Inventor · disambiguated record
Madhur Sachan
Also filed as: SACHAN MADHUR · SACHAN MADHUR SINGH
14 granted patents·23 pending applications·12 citations·filing 2019–2025
87Inventor score
Top patents by PatentIndex Score
37 records- 0194US11621172B2Vapor phase thermal etch solutions for metal oxo photoresistsAPPLIED MATERIALS INC·Filed 2021·Granted Apr 4, 2023·2 cites·14 claims
- 0285US11886120B2Deposition of semiconductor integration filmsAPPLIED MATERIALS INC·Filed 2021·Granted Jan 30, 2024·1 cites·20 claims
- 0385US11881402B2Self aligned multiple patterningAPPLIED MATERIALS INC·Filed 2021·Granted Jan 23, 2024·1 cites·9 claims
- 0483US11562904B2Deposition of semiconductor integration filmsAPPLIED MATERIALS INC·Filed 2020·Granted Jan 24, 2023·1 cites·6 claims
- 0582US11869807B2Fully self-aligned subtractive etchAPPLIED MATERIALS INC·Filed 2021·Granted Jan 9, 2024·1 cites·14 claims
- 0682US10790191B2Selective removal process to create high aspect ratio fully self-aligned viaMICROMATERIALS LLC·Filed 2019·Granted Sep 29, 2020·3 cites·15 claims
- 0781US12068170B2Vapor phase thermal etch solutions for metal oxo photoresistsAPPLIED MATERIALS INC·Filed 2023·Granted Aug 20, 2024·0 cites·10 claims
- 0879US11437274B2Fully self-aligned viaMICROMATERIALS LLC·Filed 2020·Granted Sep 6, 2022·1 cites·9 claims
- 0978US12033866B2Vapor phase thermal etch solutions for metal oxo photoresistsAPPLIED MATERIALS INC·Filed 2023·Granted Jul 9, 2024·0 cites·6 claims
- 1078US11437273B2Self-aligned contact and contact over active gate structuresMircomaterials LLC·Filed 2020·Granted Sep 6, 2022·2 cites·8 claims
- 1173US12300491B2Deposition of semiconductor integration filmsAPPLIED MATERIALS INC·Filed 2022·Granted May 13, 2025·0 cites·8 claims
- 1272US2025028242A1Integrated solution with low temperature dry develop for euv photoresistAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1368US12416863B2Dry develop process of photoresistAPPLIED MATERIALS INC·Filed 2021·Granted Sep 16, 2025·0 cites·17 claims
- 1467US2024160100A1Integrated solution with low temperature dry develop for euv photoresistAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1565US2025053086A1Post development treatment for metal-oxide photoresistsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1665US2024271276A1Multiple-metal-containing metal-oxo photoresist films by cvd and ald methodsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1765US2025321489A1Methods for euv dry developmentAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 1865US2025180987A1Dry development for metal-oxide photo resistsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1964US2025028248A1Dry development for metal-oxide photoresistsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2063US2022359289A1Fully self-aligned viaMICROMATERIALS LLC·Filed 2022·Application pending·0 cites
- 2163US2024319603A1Euv sensitive metal oxide material as underlayer for thin car to improve pattern transferAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2263US2024027916A1Fingerprinting and process control of photosensitive film deposition chamberAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2362US2024272552A1Preferential infiltration in lithographic process flow for euv car resistAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2462US2022367270A1Self-aligned contact and contact over active gate structuresMICROMATERIALS LLC·Filed 2022·Application pending·0 cites
- 2560US11037825B2Selective removal process to create high aspect ratio fully self-aligned viaMICROMATERIALS LLC·Filed 2020·Granted Jun 15, 2021·0 cites·10 claims
- 2660US2025167001A1Patterning processes utilizing directional depositionAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2760US2024427308A1Substrate process operation analysis application and generation of visualizationsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2859US11133152B2Methods and apparatus for performing profile metrology on semiconductor structuresAPPLIED MATERIALS INC·Filed 2019·Granted Sep 28, 2021·0 cites·20 claims
- 2959US2025329531A1Selective chemical method for contact hole shrinkingAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3058US2024194484A1Design, control, and optimization of photosensitivity modulation along photoresist film depthAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3158US2025166994A1Deposition process for patterning edge placement error improvementAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3257US2025379055A1Combinatorial treatments for euv patterned layersAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 3356US2025379063A1Etch back for enhanced directional depositionAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 3453US2025062123A1Treatments for thin films used in photolithographyAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3552US2022342302A1Dual tone photoresistsAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 3648US2025259837A1Responsive layer for photolithography film stackAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 3744US2022198333A1Recipe optimization through machine learningAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →