Inventor · disambiguated record
Kenneth T. Settlemyer, Jr.
Also filed as: SETTLEMYER JR KENNETH T · SETTLEMYER KENNETH · SETTLEMYER KENNETH T · SETTLEMYER KENNETH T JR
29 granted patents·3 pending applications·582 citations·filing 2000–2014
97Inventor score
Top patents by PatentIndex Score
32 records- 0198US7434185B2Method and apparatus for parallel data preparation and processing of integrated circuit graphical design dataIBM·Filed 2006·Granted Oct 7, 2008·203 cites·10 claims
- 0297US7410844B2Device fabrication by anisotropic wet etchIBM·Filed 2006·Granted Aug 12, 2008·53 cites·1 claims
- 0394US7018551B2Pull-back method of forming fins in FinFetsIBM·Filed 2003·Granted Mar 28, 2006·84 cites·26 claims
- 0488US7563670B2Method for etching single-crystal semiconductor selective to amorphous/polycrystalline semiconductor and structure formed by sameIBM·Filed 2006·Granted Jul 21, 2009·14 cites·16 claims
- 0587US6555430B1Process flow for capacitance enhancement in a DRAM trenchIBM·Filed 2000·Granted Apr 29, 2003·44 cites·16 claims
- 0684US7122439B2Method of fabricating a bottle trench and a bottle trench capacitorINFINEON TECHNOLOGIES AG·Filed 2004·Granted Oct 17, 2006·26 cites·16 claims
- 0782US7138308B2Replacement gate with TERA capIBM·Filed 2004·Granted Nov 21, 2006·29 cites·20 claims
- 0881US6967136B2Method and structure for improved trench processingIBM·Filed 2003·Granted Nov 22, 2005·23 cites·10 claims
- 0980US6936512B2Semiconductor method and structure for simultaneously forming a trench capacitor dielectric and trench sidewall device dielectricIBM·Filed 2002·Granted Aug 30, 2005·23 cites·20 claims
- 1077US7666741B2Corner clipping for field effect devicesIBM·Filed 2006·Granted Feb 23, 2010·5 cites·12 claims
- 1175US6723611B2Vertical hard maskIBM·Filed 2002·Granted Apr 20, 2004·18 cites·19 claims
- 1275US6664161B2Method and structure for salicide trench capacitor plate electrodeIBM·Filed 2002·Granted Dec 16, 2003·19 cites·11 claims
- 1373US7696539B2Device fabrication by anisotropic wet etchIBM·Filed 2008·Granted Apr 13, 2010·3 cites·8 claims
- 1473US7157328B2Selective etching to increase trench surface areaIBM·Filed 2005·Granted Jan 2, 2007·4 cites·20 claims
- 1572US8853746B2CMOS devices with stressed channel regions, and methods for fabricating the sameCHEN XIANGDONG·Filed 2006·Granted Oct 7, 2014·4 cites·10 claims
- 1666US7497959B2Methods and structures for protecting one area while processing another area on a chipIBM·Filed 2004·Granted Mar 3, 2009·7 cites·10 claims
- 1763US7390745B2Pattern enhancement by crystallographic etchingIBM·Filed 2005·Granted Jun 24, 2008·1 cites·14 claims
- 1861US6887761B1Vertical semiconductor devicesINFINEON TECHNOLOGIES CORP·Filed 2004·Granted May 3, 2005·10 cites·20 claims
- 1958US9472402B2Methods and structures for protecting one area while processing another area on a chipGLOBALFOUNDRIES INC·Filed 2014·Granted Oct 18, 2016·0 cites·7 claims
- 2058US6565666B1Capillary dry process and apparatusIBM·Filed 2000·Granted May 20, 2003·6 cites·11 claims
- 2157US9059000B2Methods and structures for protecting one area while processing another area on a chipKIM DEOK-KEE·Filed 2008·Granted Jun 16, 2015·0 cites·17 claims
- 2257US2005179112A1Filling high aspect ratio isolation structures with polysilazane based materialIBM·Filed 2005·Application pending·0 cites
- 2356US7718993B2Pattern enhancement by crystallographic etchingIBM·Filed 2008·Granted May 18, 2010·0 cites·14 claims
- 2452US7670901B2Method of fabricating a bottle trench and a bottle trench capacitorIBM·Filed 2008·Granted Mar 2, 2010·0 cites·11 claims
- 2550US6797582B2Vertical thermal nitride mask (anti-collar) and processing thereofIBM·Filed 2003·Granted Sep 28, 2004·2 cites·10 claims
- 2649US7387930B2Method of fabricating a bottle trench and a bottle trench capacitorIBM·Filed 2006·Granted Jun 17, 2008·0 cites·8 claims
- 2748US7101768B2Self-aligned selective hemispherical grain deposition process and structure for enhanced capacitance trench capacitorIBM·Filed 2002·Granted Sep 5, 2006·4 cites·11 claims
- 2843US8499260B2Optical proximity correction verification accounting for mask deviationsBRUCE JAMES A·Filed 2011·Granted Jul 30, 2013·0 cites·20 claims
- 2941US8577489B2Diagnosing in-line critical dimension control adjustments using optical proximity correction verificationBRUCE JAMES A·Filed 2011·Granted Nov 5, 2013·0 cites·19 claims
- 3040US2003107111A1A 3-d microelectronic structure including a vertical thermal nitride maskIBM·Filed 2001·Application pending·0 cites
- 3138US6508014B2Method of drying substratesIBM·Filed 2001·Granted Jan 21, 2003·0 cites·10 claims
- 3238US2004129297A1Method and system for reducing effects of halfpitch wafer spacing during wet processesFiled 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →