Inventor · disambiguated record
Kouji Mitsuhashi
Also filed as: MITSUHASHI KOUJI
27 granted patents·9 pending applications·648 citations·filing 2001–2013
97Inventor score
Top patents by PatentIndex Score
36 records- 0197US7364798B2Internal member for plasma-treating vessel and method of producing the sameTOCALO CO LTD·Filed 2005·Granted Apr 29, 2008·34 cites·30 claims
- 0295US6837966B2Method and apparatus for an improved baffle plate in a plasma processing systemTOKYO ELECTRON LTD·Filed 2002·Granted Jan 4, 2005·84 cites·16 claims
- 0394US8877002B2Internal member of a plasma processing vesselTOKYO ELECTRON LTD·Filed 2013·Granted Nov 4, 2014·7 cites·13 claims
- 0494US7780786B2Internal member of a plasma processing vesselTOKYO ELECTRON LTD·Filed 2003·Granted Aug 24, 2010·51 cites·9 claims
- 0594US7166200B2Method and apparatus for an improved upper electrode plate in a plasma processing systemTOKYO ELECTRON LTD·Filed 2002·Granted Jan 23, 2007·49 cites·56 claims
- 0693US7163585B2Method and apparatus for an improved optical window deposition shield in a plasma processing systemTOKYO ELECTRON LTD·Filed 2004·Granted Jan 16, 2007·56 cites·24 claims
- 0793US7147749B2Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing systemTOKYO ELECTRON LTD·Filed 2002·Granted Dec 12, 2006·42 cites·78 claims
- 0892US7166166B2Method and apparatus for an improved baffle plate in a plasma processing systemTOKYO ELECTRON LTD·Filed 2002·Granted Jan 23, 2007·40 cites·34 claims
- 0991US8449715B2Internal member of a plasma processing vesselMITSUHASHI KOUJI·Filed 2010·Granted May 28, 2013·9 cites·5 claims
- 1091US7811428B2Method and apparatus for an improved optical window deposition shield in a plasma processing systemTOKYO ELECTRON LTD·Filed 2007·Granted Oct 12, 2010·14 cites·24 claims
- 1191US7566368B2Method and apparatus for an improved upper electrode plate in a plasma processing systemTOKYO ELECTRON LTD·Filed 2006·Granted Jul 28, 2009·13 cites·75 claims
- 1291US6899786B2Processing device and method of maintaining the device, mechanism and method for assembling processing device part, and lock mechanism and method for locking the lock mechanismTOKYO ELECTRON LTD·Filed 2001·Granted May 31, 2005·52 cites·4 claims
- 1391US6798519B2Method and apparatus for an improved optical window deposition shield in a plasma processing systemTOKYO ELECTRON LTD·Filed 2002·Granted Sep 28, 2004·44 cites·40 claims
- 1490US7678226B2Method and apparatus for an improved bellows shield in a plasma processing systemTOKYO ELECTRON LTD·Filed 2007·Granted Mar 16, 2010·15 cites·35 claims
- 1589US8057600B2Method and apparatus for an improved baffle plate in a plasma processing systemNISHIMOTO SHINYA·Filed 2007·Granted Nov 15, 2011·12 cites·26 claims
- 1688US6790289B2Method of cleaning a plasma processing apparatusTOKYO ELECTRON LTD·Filed 2003·Granted Sep 14, 2004·22 cites·14 claims
- 1786US7481903B2Processing device and method of maintaining the device, mechanism and method for assembling processing device parts, and lock mechanism and method for locking the lock mechanismTOKYO ELECTRON LTD·Filed 2005·Granted Jan 27, 2009·11 cites·3 claims
- 1881US8117986B2Apparatus for an improved deposition shield in a plasma processing systemSAIGUSA HIDEHITO·Filed 2006·Granted Feb 21, 2012·6 cites·22 claims
- 1981US7566379B2Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing systemTOKYO ELECTRON LTD·Filed 2006·Granted Jul 28, 2009·5 cites·33 claims
- 2081US7204912B2Method and apparatus for an improved bellows shield in a plasma processing systemTOKYO ELECTRON LTD·Filed 2002·Granted Apr 17, 2007·23 cites·30 claims
- 2180US7282112B2Method and apparatus for an improved baffle plate in a plasma processing systemTOKYO ELECTRON LTD·Filed 2004·Granted Oct 16, 2007·18 cites·21 claims
- 2277US7137353B2Method and apparatus for an improved deposition shield in a plasma processing systemTOKYO ELECTRON LTD·Filed 2002·Granted Nov 21, 2006·32 cites·49 claims
- 2376US8058186B2Components for substrate processing apparatus and manufacturing method thereofMORIYA TSUYOSHI·Filed 2005·Granted Nov 15, 2011·5 cites·4 claims
- 2471US7942975B2Ceramic sprayed member-cleaning methodTOKYO ELECTRON LTD·Filed 2009·Granted May 17, 2011·1 cites·7 claims
- 2570US8118936B2Method and apparatus for an improved baffle plate in a plasma processing systemSAIGUSA HIDEHITO·Filed 2007·Granted Feb 21, 2012·2 cites·26 claims
- 2662US2008070051A1Internal member for plasma-treating vessel and method of producing the sameTOCALO CO LTD·Filed 2007·Application pending·0 cites
- 2760US2008066647A1Internal member for plasma-treating vessel and method of producing the sameTOCALO CO LTD·Filed 2007·Application pending·0 cites
- 2860US2008070028A1Internal member for plasma-treating vessel and method of producing the sameTOCALO CO LTD·Filed 2007·Application pending·0 cites
- 2956US7892361B2In-chamber member, a cleaning method therefor and a plasma processing apparatusTOKYO ELECTRON LTD·Filed 2008·Granted Feb 22, 2011·0 cites·10 claims
- 3056US2006099444A1Ceramic sprayed member-cleaning method, program for implementing the method, storage medium storing the program, and ceramic sprayed memberTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 3150US2008105203A1Component for substrate processing apparatus and method of forming film on the componentTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 3250US2004216769A1Method of cleaning a plasma processing apparatusTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 3345US8739732B2Plasma treatment container internal member, and plasma treatment apparatus having the plasma treatment container internal memberNAGAYAMA NOBUYUKI·Filed 2002·Granted Jun 3, 2014·1 cites·26 claims
- 3442US2012186985A1Component for substrate processing apparatus and method of forming film on the componentMITSUHASHI KOUJI·Filed 2012·Application pending·0 cites
- 3541US2004163591A1Coating agent, plasma-resistant component having coating film formed by the coating agent, plasma processing device provided with the plasma-resistant componentFiled 2002·Application pending·0 cites
- 3636US2004200804A1Method of processing quartz member for plasma processing device, quartz member for plasma processing device, and plasma processing device having quartz member for plasma processing device mounted thereonFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →