising electron supply chamber and high frequency electric field generation meansTOKYO ELECTRON LTD·Filed 1993·Granted Nov 29, 1994·49 cites·19 claims
- 4767US12424424B2Plasma monitoring system, plasma monitoring method, and monitoring deviceTOKYO ELECTRON LTD·Filed 2023·Granted Sep 23, 2025·0 cites·18 claims
- 4866US7641806B2Manufacturing method for membrane memberTOKYO ELECTRON LTD·Filed 2004·Granted Jan 5, 2010·6 cites·29 claims
- 4966US2025349573A1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 5065US12186898B2Part transporting device and processing systemTOKYO ELECTRON LTD·Filed 2021·Granted Jan 7, 2025·0 cites·24 claims
Showing the top 50 of 100 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →