Inventor · disambiguated record
Kohei Fukushima
Also filed as: FUKUSHIMA KOHEI
22 granted patents·12 pending applications·230 citations·filing 2002–2022
94Inventor score
Files withTOKYO ELECTRON LTD27SONY SEMICONDUCTOR SOLUTIONS CORP3FUKUSHIMA KOHEI1HONDA MOTOR CO LTD1MATSUURA HIROYUKI1
Top patents by PatentIndex Score
34 records- 0197US7825039B2Vertical plasma processing method for forming silicon containing filmTOKYO ELECTRON LTD·Filed 2009·Granted Nov 2, 2010·79 cites·12 claims
- 0297US7758920B2Method and apparatus for forming silicon-containing insulating filmTOKYO ELECTRON LTD·Filed 2006·Granted Jul 20, 2010·81 cites·18 claims
- 0393US8336490B2Plasma processing apparatusMATSUURA HIROYUKI·Filed 2011·Granted Dec 25, 2012·7 cites·17 claims
- 0486US10287682B2Substrate processing apparatus, gas supply method, substrate processing method, and film forming methodTOKYO ELECTRON LTD·Filed 2017·Granted May 14, 2019·2 cites·10 claims
- 0584US10475641B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Nov 12, 2019·4 cites·10 claims
- 0682US11560628B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Jan 24, 2023·2 cites·6 claims
- 0780US6844273B2Precleaning method of precleaning a silicon nitride film forming systemTOKYO ELECTRON LTD·Filed 2002·Granted Jan 18, 2005·20 cites·6 claims
- 0878US12281389B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Apr 22, 2025·0 cites·6 claims
- 0978US12054828B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Aug 6, 2024·0 cites·5 claims
- 1078US7156923B2Silicon nitride film forming method, silicon nitride film forming system and silicon nitride film forming system precleaning methodTOKYO ELECTRON LTD·Filed 2004·Granted Jan 2, 2007·19 cites·6 claims
- 1177US9970111B2Substrate processing apparatus having ground electrodeTOKYO ELECTRON LTD·Filed 2014·Granted May 15, 2018·1 cites·6 claims
- 1264US2009056877A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 1363US9624579B2Film forming apparatus, film forming method, and non-transitory computer-readable storage mediumTOKYO ELECTRON LTD·Filed 2015·Granted Apr 18, 2017·1 cites·7 claims
- 1461US8608902B2Plasma processing apparatusFUKUSHIMA KOHEI·Filed 2010·Granted Dec 17, 2013·2 cites·17 claims
- 1556US9789579B2Apparatus for detecting rammer tip-overHONDA MOTOR CO LTD·Filed 2013·Granted Oct 17, 2017·1 cites·9 claims
- 1655US11282721B2Vertical heat treatment apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Mar 22, 2022·0 cites·7 claims
- 1755US2007234961A1Vertical plasma processing apparatus and method for semiconductor processTAKAHASHI TOSHIKI·Filed 2007·Application pending·0 cites
- 1854US2024363657A1Imaging device and electronic apparatusSONY SEMICONDUCTOR SOLUTIONS CORP·Filed 2022·Application pending·0 cites
- 1953US2024206202A1Light detection apparatus, light detection system, electronic equipment, and mobile bodySONY SEMICONDUCTOR SOLUTIONS CORP·Filed 2022·Application pending·0 cites
- 2051US7462376B2CVD method for forming silicon nitride filmTOKYO ELECTRON LTD·Filed 2004·Granted Dec 9, 2008·4 cites·12 claims
- 2151US2025120205A1Optical detecting device, manufacturing method therefor, and electronic equipmentSONY SEMICONDUCTOR SOLUTIONS CORP·Filed 2022·Application pending·0 cites
- 2249US9487859B2Operating method of vertical heat treatment apparatus, storage medium, and vertical heat treatment apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Nov 8, 2016·0 cites·9 claims
- 2346USD786810SDummy waferTOKYO ELECTRON LTD·Filed 2015·Granted May 16, 2017·4 cites·1 claims
- 2446US2017114464A1Vertical heat treatment apparatusTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 2543US9776202B2Driving method of vertical heat treatment apparatus, storage medium and vertical heat treatment apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Oct 3, 2017·0 cites·2 claims
- 2643US2016024654A1Film Forming ApparatusTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 2742US11208721B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Dec 28, 2021·0 cites·9 claims
- 2842US2015275368A1Film Forming Apparatus Using Gas NozzlesTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 2938USD784937SDummy waferTOKYO ELECTRON LTD·Filed 2015·Granted Apr 25, 2017·2 cites·1 claims
- 3037US2018087156A1Gas Introduction Mechanism and Processing ApparatusTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 3134USD785576SDummy waferTOKYO ELECTRON LTD·Filed 2015·Granted May 2, 2017·1 cites·1 claims
- 3233US2015259799A1Vertical heat treatment apparatus, method of operating vertical heat treatment apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 3331US2015275359A1Substrate Processing ApparatusTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 3430US2015376789A1Vertical heat treatment apparatus and method of operating vertical heat treatment apparatusTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →