Inventor · disambiguated record
Levinus Pieter Bakker
Also filed as: BAKKER LEVINUS · BAKKER LEVINUS P · BAKKER LEVINUS PIETER
77 granted patents·35 pending applications·1,102 citations·filing 1999–2012
99Inventor score
Files withASML NETHERLANDS BV56KONINKL PHILIPS ELECTRONICS NV35BAKKER LEVINUS PIETER8BANINE VADIM YEVGENYEVICH2JONKERS JEROEN1
Top patents by PatentIndex Score
112 records- 0199US7352434B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Apr 1, 2008·178 cites·43 claims
- 0297US6838684B2Lithographic projection apparatus and particle barrier for use thereinASML NETHERLANDS BV·Filed 2003·Granted Jan 4, 2005·111 cites·15 claims
- 0396US7106832B2Apparatus including a radiation source, a filter system for filtering particles out of radiation emitted by the source, and a processing system for processing the radiation, a lithographic apparatus including such an apparatus, and a method of filtering particles out of radiation emitting and propagating from a radiation sourceASML NETHERLANDS BV·Filed 2005·Granted Sep 12, 2006·33 cites·64 claims
- 0494US8129702B2Radiation system with contamination barrierBAKKER LEVINUS PIETER·Filed 2010·Granted Mar 6, 2012·10 cites·3 claims
- 0594US7057190B2Lithographic projection apparatus, particle barrier for use therein, integrated structure manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2004·Granted Jun 6, 2006·51 cites·20 claims
- 0693US7671973B2Optical analysis system using multivariate optical elementsKONINKL PHILIPS ELECTRONICS NV·Filed 2004·Granted Mar 2, 2010·54 cites·17 claims
- 0792US7868304B2Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2005·Granted Jan 11, 2011·17 cites·30 claims
- 0892US7307263B2Lithographic apparatus, radiation system, contaminant trap, device manufacturing method, and method for trapping contaminants in a contaminant trapASML NETHERLANDS BV·Filed 2004·Granted Dec 11, 2007·50 cites·34 claims
- 0990US7463413B2Spectral purity filter for a multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Dec 9, 2008·8 cites·21 claims
- 1090US7336416B2Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Feb 26, 2008·12 cites·18 claims
- 1190US7034308B2Radiation system, contamination barrier, lithographic apparatus, device manufacturing method and device manufactured therebyASML NETHERLANDS BV·Filed 2004·Granted Apr 25, 2006·37 cites·23 claims
- 1289US7088424B2Lithographic projection apparatus, reflector assembly for use therein, and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Aug 8, 2006·18 cites·20 claims
- 1389US6678037B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2001·Granted Jan 13, 2004·32 cites·23 claims
- 1488US8139200B2Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing methodVAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS·Filed 2011·Granted Mar 20, 2012·6 cites·20 claims
- 1588US7145132B2Lithographic apparatus, illumination system and debris trapping systemASML NETHERLANDS BV·Filed 2004·Granted Dec 5, 2006·30 cites·45 claims
- 1688US7116394B2Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning systemZEISS CARL SMT AG·Filed 2003·Granted Oct 3, 2006·31 cites·31 claims
- 1788US6859259B2Lithographic projection apparatus and reflector assembly for use thereinASML NETHERLANDS BV·Filed 2003·Granted Feb 22, 2005·29 cites·23 claims
- 1887US7405825B2Optical analysis systemKONINK PHILIIPS ELECTRONICS N·Filed 2003·Granted Jul 29, 2008·41 cites·16 claims
- 1984US9980698B2Re-calibration of pre-recorded images during interventions using a needle deviceBAKKER LEVINUS PIETER·Filed 2010·Granted May 29, 2018·35 cites·20 claims
- 2084US8835875B2Detection apparatus and detection methodSHE JUN·Filed 2011·Granted Sep 16, 2014·8 cites·15 claims
- 2184US7737425B2Contamination barrier with expandable lamellasASML NETHERLANDS BV·Filed 2007·Granted Jun 15, 2010·5 cites·21 claims
- 2283US7251012B2Lithographic apparatus having a debris-mitigation system, a source for producing EUV radiation having a debris mitigation system and a method for mitigating debrisASML NETHERLANDS BV·Filed 2003·Granted Jul 31, 2007·25 cites·53 claims
- 2383US7247866B2Contamination barrier with expandable lamellasASML NETHERLANDS BV·Filed 2003·Granted Jul 24, 2007·16 cites·21 claims
- 2482US8217347B2System and method for detecting at least one contamination species in a lithographic apparatusBANINE VADIM YEVGENYEVICH·Filed 2011·Granted Jul 10, 2012·3 cites·11 claims
- 2582US7706057B2Spectral purity filter for a multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing methodASML NETHERLANDS BV·Filed 2008·Granted Apr 27, 2010·5 cites·23 claims
- 2682US7485881B2Lithographic apparatus, illumination system, filter system and method for cooling a support of such a filter systemASML NETHERLANDS BV·Filed 2005·Granted Feb 3, 2009·5 cites·30 claims
- 2782US7136141B2Lithographic apparatus with debris suppression, and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Nov 14, 2006·25 cites·27 claims
- 2881US7468521B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Dec 23, 2008·6 cites·19 claims
- 2980US8173975B2Method and device for removing particles generated by means of a radiation source during generation of short-wave radiationJONKERS JEROEN·Filed 2005·Granted May 8, 2012·6 cites·20 claims
- 3080US7897110B2System and method for detecting at least one contamination species in a lithographic apparatusASML NETHERLANDS BV·Filed 2005·Granted Mar 1, 2011·5 cites·14 claims
- 3180US7315346B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Jan 1, 2008·27 cites·20 claims
- 3279US8355131B2Device and method for acquiring image data from a turbid mediumKONINKL PHILIPS ELECTRONICS NV·Filed 2008·Granted Jan 15, 2013·19 cites·17 claims
- 3378US9488574B2Device for imaging the interior of an optically turbid medium and receptacle unit for such a deviceKOEHLER THOMAS·Filed 2008·Granted Nov 8, 2016·19 cites·10 claims
- 3478US9097993B2Optical element and lithographic apparatusBAKKER LEVINUS PIETER·Filed 2012·Granted Aug 4, 2015·2 cites·16 claims
- 3573US6930760B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2003·Granted Aug 16, 2005·10 cites·21 claims
- 3673US6906788B2Lithographic projection apparatus with multiple suppression meshesASML NETHERLANDS BV·Filed 2003·Granted Jun 14, 2005·12 cites·17 claims
- 3772US7061574B2Lithographic apparatus with contamination suppression, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2004·Granted Jun 13, 2006·11 cites·26 claims
- 3871US8102511B2Lithographic apparatus with enhanced spectral purity, device manufacturing method and device manufactured therebyBAKKER LEVINUS PIETER·Filed 2008·Granted Jan 24, 2012·2 cites·19 claims
- 3971US7852460B2Lithographic projection apparatus, reflector assembly for use therein, and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Dec 14, 2010·4 cites·9 claims
- 4069US7256407B2Lithographic projection apparatus and reflector assembly for use thereinASML NETHERLANDS BV·Filed 2005·Granted Aug 14, 2007·2 cites·20 claims
- 4168US7211810B2Method for the protection of an optical element, lithographic apparatus, and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted May 1, 2007·8 cites·32 claims
- 4268US7193229B2Lithographic apparatus, illumination system and method for mitigating debris particlesASML NETHERLANDS BV·Filed 2004·Granted Mar 20, 2007·8 cites·43 claims
- 4367US7405804B2Lithographic apparatus with enhanced spectral purity, device manufacturing method and device manufactured therebyASML NETHERLANDS BV·Filed 2004·Granted Jul 29, 2008·7 cites·30 claims
- 4467US7279690B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Oct 9, 2007·2 cites·37 claims
- 4567US7196343B2Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2004·Granted Mar 27, 2007·9 cites·25 claims
- 4666US8119995B2Device for detection of excitation using a multiple spot arrangementKLUNDER DERK JAN WILFRED·Filed 2006·Granted Feb 21, 2012·2 cites·16 claims
- 4765US7034923B2Optical element, lithographic apparatus comprising such optical element and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Apr 25, 2006·8 cites·21 claims
- 4863US7646869B2System for copy protection of an information carrierKONINKL PHILIPS ELECTRONICS NV·Filed 2004·Granted Jan 12, 2010·4 cites·10 claims
- 4960US7592610B2Mirror for use in a lithographic apparatus, lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2004·Granted Sep 22, 2009·5 cites·30 claims
- 5059US8269179B2Illumination system and filter systemWASSINK ARNOUD CORNELIS·Filed 2008·Granted Sep 18, 2012·1 cites·30 claims
Showing the top 50 of 112 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →