Inventor · disambiguated record
Martin L. Zucker
Also filed as: ZUCKER MARTIN · ZUCKER MARTIN L
16 granted patents·7 pending applications·182 citations·filing 1995–2022
93Inventor score
Files withMATTSON TECH INC12TEGAL CORP3BEIJING E TOWN SEMICONDUCTOR TECH CO LTD1DEVINE DANIEL J1NIEWMIERZYCKI LESZEK1
Top patents by PatentIndex Score
23 records- 0195US11348767B2Plasma processing apparatus having a focus ring adjustment assemblyMATTSON TECH INC·Filed 2020·Granted May 31, 2022·4 cites·15 claims
- 0292US7658586B2Advanced low cost high throughput processing platformMATTSON TECH INC·Filed 2005·Granted Feb 9, 2010·20 cites·32 claims
- 0392US6835278B2Systems and methods for remote plasma cleanMATTSON TECH INC·Filed 2001·Granted Dec 28, 2004·62 cites·16 claims
- 0491US7972444B2Workpiece support with fluid zones for temperature controlMATTSON TECH INC·Filed 2007·Granted Jul 5, 2011·20 cites·20 claims
- 0591US7563068B2Low cost high throughput processing platformMATTSON TECH INC·Filed 2007·Granted Jul 21, 2009·16 cites·25 claims
- 0689US11508560B2Focus ring adjustment assembly of a system for processing workpieces under vacuumMATTSON TECH INC·Filed 2020·Granted Nov 22, 2022·2 cites·13 claims
- 0788US8405005B2Electrostatic chuck system and process for radially tuning the temperature profile across the surface of a substrateZUCKER MARTIN L·Filed 2010·Granted Mar 26, 2013·17 cites·19 claims
- 0886US9184072B2Advanced multi-workpiece processing chamberDEVINE DANIEL J·Filed 2007·Granted Nov 10, 2015·16 cites·45 claims
- 0980US10049858B2System and method for protection of vacuum seals in plasma processing systemsMATTSON TECH INC·Filed 2014·Granted Aug 14, 2018·5 cites·17 claims
- 1077US11251026B2Material deposition prevention on a workpiece in a process chamberMATTSON TECH INC·Filed 2018·Granted Feb 15, 2022·4 cites·16 claims
- 1175US2023091035A1Transfer Position for Workpieces and Replaceable Parts in a Vacuum Processing ApparatusBEIJING E TOWN SEMICONDUCTOR TECH CO LTD·Filed 2022·Application pending·0 cites
- 1270US11195704B2Pedestal assembly for plasma processing apparatusMATTSON TECH INC·Filed 2018·Granted Dec 7, 2021·1 cites·11 claims
- 1368US11515127B2End effectors for moving workpieces and replaceable parts within a system for processing workpieces under vacuumMATTSON TECH INC·Filed 2020·Granted Nov 29, 2022·0 cites·12 claims
- 1463US2010190331A1System for Depositing a Film Onto a Substrate Using a Low Vapor Pressure Gas PrecursorSELBREDE STEVEN C·Filed 2009·Application pending·0 cites
- 1550US5958139APlasma etch systemTEGAL CORP·Filed 1997·Granted Sep 28, 1999·7 cites·7 claims
- 1645US8668422B2Low cost high throughput processing platformNIEWMIERZYCKI LESZEK·Filed 2004·Granted Mar 11, 2014·2 cites·27 claims
- 1744US5985089APlasma etch systemTEGAL CORP·Filed 1995·Granted Nov 16, 1999·5 cites·35 claims
- 1844US2004025787A1System for depositing a film onto a substrate using a low pressure gas precursorFiled 2003·Application pending·0 cites
- 1944US2020243305A1Post Plasma Gas Injection In A Separation GridMATTSON TECH INC·Filed 2020·Application pending·0 cites
- 2043US2004247787A1Effluent pressure control for use in a processing systemFiled 2004·Application pending·0 cites
- 2141US2007012251A1Seal arrangement with corrosion barrier and methodZUCKER MARTIN·Filed 2006·Application pending·0 cites
- 2241US2019088512A1Cooled Focus Ring for Plasma Processing ApparatusMATTSON TECH INC·Filed 2018·Application pending·0 cites
- 2332US6120610APlasma etch systemTEGAL CORP·Filed 1999·Granted Sep 19, 2000·1 cites·5 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →