Inventor · disambiguated record
Masaki Ohashi
Also filed as: OHASHI MASAKI
163 granted patents·45 pending applications·1,117 citations·filing 1989–2025
99Inventor score
Top patents by PatentIndex Score
208 records- 0198US11415887B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2020·Granted Aug 16, 2022·9 cites·13 claims
- 0298US10295904B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2017·Granted May 21, 2019·43 cites·17 claims
- 0398US10101654B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2017·Granted Oct 16, 2018·12 cites·15 claims
- 0498US9250518B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2014·Granted Feb 2, 2016·35 cites·15 claims
- 0598US9091918B2Sulfonium salt, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2014·Granted Jul 28, 2015·58 cites·19 claims
- 0698US7569326B2Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Aug 4, 2009·129 cites·11 claims
- 0797US8173354B2Sulfonium salt, resist composition, and patterning processOHSAWA YOUICHI·Filed 2010·Granted May 8, 2012·23 cites·8 claims
- 0897US8057985B2Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning processOHASHI MASAKI·Filed 2009·Granted Nov 15, 2011·52 cites·11 claims
- 0996US11340527B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2020·Granted May 24, 2022·3 cites·16 claims
- 1096US10120279B2Negative resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2017·Granted Nov 6, 2018·8 cites·13 claims
- 1196US8785105B2Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making methodOHSAWA YOUICHI·Filed 2011·Granted Jul 22, 2014·17 cites·16 claims
- 1296US8361693B2Chemically amplified positive photoresist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2010·Granted Jan 29, 2013·32 cites·10 claims
- 1396US8283104B2Sulfonate and its derivative, photosensitive acid generator, and resist composition and patterning process using the sameOHASHI MASAKI·Filed 2010·Granted Oct 9, 2012·14 cites·20 claims
- 1496US8114571B2Photoacid generator, resist composition, and patterning processOHASHI MASAKI·Filed 2009·Granted Feb 14, 2012·29 cites·17 claims
- 1596US8105748B2Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning processOHASHI MASAKI·Filed 2009·Granted Jan 31, 2012·81 cites·11 claims
- 1696US8057982B2Monomer, resist composition, and patterning processHATAKEYAMA JUN·Filed 2009·Granted Nov 15, 2011·33 cites·17 claims
- 1795US11693314B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2021·Granted Jul 4, 2023·4 cites·19 claims
- 1895US11604411B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2020·Granted Mar 14, 2023·3 cites·13 claims
- 1995US11560355B2Onium salt, chemically amplified resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2020·Granted Jan 24, 2023·4 cites·24 claims
- 2095US11385544B2Composition for forming silicon-containing resist underlayer film and patterning processSHINETSU CHEMICAL CO·Filed 2020·Granted Jul 12, 2022·4 cites·20 claims
- 2195US11281101B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2019·Granted Mar 22, 2022·6 cites·11 claims
- 2295US10474030B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2017·Granted Nov 12, 2019·8 cites·13 claims
- 2395US10101653B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2017·Granted Oct 16, 2018·7 cites·13 claims
- 2495US9897914B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2016·Granted Feb 20, 2018·7 cites·14 claims
- 2595US7670751B2Photoacid generator, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2008·Granted Mar 2, 2010·26 cites·18 claims
- 2695US7531289B2Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning processSHINETSU CHEMICAL CO·Filed 2005·Granted May 12, 2009·16 cites·13 claims
- 2794US11181823B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2019·Granted Nov 23, 2021·5 cites·15 claims
- 2894US11163232B2Resist composition, patterning process, and barium saltSHINETSU CHEMICAL CO·Filed 2018·Granted Nov 2, 2021·6 cites·14 claims
- 2994US10323113B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2017·Granted Jun 18, 2019·7 cites·16 claims
- 3094US8114570B2Photoacid generator, resist composition, and patterning processOHSAWA YOUICHI·Filed 2009·Granted Feb 14, 2012·15 cites·16 claims
- 3193US11435665B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2019·Granted Sep 6, 2022·5 cites·14 claims
- 3293US11187980B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2019·Granted Nov 30, 2021·5 cites·14 claims
- 3393US10180626B2Sulfonium salt, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2017·Granted Jan 15, 2019·9 cites·19 claims
- 3493US8426115B2Patterning process and resist compositionHATAKEYAMA JUN·Filed 2010·Granted Apr 23, 2013·9 cites·13 claims
- 3593US8394570B2Sulfonium salt, acid generator, resist composition, photomask blank, and patterning processOHASHI MASAKI·Filed 2009·Granted Mar 12, 2013·12 cites·12 claims
- 3693US7629108B2Nitrogen-containing organic compound, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Dec 8, 2009·16 cites·10 claims
- 3792US11774853B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2019·Granted Oct 3, 2023·5 cites·17 claims
- 3892US10613436B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2018·Granted Apr 7, 2020·5 cites·13 claims
- 3992US10248022B2Sulfonium compound, making method, resist composition, and pattern forming processSHINETSU CHEMICAL CO·Filed 2017·Granted Apr 2, 2019·8 cites·13 claims
- 4092US10173975B2Sulfonium compound, resist composition, and pattern forming processSHINETSU CHEMICAL CO·Filed 2017·Granted Jan 8, 2019·8 cites·11 claims
- 4192US10078264B2Resist composition, patterning process, and barium, cesium and cerium saltsSHINETSU CHEMICAL CO·Filed 2016·Granted Sep 18, 2018·4 cites·12 claims
- 4292US9221742B2Sulfonium salt, chemically amplified resist composition, and pattern forming processSHINETSU CHEMICAL CO·Filed 2014·Granted Dec 29, 2015·7 cites·17 claims
- 4391US12050402B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2021·Granted Jul 30, 2024·2 cites·17 claims
- 4491US11460772B2Positive resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2019·Granted Oct 4, 2022·2 cites·12 claims
- 4591US11175580B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2019·Granted Nov 16, 2021·4 cites·14 claims
- 4691US10012902B2Positive resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2017·Granted Jul 3, 2018·7 cites·6 claims
- 4791US8507175B2Patterning process and resist compositionHATAKEYAMA JUN·Filed 2010·Granted Aug 13, 2013·13 cites·21 claims
- 4891US7527912B2Photoacid generators, resist compositions, and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted May 5, 2009·38 cites·15 claims
- 4990US11269253B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2020·Granted Mar 8, 2022·2 cites·15 claims
- 5090US11022883B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2018·Granted Jun 1, 2021·3 cites·12 claims
Showing the top 50 of 208 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Masaki Ohashi files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →