Inventor · disambiguated record
Markus Schwab
Also filed as: SCHWAB MARKUS
30 granted patents·9 pending applications·189 citations·filing 2003–2025
96Inventor score
Top patents by PatentIndex Score
39 records- 0198US10527832B2Imaging optical unit and projection exposure apparatus including sameZEISS CARL SMT GMBH·Filed 2017·Granted Jan 7, 2020·23 cites·20 claims
- 0295US7847921B2Microlithographic exposure method as well as a projection exposure system for carrying out the methodZEISS CARL SMT AG·Filed 2008·Granted Dec 7, 2010·30 cites·7 claims
- 0395US7408616B2Microlithographic exposure method as well as a projection exposure system for carrying out the methodZEISS CARL SMT AG·Filed 2004·Granted Aug 5, 2008·70 cites·44 claims
- 0493US10656400B2Imaging optical unit and projection exposure unit including sameZEISS CARL SMT GMBH·Filed 2017·Granted May 19, 2020·7 cites·20 claims
- 0593US10545323B2Projection optical unit for EUV projection lithographyZEISS CARL SMT GMBH·Filed 2018·Granted Jan 28, 2020·13 cites·21 claims
- 0692US10146033B2Projection optical unit for imaging an object field into an image field, and projection exposure apparatus comprising such a projection optical unitZEISS CARL SMT GMBH·Filed 2015·Granted Dec 4, 2018·5 cites·24 claims
- 0788US9046786B2Illumination system of a microlithographic projection exposure apparatusPATRA MICHAEL·Filed 2012·Granted Jun 2, 2015·5 cites·19 claims
- 0885US9983483B2Illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2016·Granted May 29, 2018·2 cites·19 claims
- 0984US9477157B2Illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Oct 25, 2016·2 cites·19 claims
- 1082US9678438B2Illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Jun 13, 2017·2 cites·21 claims
- 1176US9213244B2Illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2012·Granted Dec 15, 2015·2 cites·26 claims
- 1275US9759550B2Projection exposure apparatus for microlithography comprising an optical distance measurement systemZEISS CARL SMT GMBH·Filed 2015·Granted Sep 12, 2017·2 cites·20 claims
- 1374US8264668B2Illumination system of a microlithographic projection exposure apparatusFIOLKA DAMIAN·Filed 2009·Granted Sep 11, 2012·5 cites·16 claims
- 1473US10012911B2Projection exposure apparatus with wavefront measuring device and optical wavefront manipulatorZEISS CARL SMT GMBH·Filed 2017·Granted Jul 3, 2018·1 cites·20 claims
- 1573US8928859B2Illumination system of a microlithographic projection exposure apparatusFIOLKA DAMIAN·Filed 2012·Granted Jan 6, 2015·2 cites·20 claims
- 1672US2025389927A1Optical modules for the ultraviolet wavelength rangeZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 1770US2025341782A1Chromatically corrected imaging illumination optical unit for use in a lithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 1869US2025068081A1Illumination system, projection illumination facility and projection illumination methodZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 1969US2025068083A1Catadioptric projection objective, projection illumination system and projection illumination methodZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 2068US2025116940A1Imaging euv optical unit for imaging an object field into an image fieldZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 2166US9170499B2Illumination system of a microlithographic projection exposure apparatus comprising a depolarizing elementZEISS CARL SMT GMBH·Filed 2014·Granted Oct 27, 2015·1 cites·20 claims
- 2266US7508489B2Method of manufacturing a miniaturized deviceZEISS CARL SMT AG·Filed 2005·Granted Mar 24, 2009·2 cites·20 claims
- 2365US11953030B2Hydraulic system for an industrial truckSTILL GMBH·Filed 2022·Granted Apr 9, 2024·0 cites·18 claims
- 2465US7423871B2Electric device with improved cooling and casing thereforDET INT HOLDING LTD·Filed 2003·Granted Sep 9, 2008·12 cites·25 claims
- 2562US10114293B2Illumination system and projection objective of a mask inspection apparatusFELDMANN HEIKO·Filed 2012·Granted Oct 30, 2018·1 cites·45 claims
- 2659US10558026B2Projection optical unit for imaging an object field into an image field, and projection exposure apparatus comprising such a projection optical unitZEISS CARL SMT GMBH·Filed 2018·Granted Feb 11, 2020·0 cites·20 claims
- 2759US7808615B2Projection exposure apparatus and method for operating the sameZEISS CARL SMT AG·Filed 2006·Granted Oct 5, 2010·2 cites·18 claims
- 2858US10288894B2Optical component for use in a radiation source module of a projection exposure systemZEISS CARL SMT GMBH·Filed 2017·Granted May 14, 2019·0 cites·20 claims
- 2956US2023303374A1Hydraulic Control System of a Hoist Drive of a Lifting Frame of an Industrial TruckSTILL GMBH·Filed 2023·Application pending·0 cites
- 3055US12275625B2Hydraulic system for an industrial truckLINDE MATERIAL HANDLING GMBH·Filed 2023·Granted Apr 15, 2025·0 cites·14 claims
- 3152US9535331B2Optical system for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Jan 3, 2017·0 cites·22 claims
- 3251US8767181B2Microlithographic exposure method as well as a projection exposure system for carrying out the methodGRUNER TORALF·Filed 2010·Granted Jul 1, 2014·0 cites·19 claims
- 3351US8542342B2Method of manufacturing a miniaturized deviceSCHWAB MARKUS·Filed 2009·Granted Sep 24, 2013·0 cites·22 claims
- 3451US2024231107A1Display devicetooz technologies GmbH·Filed 2022·Application pending·0 cites
- 3549US11226481B2Methods and apparatuses for designing optical systems using machine learning with delano diagramsZEISS CARL AG·Filed 2018·Granted Jan 18, 2022·0 cites·17 claims
- 3644US2009040495A1Illumination system including an optical filterZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 3739US2007024972A1Polarization-optimized illumination systemZEISS CARL SMT AG·Filed 2006·Application pending·0 cites
- 3838US8537335B2Illumination system for a microlithography projection exposure apparatus, microlithography projection exposure apparatus comprising such an illumination system, and fourier optical systemSCHWAB MARKUS·Filed 2010·Granted Sep 17, 2013·0 cites·26 claims
- 3937US10162267B2Projection exposure apparatus including mechanism to reduce influence of pressure fluctuationsZEISS CARL SMT GMBH·Filed 2015·Granted Dec 25, 2018·0 cites·31 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →