Inventor · disambiguated record
Kartik Ramaswamy
Also filed as: RAMASWAMY KARTIK
249 granted patents·116 pending applications·8,971 citations·filing 2000–2025
99Inventor score
Top patents by PatentIndex Score
365 records- 0199US7695590B2Chemical vapor deposition plasma reactor having plural ion shower gridsAPPLIED MATERIALS INC·Filed 2004·Granted Apr 13, 2010·195 cites·31 claims
- 0299US7429532B2Semiconductor substrate process using an optically writable carbon-containing maskAPPLIED MATERIALS INC·Filed 2005·Granted Sep 30, 2008·539 cites·18 claims
- 0399US7422775B2Process for low temperature plasma deposition of an optical absorption layer and high speed optical annealingAPPLIED MATERIALS INC·Filed 2005·Granted Sep 9, 2008·535 cites·17 claims
- 0499US7393765B2Low temperature CVD process with selected stress of the CVD layer on CMOS devicesAPPLIED MATERIALS INC·Filed 2007·Granted Jul 1, 2008·562 cites·16 claims
- 0599US7335611B2Copper conductor annealing process employing high speed optical annealing with a low temperature-deposited optical absorber layerAPPLIED MATERIALS INC·Filed 2005·Granted Feb 26, 2008·535 cites·20 claims
- 0699US7323401B2Semiconductor substrate process using a low temperature deposited carbon-containing hard maskAPPLIED MATERIALS INC·Filed 2005·Granted Jan 29, 2008·580 cites·17 claims
- 0799US7312148B2Copper barrier reflow process employing high speed optical annealingAPPLIED MATERIALS INC·Filed 2005·Granted Dec 25, 2007·537 cites·21 claims
- 0899US7312162B2Low temperature plasma deposition process for carbon layer depositionAPPLIED MATERIALS INC·Filed 2005·Granted Dec 25, 2007·544 cites·19 claims
- 0999US7109098B1Semiconductor junction formation process including low temperature plasma deposition of an optical absorption layer and high speed optical annealingAPPLIED MATERIALS INC·Filed 2005·Granted Sep 19, 2006·551 cites·15 claims
- 1098US11848176B2Plasma processing using pulsed-voltage and radio-frequency powerAPPLIED MATERIALS INC·Filed 2021·Granted Dec 19, 2023·5 cites·25 claims
- 1198US11814724B2Continuous liner for use in a processing chamberAPPLIED MATERIALS INC·Filed 2022·Granted Nov 14, 2023·2 cites·19 claims
- 1298US11776789B2Plasma processing assembly using pulsed-voltage and radio-frequency powerAPPLIED MATERIALS INC·Filed 2022·Granted Oct 3, 2023·6 cites·20 claims
- 1398US11651966B2Methods and apparatus for processing a substrateAPPLIED MATERIALS INC·Filed 2021·Granted May 16, 2023·6 cites·9 claims
- 1498US11587766B2Symmetric VHF source for a plasma reactorAPPLIED MATERIALS INC·Filed 2021·Granted Feb 21, 2023·4 cites·15 claims
- 1598US11476090B1Voltage pulse time-domain multiplexingAPPLIED MATERIALS INC·Filed 2021·Granted Oct 18, 2022·14 cites·26 claims
- 1698US11462388B2Plasma processing assembly using pulsed-voltage and radio-frequency powerAPPLIED MATERIALS INC·Filed 2021·Granted Oct 4, 2022·6 cites·20 claims
- 1798US10580620B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2016·Granted Mar 3, 2020·38 cites·17 claims
- 1898US10546728B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2016·Granted Jan 28, 2020·39 cites·11 claims
- 1998US10535502B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2016·Granted Jan 14, 2020·35 cites·14 claims
- 2098US10453656B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2016·Granted Oct 22, 2019·36 cites·15 claims
- 2198US10312056B2Distributed electrode array for plasma processingAPPLIED MATERIALS INC·Filed 2018·Granted Jun 4, 2019·39 cites·20 claims
- 2298US9741546B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2012·Granted Aug 22, 2017·385 cites·17 claims
- 2398US9287095B2Semiconductor system assemblies and methods of operationAPPLIED MATERIALS INC·Filed 2013·Granted Mar 15, 2016·153 cites·17 claims
- 2498US9068265B2Gas distribution plate with discrete protective elementsLUBOMIRSKY DMITRY·Filed 2012·Granted Jun 30, 2015·75 cites·20 claims
- 2598US8018164B2Plasma reactor with high speed plasma load impedance tuning by modulation of different unmatched frequency sourcesAPPLIED MATERIALS INC·Filed 2008·Granted Sep 13, 2011·47 cites·18 claims
- 2698US7967944B2Method of plasma load impedance tuning by modulation of an unmatched low power RF generatorAPPLIED MATERIALS INC·Filed 2008·Granted Jun 28, 2011·57 cites·16 claims
- 2798US7291360B2Chemical vapor deposition plasma process using plural ion shower gridsAPPLIED MATERIALS INC·Filed 2004·Granted Nov 6, 2007·186 cites·62 claims
- 2898US7244474B2Chemical vapor deposition plasma process using an ion shower gridAPPLIED MATERIALS INC·Filed 2004·Granted Jul 17, 2007·195 cites·70 claims
- 2998US7094670B2Plasma immersion ion implantation processAPPLIED MATERIALS INC·Filed 2005·Granted Aug 22, 2006·79 cites·23 claims
- 3098US6348126B1Externally excited torroidal plasma sourceAPPLIED MATERIALS INC·Filed 2000·Granted Feb 19, 2002·121 cites·31 claims
- 3197US12237148B2Plasma processing assembly using pulsed-voltage and radio-frequency powerAPPLIED MATERIALS INC·Filed 2023·Granted Feb 25, 2025·2 cites·21 claims
- 3297US11462389B2Pulsed-voltage hardware assembly for use in a plasma processing systemAPPLIED MATERIALS INC·Filed 2021·Granted Oct 4, 2022·12 cites·17 claims
- 3397US10957518B2Chamber with individually controllable plasma generation regions for a reactor for processing a workpieceAPPLIED MATERIALS INC·Filed 2020·Granted Mar 23, 2021·4 cites·13 claims
- 3497US10707086B2Etching methodsAPPLIED MATERIALS INC·Filed 2019·Granted Jul 7, 2020·40 cites·20 claims
- 3597US8382999B2Pulsed plasma high aspect ratio dielectric processAPPLIED MATERIALS INC·Filed 2010·Granted Feb 26, 2013·55 cites·9 claims
- 3697US7465478B2Plasma immersion ion implantation processAPPLIED MATERIALS INC·Filed 2005·Granted Dec 16, 2008·39 cites·18 claims
- 3797US7291545B2Plasma immersion ion implantation process using a capacitively couple plasma source having low dissociation and low minimum plasma voltageAPPLIED MATERIALS INC·Filed 2005·Granted Nov 6, 2007·73 cites·20 claims
- 3897US7292428B2Electrostatic chuck with smart lift-pin mechanism for a plasma reactorAPPLIED MATERIALS INC·Filed 2005·Granted Nov 6, 2007·57 cites·20 claims
- 3997US6939434B2Externally excited torroidal plasma source with magnetic control of ion distributionAPPLIED MATERIALS INC·Filed 2002·Granted Sep 6, 2005·72 cites·48 claims
- 4097US6893907B2Fabrication of silicon-on-insulator structure using plasma immersion ion implantationAPPLIED MATERIALS INC·Filed 2004·Granted May 17, 2005·127 cites·59 claims
- 4197US6551446B1Externally excited torroidal plasma source with a gas distribution plateAPPLIED MATERIALS INC·Filed 2000·Granted Apr 22, 2003·96 cites·9 claims
- 4297US6410449B1Method of processing a workpiece using an externally excited torroidal plasma sourceAPPLIED MATERIALS INC·Filed 2000·Granted Jun 25, 2002·88 cites·8 claims
- 4397US6367412B1Porous ceramic liner for a plasma sourceAPPLIED MATERIALS INC·Filed 2000·Granted Apr 9, 2002·135 cites·20 claims
- 4496US12130561B2Gas distribution plate with UV blockerAPPLIED MATERIALS INC·Filed 2022·Granted Oct 29, 2024·2 cites·14 claims
- 4596US10544505B2Deposition or treatment of diamond-like carbon in a plasma reactorAPPLIED MATERIALS INC·Filed 2017·Granted Jan 28, 2020·12 cites·15 claims
- 4696US10475626B2Ion-ion plasma atomic layer etch process and reactorAPPLIED MATERIALS INC·Filed 2015·Granted Nov 12, 2019·12 cites·14 claims
- 4796US10249495B2Diamond like carbon layer formed by an electron beam plasma processAPPLIED MATERIALS INC·Filed 2016·Granted Apr 2, 2019·17 cites·16 claims
- 4896US8962488B2Synchronized radio frequency pulsing for plasma etchingAPPLIED MATERIALS INC·Filed 2013·Granted Feb 24, 2015·30 cites·15 claims
- 4996US8734664B2Method of differential counter electrode tuning in an RF plasma reactorAPPLIED MATERIALS INC·Filed 2013·Granted May 27, 2014·28 cites·19 claims
- 5096US8357264B2Plasma reactor with plasma load impedance tuning for engineered transients by synchronized modulation of a source power or bias power RF generatorAPPLIED MATERIALS INC·Filed 2008·Granted Jan 22, 2013·33 cites·8 claims
Showing the top 50 of 365 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →