Inventor · disambiguated record
Mark Kiehlbauch
Also filed as: KIEHLBAUCH MARK · KIEHLBAUCH MARK W
51 granted patents·8 pending applications·505 citations·filing 2003–2020
98Inventor score
Top patents by PatentIndex Score
59 records- 0198US10446578B1Methods used in forming an array of elevationally-extending strings of memory cells, methods of forming an array of elevationally-extending strings of memory cells, and methods of forming an array of vertical strings of memory cellsMICRON TECHNOLOGY INC·Filed 2018·Granted Oct 15, 2019·36 cites·27 claims
- 0297US8274777B2High aspect ratio openingsKIEHLBAUCH MARK W·Filed 2008·Granted Sep 25, 2012·51 cites·17 claims
- 0397US8252194B2Methods of removing silicon oxideKIEHLBAUCH MARK W·Filed 2008·Granted Aug 28, 2012·156 cites·23 claims
- 0496US7737039B2Spacer process for on pitch contacts and related structuresMICRON TECHNOLOGY INC·Filed 2007·Granted Jun 15, 2010·25 cites·14 claims
- 0595US10553607B1Method of forming an array of elevationally-extending strings of programmable memory cells and method of forming an array of elevationally-extending strings of memory cellsMICRON TECHNOLOGY INC·Filed 2018·Granted Feb 4, 2020·13 cites·26 claims
- 0694US8088691B2Selective etch chemistries for forming high aspect ratio features and associated structuresKIEHLBAUCH MARK·Filed 2009·Granted Jan 3, 2012·23 cites·20 claims
- 0794US7517804B2Selective etch chemistries for forming high aspect ratio features and associated structuresMICRON TECHNOLOGIES INC·Filed 2006·Granted Apr 14, 2009·20 cites·16 claims
- 0893US8211803B2Spacer process for on pitch contacts and related structuresSANDHU GURTEJ·Filed 2010·Granted Jul 3, 2012·12 cites·11 claims
- 0992US7250114B2Methods of finishing quartz glass surfaces and components made by the methodsLAM RES CORP·Filed 2003·Granted Jul 31, 2007·36 cites·10 claims
- 1091US8614151B2Method of etching a high aspect ratio contactBENSON RUSSELL A·Filed 2008·Granted Dec 24, 2013·22 cites·28 claims
- 1190US8039399B2Methods of forming patterns utilizing lithography and spacersMICRON TECHNOLOGY INC·Filed 2008·Granted Oct 18, 2011·15 cites·28 claims
- 1289US7402258B2Methods of removing metal contaminants from a component for a plasma processing apparatusLAM RES CORP·Filed 2006·Granted Jul 22, 2008·11 cites·6 claims
- 1386US8268695B2Methods of making capacitorsKIEHLBAUCH MARK·Filed 2008·Granted Sep 18, 2012·11 cites·8 claims
- 1485US7824986B2Methods of forming a plurality of transistor gates, and methods of forming a plurality of transistor gates having at least two different work functionsMICRON TECHNOLOGY INC·Filed 2008·Granted Nov 2, 2010·12 cites·35 claims
- 1584US8910591B2Apparatus and methods for capacitively coupled plasma vapor processing of semiconductor wafersMICRON TECHNOLOGY INC·Filed 2013·Granted Dec 16, 2014·5 cites·28 claims
- 1684US8034687B2Methods of forming a plurality of transistor gates, and methods of forming a plurality of transistor gates having at least two different work functionsMICRON TECHNOLOGY INC·Filed 2010·Granted Oct 11, 2011·8 cites·33 claims
- 1784US8026180B2Methods of modifying oxide spacersMICRON TECHNOLOGY INC·Filed 2007·Granted Sep 27, 2011·8 cites·17 claims
- 1883US7670905B2Semiconductor processing methods, and methods of forming flash memory structuresMICRON TECHNOLOGY INC·Filed 2007·Granted Mar 2, 2010·7 cites·7 claims
- 1978US8388851B2Capacitor forming methodsKIEHLBAUCH MARK·Filed 2008·Granted Mar 5, 2013·5 cites·20 claims
- 2077US9595387B2High aspect ratio openingsMICRON TECHNOLOGY INC·Filed 2014·Granted Mar 14, 2017·3 cites·20 claims
- 2177US7964471B2Methods of forming capacitorsMICRON TECHNOLOGY INC·Filed 2010·Granted Jun 21, 2011·3 cites·30 claims
- 2276US11678477B2Semiconductor constructions, and semiconductor processing methodsMICRON TECHNOLOGY INC·Filed 2020·Granted Jun 13, 2023·0 cites·8 claims
- 2375US8318035B2Methods of finishing quartz glass surfaces and components made by the methodsKIEHLBAUCH MARK W·Filed 2007·Granted Nov 27, 2012·3 cites·32 claims
- 2473US9224798B2Capacitor forming methodsMICRON TECHNOLOGY INC·Filed 2014·Granted Dec 29, 2015·2 cites·13 claims
- 2573US9005473B2Gaseous compositions comprising hydrogen fluoride and an alkylated ammonia derivativeKIEHLBAUCH MARK W·Filed 2012·Granted Apr 14, 2015·2 cites·10 claims
- 2673US7553770B2Reverse masking profile improvements in high aspect ratio etchMICRON TECHNOLOGY INC·Filed 2007·Granted Jun 30, 2009·3 cites·20 claims
- 2772US7696056B2Methods of forming capacitorsMICRON TECHNOLOGY INC·Filed 2008·Granted Apr 13, 2010·3 cites·30 claims
- 2869US8772166B2Spacer process for on pitch contacts and related structuresSANDHU GURTEJ·Filed 2012·Granted Jul 8, 2014·1 cites·20 claims
- 2968US8721836B2Plasma processing with preionized and predissociated tuning gases and associated systems and methodsKIEHLBAUCH MARK·Filed 2008·Granted May 13, 2014·1 cites·9 claims
- 3068US8375890B2Apparatus and methods for capacitively coupled plasma vapor processing of semiconductor wafersMICRON TECHNOLOGY INC·Filed 2007·Granted Feb 19, 2013·2 cites·24 claims
- 3165US8734656B2Capacitor forming methodsMICRON TECHNOLOGY INC·Filed 2013·Granted May 27, 2014·1 cites·13 claims
- 3264US8524561B2Methods of forming a plurality of transistor gates, and methods of forming a plurality of transistor gates having at least two different work functionsSANDHU GURTEJ S·Filed 2011·Granted Sep 3, 2013·1 cites·30 claims
- 3363US8513135B2Methods of modifying oxide spacersGREELEY JOSEPH NEIL·Filed 2011·Granted Aug 20, 2013·1 cites·20 claims
- 3463US8512582B2Methods of patterning a substrateKIEHLBAUCH MARK·Filed 2008·Granted Aug 20, 2013·1 cites·39 claims
- 3561US9090460B2Plasma processing with preionized and predissociated tuning gases and associated systems and methodsMICRON TECHNOLOGY INC·Filed 2014·Granted Jul 28, 2015·0 cites·18 claims
- 3661US8759228B2Chemistry and compositions for manufacturing integrated circuitsWILSON AARON·Filed 2007·Granted Jun 24, 2014·2 cites·24 claims
- 3760US10879247B2Semiconductor constructions, and semiconductor processing methodsMICRON TECHNOLOGY INC·Filed 2018·Granted Dec 29, 2020·0 cites·15 claims
- 3858US7910487B2Reverse masking profile improvements in high aspect ratio etchMICRON TECHNOLOGY INC·Filed 2009·Granted Mar 22, 2011·0 cites·20 claims
- 3958US2014299997A1Spacer process for on pitch contacts and related structuresMICRON TECHNOLOGY INC·Filed 2014·Application pending·0 cites
- 4055US10014301B2Semiconductor constructionsMICRON TECHNOLOGY INC·Filed 2015·Granted Jul 3, 2018·0 cites·20 claims
- 4155US9005463B2Methods of forming a substrate openingMICRON TECHNOLOGY INC·Filed 2013·Granted Apr 14, 2015·0 cites·38 claims
- 4255US8760841B2High aspect ratio openingsKIEHLBAUCH MARK W·Filed 2012·Granted Jun 24, 2014·0 cites·16 claims
- 4354US9153497B2Semiconductor constructionsKIEHLBAUCH MARK·Filed 2012·Granted Oct 6, 2015·0 cites·7 claims
- 4454US8696922B2Methods of plasma etching platinum-comprising materials, methods of processing semiconductor substrates in the fabrication of integrated circuitry, and methods of forming a plurality of memory cellsZHU HONGBIN·Filed 2009·Granted Apr 15, 2014·0 cites·31 claims
- 4554US2015287571A1Plasma processing with preionized and predissociated tuning gases and associated systems and methodsMICRON TECHNOLOGY INC·Filed 2015·Application pending·0 cites
- 4654US2014264152A1Chemistry and Compositions for Manufacturing Integrated CircuitsMICRON TECHNOLOGY INC·Filed 2014·Application pending·0 cites
- 4753US8623725B2Methods of forming capacitorsKIEHLBAUCH MARK·Filed 2012·Granted Jan 7, 2014·0 cites·30 claims
- 4853US8500913B2Methods for treating surfaces, and methods for removing one or more materials from surfacesKIEHLBAUCH MARK·Filed 2007·Granted Aug 6, 2013·0 cites·8 claims
- 4952US8853050B2Methods of forming capacitorsKIEHLBAUCH MARK·Filed 2012·Granted Oct 7, 2014·0 cites·23 claims
- 5052US8241987B2Methods of forming capacitorsKIEHLBAUCH MARK·Filed 2011·Granted Aug 14, 2012·0 cites·35 claims
Showing the top 50 of 59 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Mark Kiehlbauch files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →