Inventor · disambiguated record
Michael Patra
Also filed as: PATRA MICHAEL
69 granted patents·9 pending applications·129 citations·filing 2009–2025
98Inventor score
Files withZEISS CARL SMT GMBH65PATRA MICHAEL4CARL ZEISS SMART OPTICS GMBH2LAYH MICHAEL2XALTER STEFAN2
Top patents by PatentIndex Score
78 records- 0198US9599904B2Illumination system for illuminating a mask in a microlithographic exposure apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Mar 21, 2017·15 cites·20 claims
- 0296US9013684B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusXALTER STEFAN·Filed 2012·Granted Apr 21, 2015·17 cites·18 claims
- 0393US9880474B2System for producing structures in a substrateZEISS CARL SMT GMBH·Filed 2015·Granted Jan 30, 2018·6 cites·20 claims
- 0488US10871717B2Optical system for a projection exposure apparatusZEISS CARL SMT GMBH·Filed 2019·Granted Dec 22, 2020·3 cites·20 claims
- 0588US9046786B2Illumination system of a microlithographic projection exposure apparatusPATRA MICHAEL·Filed 2012·Granted Jun 2, 2015·5 cites·19 claims
- 0688US8467031B2Illumination system for illuminating a mask in a microlithographic exposure apparatusSCHUBERT ERICH·Filed 2010·Granted Jun 18, 2013·6 cites·28 claims
- 0787US9310694B2Illumination system for illuminating a mask in a microlithographic exposure apparatusZEISS CARL SMT GMBH·Filed 2013·Granted Apr 12, 2016·3 cites·27 claims
- 0887US8724086B2Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisationLAYH MICHAEL·Filed 2010·Granted May 13, 2014·4 cites·24 claims
- 0986US10018917B2Illumination optical unit for EUV projection lithographyZEISS CARL SMT GMBH·Filed 2017·Granted Jul 10, 2018·3 cites·19 claims
- 1085US9983483B2Illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2016·Granted May 29, 2018·2 cites·19 claims
- 1185US8339577B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusXALTER STEFAN·Filed 2009·Granted Dec 25, 2012·9 cites·31 claims
- 1284US9612537B2Illumination optical unit for EUV projection lithographyZEISS CARL SMT GMBH·Filed 2016·Granted Apr 4, 2017·2 cites·20 claims
- 1384US9477157B2Illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Oct 25, 2016·2 cites·19 claims
- 1484US2025383198A1Method for the interferometric determination of the surface shape of a test objectZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 1583US10928733B2Illumination optic for projection lithographyZEISS CARL SMT GMBH·Filed 2020·Granted Feb 23, 2021·1 cites·20 claims
- 1683US9989767B2Spectacle lens for a display device that can be fitted on the head of a user and generates an image, and display device with such a spectacle lensCARL ZEISS SMART OPTICS GMBH·Filed 2015·Granted Jun 5, 2018·5 cites·19 claims
- 1783US9989766B2Spectacle lens for a display device that can be fitted on the head of a user and generates an image, and display device with such a spectacle lensCARL ZEISS SMART OPTICS GMBH·Filed 2015·Granted Jun 5, 2018·5 cites·17 claims
- 1883US8854604B2Microlithographic projection exposure apparatusDEGUENTHER MARKUS·Filed 2011·Granted Oct 7, 2014·4 cites·22 claims
- 1982US10191382B2Illumination system for illuminating a mask in a microlithographic exposure apparatusZEISS CARL SMT GMBH·Filed 2018·Granted Jan 29, 2019·1 cites·18 claims
- 2082US9678438B2Illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Jun 13, 2017·2 cites·21 claims
- 2181US9823571B2EUV light source for a lighting device of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Nov 21, 2017·2 cites·23 claims
- 2280US10678144B2Projection exposure method and projection exposure apparatus for microlithographyZEISS CARL SMT GMBH·Filed 2019·Granted Jun 9, 2020·1 cites·20 claims
- 2380US9897925B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Feb 20, 2018·1 cites·18 claims
- 2479US10514611B2Projection exposure method and projection exposure apparatus for microlithographyZEISS CARL SMT GMBH·Filed 2019·Granted Dec 24, 2019·1 cites·19 claims
- 2579US9612540B2Method of operating a microlithographic apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Apr 4, 2017·2 cites·22 claims
- 2678US8891057B2Microlithographic projection exposure apparatusLAYH MICHAEL·Filed 2010·Granted Nov 18, 2014·2 cites·21 claims
- 2776US9213244B2Illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2012·Granted Dec 15, 2015·2 cites·26 claims
- 2874US9823577B2Facet mirror for a projection exposure apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Nov 21, 2017·2 cites·22 claims
- 2973US9239229B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Jan 19, 2016·1 cites·13 claims
- 3072US9791785B2Method for assigning a pupil facet of a pupil facet mirror of an illumination optical unit of a projection exposure apparatus to a field facet of a field facet mirror of the illumination optical unitZEISS CARL SMT GMBH·Filed 2015·Granted Oct 17, 2017·2 cites·21 claims
- 3172US9645501B2Illumination optical unit for EUV projection lithography, and optical system comprising such an illumination optical unitZEISS CARL SMT GMBH·Filed 2014·Granted May 9, 2017·3 cites·20 claims
- 3272US9280061B2Illumination optical unit for EUV projection lithographyZEISS CARL SMT GMBH·Filed 2014·Granted Mar 8, 2016·2 cites·22 claims
- 3370US2025044702A1Illumination optical unit for projection lithographyZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 3469US12339589B2Digital micromirror device for an illumination optical component of a projection exposure systemZEISS CARL SMT GMBH·Filed 2023·Granted Jun 24, 2025·0 cites·20 claims
- 3569US9851641B2Illumination system for an EUV projection lithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Dec 26, 2017·1 cites·13 claims
- 3669US9841683B2Illumination optical unit for EUV projection lithographyZEISS CARL SMT GMBH·Filed 2016·Granted Dec 12, 2017·1 cites·20 claims
- 3769US9671699B2Illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Jun 6, 2017·1 cites·23 claims
- 3868US9161426B2EUV light sourceZEISS CARL SMT GMBH·Filed 2014·Granted Oct 13, 2015·2 cites·19 claims
- 3967US8593645B2Microlithographic projection exposure apparatus and related methodPATRA MICHAEL·Filed 2011·Granted Nov 26, 2013·2 cites·20 claims
- 4067US2024255856A1Optical component group, in particular for use in an illumination device of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 4167US2024248410A1Euv illumination device and method for operating a microlithographic projection exposure apparatus designed for operation in the euvZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 4266US9001309B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Apr 7, 2015·0 cites·30 claims
- 4366US8724080B2Optical raster element, optical integrator and illumination system of a microlithographic projection exposure apparatusPATRA MICHAEL·Filed 2011·Granted May 13, 2014·1 cites·8 claims
- 4465US9891530B2Illumination optical unitZEISS CARL SMT GMBH·Filed 2014·Granted Feb 13, 2018·1 cites·23 claims
- 4565US2018246415A1Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 4664US9563129B2Monitor system for determining orientations of mirror elements and EUV lithography systemZEISS CARL SMT GMBH·Filed 2015·Granted Feb 7, 2017·1 cites·29 claims
- 4763US9791784B2Assembly for a projection exposure apparatus for EUV projection lithographyZEISS CARL SMT GMBH·Filed 2014·Granted Oct 17, 2017·1 cites·20 claims
- 4862US10216091B2Facet mirror for an illumination optical unit for projection lithographyZEISS CARL SMT GMBH·Filed 2017·Granted Feb 26, 2019·1 cites·22 claims
- 4962US9977333B2Illumination system for illuminating a mask in a microlithographic exposure apparatusZEISS CARL SMT GMBH·Filed 2017·Granted May 22, 2018·0 cites·12 claims
- 5061US10310381B2Illumination system for EUV projection lithographyZEISS CARL SMT GMBH·Filed 2018·Granted Jun 4, 2019·0 cites·24 claims
Showing the top 50 of 78 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →