Inventor · disambiguated record
Ming-Jui Chen
Also filed as: CHEN MING-JUI
44 granted patents·6 pending applications·119 citations·filing 2001–2025
97Inventor score
Files withUNITED MICROELECTRONICS CORP38HUANG CHUN-HSIEN3HSIEH TE-HSIEN2HUANG CHIA-WEI2KUO HUI-FANG1
Top patents by PatentIndex Score
50 records- 0194US8782572B1Method of optical proximity correctionUNITED MICROELECTRONICS CORP·Filed 2013·Granted Jul 15, 2014·9 cites·8 claims
- 0292US8627242B1Method for making photomask layoutUNITED MICROELECTRONICS CORP·Filed 2013·Granted Jan 7, 2014·9 cites·11 claims
- 0390US8701052B1Method of optical proximity correction in combination with double patterning techniqueUNITED MICROELECTRONICS CORP·Filed 2013·Granted Apr 15, 2014·7 cites·11 claims
- 0488US2025366086A1Semiconductor device and method for fabricating the sameUNITED MICROELECTRONICS CORP·Filed 2025·Application pending·0 cites
- 0587US9524361B2Method for decomposing a layout of an integrated circuitUNITED MICROELECTRONICS CORP·Filed 2015·Granted Dec 20, 2016·6 cites·12 claims
- 0687US9104833B2Mask set for double exposure process and method of using the mask setUNITED MICROELECTRONICS CORP·Filed 2014·Granted Aug 11, 2015·5 cites·18 claims
- 0787US8151221B2Method to compensate optical proximity correctionHUANG CHUN-HSIEN·Filed 2010·Granted Apr 3, 2012·6 cites·5 claims
- 0883US9785046B2Pattern verifying methodUNITED MICROELECTRONICS CORP·Filed 2015·Granted Oct 10, 2017·4 cites·11 claims
- 0983US6420077B1Contact hole model-based optical proximity correction methodUNITED MICROELECTRONIC CORP·Filed 2001·Granted Jul 16, 2002·23 cites·5 claims
- 1082US8930858B1Method for optical proximity correctionUNITED MICROELECTRONICS CORP·Filed 2013·Granted Jan 6, 2015·7 cites·22 claims
- 1179US8598712B2Semiconductor structure formed by double patterning techniqueHUANG CHIA-WEI·Filed 2011·Granted Dec 3, 2013·4 cites·6 claims
- 1279US8321820B2Method to compensate optical proximity correctionHUANG CHUN-HSIEN·Filed 2012·Granted Nov 27, 2012·3 cites·5 claims
- 1378US12408393B2Semiconductor device with a single diffusion break structure and a gate structure having aligned sidewallsUNITED MICROELECTRONICS CORP·Filed 2023·Granted Sep 2, 2025·0 cites·8 claims
- 1478US12278265B2Method for fabricating a fin with minimal length between two single-diffusion break (SDB) trenchesUNITED MICROELECTRONICS CORP·Filed 2023·Granted Apr 15, 2025·0 cites·10 claims
- 1577US9613969B2Semiconductor structure and method of forming the sameUNITED MICROELECTRONICS CORP·Filed 2015·Granted Apr 4, 2017·2 cites·6 claims
- 1677US8778604B2Mask set for double exposure process and method of using the mask setKUO HUI-FANG·Filed 2012·Granted Jul 15, 2014·4 cites·8 claims
- 1775US8741507B1Method for separating photomask patternUNITED MICROELECTRONICS CORP·Filed 2013·Granted Jun 3, 2014·2 cites·9 claims
- 1874US9047658B2Method of optical proximity correctionUNITED MICROELECTRONICS CORP·Filed 2013·Granted Jun 2, 2015·4 cites·22 claims
- 1973US9208276B1Method for generating layout patternUNITED MICROELECTRONICS CORP·Filed 2015·Granted Dec 8, 2015·1 cites·9 claims
- 2073US8966410B2Semiconductor structure and method for fabricating semiconductor layoutUNITED MICROELECTRONICS CORP·Filed 2013·Granted Feb 24, 2015·2 cites·31 claims
- 2173US8383299B2Double patterning mask set and method of forming thereofUNITED MICROELECTRONICS CORP·Filed 2011·Granted Feb 26, 2013·3 cites·10 claims
- 2272US8885917B2Mask pattern and correcting method thereofHSIEH TE-HSIEN·Filed 2011·Granted Nov 11, 2014·2 cites·11 claims
- 2369US8782569B1Method for inspecting photo-maskUNITED MICROELECTRONICS CORP·Filed 2013·Granted Jul 15, 2014·2 cites·6 claims
- 2468US11715759B2Semiconductor device with a single diffusion break structure having a sidewall aligned with a gate sidewallUNITED MICROELECTRONICS CORP·Filed 2020·Granted Aug 1, 2023·0 cites·9 claims
- 2566US9627036B2Static random access memory layout structureUNITED MICROELECTRONICS CORP·Filed 2015·Granted Apr 18, 2017·2 cites·10 claims
- 2665US8321822B2Method and computer-readable medium of optical proximity correctionYANG YU-SHIANG·Filed 2010·Granted Nov 27, 2012·2 cites·10 claims
- 2763US8423923B2Optical proximity correction methodHUANG CHIA-WEI·Filed 2011·Granted Apr 16, 2013·1 cites·12 claims
- 2860US9368365B1Method for forming a semiconductor structureUNITED MICROELECTRONICS CORP·Filed 2015·Granted Jun 14, 2016·1 cites·10 claims
- 2957US7312020B2Lithography methodUNITED MICROELECTRONICS CORP·Filed 2003·Granted Dec 25, 2007·6 cites·20 claims
- 3055US9141744B2Method for generating layout patternUNITED MICROELECTRONICS CORP·Filed 2013·Granted Sep 22, 2015·0 cites·9 claims
- 3154US2024162038A1Photomask structure, semiconductor structure and manufacturing method thereofUNITED MICROELECTRONICS CORP·Filed 2023·Application pending·0 cites
- 3252US9905562B2Semiconductor integrated circuit layout structureUNITED MICROELECTRONICS CORP·Filed 2017·Granted Feb 27, 2018·0 cites·6 claims
- 3351US9859170B2Method of forming semiconductor structureUNITED MICROELECTRONICS CORP·Filed 2017·Granted Jan 2, 2018·0 cites·13 claims
- 3449US9673145B2Semiconductor integrated circuit layout structureUNITED MICROELECTRONICS CORP·Filed 2015·Granted Jun 6, 2017·0 cites·14 claims
- 3548US8745547B1Method for making photomask layoutUNITED MICROELECTRONICS CORP·Filed 2013·Granted Jun 3, 2014·0 cites·13 claims
- 3646US9274416B2Method for forming photo-mask and OPC methodUNITED MICROELECTRONICS CORP·Filed 2013·Granted Mar 1, 2016·0 cites·10 claims
- 3745US9262820B2Method and apparatus for integrated circuit designUNITED MICROELECTRONICS CORP·Filed 2014·Granted Feb 16, 2016·0 cites·13 claims
- 3845US7116815B2Chrome-less mask inspection methodUNITED MICROELECTRONICS CORP·Filed 2003·Granted Oct 3, 2006·1 cites·12 claims
- 3944US8470655B1Method for designing stressor patternHUANG CHUN-HSIEN·Filed 2012·Granted Jun 25, 2013·0 cites·10 claims
- 4044US7141337B2Phase shift maskUNITED MICROELECTRONICS CORP·Filed 2003·Granted Nov 28, 2006·1 cites·13 claims
- 4142US10153034B2Static random access memory unit structureUNITED MICROELECTRONICS CORP·Filed 2017·Granted Dec 11, 2018·0 cites·9 claims
- 4242US9747404B2Method for optimizing an integrated circuit layout designUNITED MICROELECTRONICS CORP·Filed 2015·Granted Aug 29, 2017·0 cites·15 claims
- 4342US8822328B1Method for patterning semiconductor structureUNITED MICROELECTRONICS CORP·Filed 2013·Granted Sep 2, 2014·0 cites·18 claims
- 4442US8806391B2Method of optical proximity correction according to complexity of mask patternHSIEH TE-HSIEN·Filed 2012·Granted Aug 12, 2014·0 cites·14 claims
- 4542US2015036116A1Aperture for photolithographyUNITED MICROELECTRONICS CORP·Filed 2013·Application pending·0 cites
- 4640US2014282295A1Method for Forming Photo-masks and OPC MethodUNITED MICROELECTRONICS CORP·Filed 2013·Application pending·0 cites
- 4738US9653346B2Integrated FinFET structure having a contact plug pitch larger than fin and first metal pitchUNITED MICROELECTRONICS CORP·Filed 2015·Granted May 16, 2017·0 cites·13 claims
- 4838US8810785B2Mask inspecting methodLO WEI-CYUAN·Filed 2011·Granted Aug 19, 2014·0 cites·16 claims
- 4934US2003039892A1Method of optical proximity correctionUNITED MICROELECTRONICS CORP·Filed 2001·Application pending·0 cites
- 5032US2008070408A1Method for adjusting sizes and shapes of plug openingsLIN CHIN-LUNG·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →