Inventor · disambiguated record
Keechan Kim
Also filed as: KIM KEECHAN
11 granted patents·3 pending applications·17 citations·filing 2007–2025
85Inventor score
Top patents by PatentIndex Score
14 records- 0184US8398778B2Control of bevel etch film profile using plasma exclusion zone rings larger than the wafer diameterFANG TONG·Filed 2008·Granted Mar 19, 2013·7 cites·11 claims
- 0279US2025364225A1Lower plasma exclusion zone rings for bevel etcherKIM KEECHAN·Filed 2025·Application pending·0 cites
- 0377US8137501B2Bevel clean deviceKIM YUNSANG·Filed 2007·Granted Mar 20, 2012·6 cites·16 claims
- 0468US10629458B2Control of bevel etch film profile using plasma exclusion zone rings larger than the wafer diameterLAM RES CORP·Filed 2013·Granted Apr 21, 2020·1 cites·1 claims
- 0566US8257503B2Method and apparatus for detecting plasma unconfinementKIM KEECHAN·Filed 2008·Granted Sep 4, 2012·2 cites·18 claims
- 0663US8852384B2Method and apparatus for detecting plasma unconfinementKIM KEECHAN·Filed 2012·Granted Oct 7, 2014·1 cites·19 claims
- 0760US10832923B2Lower plasma-exclusion-zone rings for a bevel etcherLAM RES CORP·Filed 2017·Granted Nov 10, 2020·0 cites·27 claims
- 0860US10811282B2Upper plasma-exclusion-zone rings for a bevel etcherLAM RES CORP·Filed 2017·Granted Oct 20, 2020·0 cites·26 claims
- 0958US12387915B2Lower plasma exclusion zone ring for bevel etcherLAM RES CORP·Filed 2019·Granted Aug 12, 2025·0 cites·58 claims
- 1058US10748747B2Edge exclusion control with adjustable plasma exclusion zone ringLAM RES CORP·Filed 2017·Granted Aug 18, 2020·0 cites·10 claims
- 1151US2015020848A1Systems and Methods for In-Situ Wafer Edge and Backside Plasma CleaningLAM RES CORP·Filed 2013·Application pending·0 cites
- 1249US9799496B2Edge exclusion control with adjustable plasma exclusion zone ringLAM RES CORP·Filed 2015·Granted Oct 24, 2017·0 cites·6 claims
- 1349US2017256393A1Systems and Methods for In-Situ Wafer Edge and Backside Plasma CleaningLAM RES CORP·Filed 2017·Application pending·0 cites
- 1447US9184030B2Edge exclusion control with adjustable plasma exclusion zone ringKIM KEECHAN·Filed 2012·Granted Nov 10, 2015·0 cites·15 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →