Inventor · disambiguated record
Minne Cuperus
Also filed as: CUPERUS MINNE
15 granted patents·1 pending application·106 citations·filing 2004–2017
92Inventor score
Files withASML NETHERLANDS BV10HOOGENDAM CHRISTIAAN ALEXANDER2STREEFKERK BOB2ASML HOLDING NV1HULT DAVID A1
Top patents by PatentIndex Score
16 records- 0197US7671963B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Mar 2, 2010·35 cites·19 claims
- 0293US7352440B2Substrate placement in immersion lithographyASML NETHERLANDS BV·Filed 2004·Granted Apr 1, 2008·37 cites·18 claims
- 0387US9182222B2Substrate placement in immersion lithographyASML NETHERLANDS BV·Filed 2012·Granted Nov 10, 2015·3 cites·53 claims
- 0486US8441617B2Substrate placement in immersion lithographyHOOGENDAM CHRISTIAAN ALEXANDER·Filed 2011·Granted May 14, 2013·3 cites·12 claims
- 0583US7330238B2Lithographic apparatus, immersion projection apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Feb 12, 2008·6 cites·19 claims
- 0680US7486381B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Feb 3, 2009·12 cites·25 claims
- 0779US8077291B2Substrate placement in immersion lithographyHOOGENDAM CHRISTIAAN ALEXANDER·Filed 2007·Granted Dec 13, 2011·3 cites·14 claims
- 0877US9740106B2Substrate placement in immersion lithographyASML NETHERLANDS BV·Filed 2015·Granted Aug 22, 2017·1 cites·66 claims
- 0973US8553201B2Lithographic apparatus and device manufacturing methodSTREEFKERK BOB·Filed 2008·Granted Oct 8, 2013·2 cites·20 claims
- 1063US8009269B2Optimal rasterization for maskless lithographyASML HOLDING NV·Filed 2007·Granted Aug 30, 2011·2 cites·21 claims
- 1162US8009270B2Uniform background radiation in maskless lithographyASML NETHERLANDS BV·Filed 2007·Granted Aug 30, 2011·1 cites·20 claims
- 1261US8749754B2Lithographic apparatus and device manufacturing methodSTREEFKERK BOB·Filed 2009·Granted Jun 10, 2014·0 cites·18 claims
- 1360US10345711B2Substrate placement in immersion lithographyASML NETHERLANDS BV·Filed 2017·Granted Jul 9, 2019·0 cites·20 claims
- 1456US8059266B2Radiometric Kirk testHULT DAVID A·Filed 2008·Granted Nov 15, 2011·1 cites·29 claims
- 1555US7859644B2Lithographic apparatus, immersion projection apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2007·Granted Dec 28, 2010·0 cites·20 claims
- 1639US2008304034A1Dose control for optical maskless lithographyASML NETHERLANDS BV·Filed 2007·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →