Inventor · disambiguated record
Mitsuru Suehiro
Also filed as: SUEHIRO MITSURU
12 granted patents·12 pending applications·621 citations·filing 1999–2007
93Inventor score
Top patents by PatentIndex Score
24 records- 0198US6755932B2Plasma processing system and apparatus and a sample processing methodHITACHI LTD·Filed 2001·Granted Jun 29, 2004·290 cites·11 claims
- 0296US6503364B1Plasma processing apparatusHITACHI LTD·Filed 2000·Granted Jan 7, 2003·92 cites·7 claims
- 0395US6171438B1Plasma processing apparatus and plasma processing methodHITACHI LTD·Filed 1999·Granted Jan 9, 2001·100 cites·48 claims
- 0494US6815365B2Plasma etching apparatus and plasma etching methodHITACHI LTD·Filed 2001·Granted Nov 9, 2004·44 cites·10 claims
- 0589US6677167B2Wafer processing apparatus and a wafer stage and a wafer processing methodHITACHI HIGH TECH CORP·Filed 2002·Granted Jan 13, 2004·39 cites·24 claims
- 0679US6549393B2Semiconductor wafer processing apparatus and methodHITACHI LTD·Filed 2001·Granted Apr 15, 2003·19 cites·8 claims
- 0775US6923885B2Plasma processing system and apparatus and a sample processing methodHITACHI LTD·Filed 2003·Granted Aug 2, 2005·11 cites·19 claims
- 0871US7686917B2Plasma processing system and apparatus and a sample processing methodHITACHI LTD·Filed 2007·Granted Mar 30, 2010·2 cites·7 claims
- 0970US6537012B2Vacuum processing apparatus and a vacuum processing systemHITACHI LTD·Filed 2002·Granted Mar 25, 2003·11 cites·1 claims
- 1063US6914005B2Plasma etching methodHITACHI HIGH TECH CORP·Filed 2002·Granted Jul 5, 2005·6 cites·14 claims
- 1156US7169254B2Plasma processing system and apparatus and a sample processing methodHITACHI LTD·Filed 2003·Granted Jan 30, 2007·3 cites·13 claims
- 1256US6558100B1Vacuum processing apparatus and a vacuum processing systemHITACHI LTD·Filed 2000·Granted May 6, 2003·4 cites·4 claims
- 1345US2004045675A1Plasma etching apparatusFiled 2003·Application pending·0 cites
- 1445US2004016508A1Plasma etching apparatus and plasma etching methodFiled 2003·Application pending·0 cites
- 1545US2003203640A1Plasma etching apparatusFiled 2003·Application pending·0 cites
- 1645US2004009617A1Plasma etching apparatus and plasma etching methodFiled 2003·Application pending·0 cites
- 1745US2005236109A1Plasma etching apparatus and plasma etching methodMASUDA TOSHIO·Filed 2005·Application pending·0 cites
- 1844US2004177925A1Plasma processing system and apparatus and a sample processing methodFiled 2004·Application pending·0 cites
- 1944US2003024646A1Plasma etching apparatus and plasma etching methodFiled 2002·Application pending·0 cites
- 2042US2004040933A1Wafer processing apparatus and a wafer stage and a wafer processing methodFiled 2003·Application pending·0 cites
- 2141US2003029572A1Semiconductor wafer processing apparatus and methodFiled 2002·Application pending·0 cites
- 2236US2002179245A1Plasma processing apparatus and maintenance method thereforFiled 2002·Application pending·0 cites
- 2331US2002005252A1Plasma etching apparatus and plasma etching methodFiled 1999·Application pending·0 cites
- 2431US2002119670A1Plasma etching apparatus and plasma etching methodFiled 1999·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →