Inventor · disambiguated record
Muhammad M. Rasheed
Also filed as: RASHEED MUHAMMAD · RASHEED MUHAMMAD M
81 granted patents·27 pending applications·344 citations·filing 2002–2024
99Inventor score
Top patents by PatentIndex Score
108 records- 0196US9914999B2Oxidized showerhead and process kit parts and methods of using sameAPPLIED MATERIALS INC·Filed 2015·Granted Mar 13, 2018·10 cites·18 claims
- 0295US10167553B2Apparatus and method for providing a uniform flow of gasAPPLIED MATERIALS INC·Filed 2017·Granted Jan 1, 2019·7 cites·8 claims
- 0394US10519546B2Apparatus and method for providing a uniform flow of gasAPPLIED MATERIALS INC·Filed 2018·Granted Dec 31, 2019·5 cites·20 claims
- 0494US8895450B2Low resistivity tungsten PVD with enhanced ionization and RF power couplingAPPLIED MATERIALS INC·Filed 2013·Granted Nov 25, 2014·16 cites·13 claims
- 0594US8558299B2Semiconductor device with gate electrode stack including low resistivity tungsten and method of formingCAO YONG·Filed 2011·Granted Oct 15, 2013·26 cites·4 claims
- 0694US7722737B2Gas distribution system for improved transient phase depositionAPPLIED MATERIALS INC·Filed 2005·Granted May 25, 2010·23 cites·10 claims
- 0793US9689070B2Deposition ring and electrostatic chuck for physical vapor deposition chamberAPPLIED MATERIALS INC·Filed 2016·Granted Jun 27, 2017·6 cites·13 claims
- 0893US8968537B2PVD sputtering target with a protected backing plateRASHEED MUHAMMAD M·Filed 2011·Granted Mar 3, 2015·8 cites·20 claims
- 0992US11384432B2Atomic layer deposition chamber with funnel-shaped gas dispersion channel and gas distribution plateAPPLIED MATERIALS INC·Filed 2015·Granted Jul 12, 2022·5 cites·20 claims
- 1090US8911601B2Deposition ring and electrostatic chuck for physical vapor deposition chamberRASHEED MUHAMMAD·Filed 2011·Granted Dec 16, 2014·8 cites·10 claims
- 1190US7964040B2Multi-port pumping system for substrate processing chambersAPPLIED MATERIALS INC·Filed 2008·Granted Jun 21, 2011·20 cites·4 claims
- 1289US11420217B2Showerhead for ALD precursor deliveryAPPLIED MATERIALS INC·Filed 2019·Granted Aug 23, 2022·5 cites·20 claims
- 1389US10692706B2Methods and apparatus for reducing sputtering of a grounded shield in a process chamberAPPLIED MATERIALS INC·Filed 2013·Granted Jun 23, 2020·3 cites·13 claims
- 1489US10407771B2Atomic layer deposition chamber with thermal lidAPPLIED MATERIALS INC·Filed 2014·Granted Sep 10, 2019·12 cites·18 claims
- 1588US11236424B2Process kit for improving edge film thickness uniformity on a substrateAPPLIED MATERIALS INC·Filed 2019·Granted Feb 1, 2022·2 cites·17 claims
- 1687US11915917B2Methods and apparatus for reducing sputtering of a grounded shield in a process chamberAPPLIED MATERIALS INC·Filed 2020·Granted Feb 27, 2024·1 cites·20 claims
- 1787US9177763B2Method and apparatus for measuring pressure in a physical vapor deposition chamberAPPLIED MATERIALS INC·Filed 2013·Granted Nov 3, 2015·9 cites·20 claims
- 1887US8252410B2Ceramic cover wafers of aluminum nitride or beryllium oxideRASHEED MUHAMMAD M·Filed 2008·Granted Aug 28, 2012·12 cites·19 claims
- 1987US2024186128A1Methods and apparatus for reducing sputtering of a grounded shield in a process chamberAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2086US10763090B2High pressure RF-DC sputtering and methods to improve film uniformity and step-coverage of this processAPPLIED MATERIALS INC·Filed 2016·Granted Sep 1, 2020·3 cites·19 claims
- 2186US9633824B2Target for PVD sputtering systemAPPLIED MATERIALS INC·Filed 2013·Granted Apr 25, 2017·7 cites·18 claims
- 2285US12293902B2Process kit for a substrate supportAPPLIED MATERIALS INC·Filed 2022·Granted May 6, 2025·1 cites·20 claims
- 2385US11186910B2Apparatus for multi-flow precursor dosageAPPLIED MATERIALS INC·Filed 2019·Granted Nov 30, 2021·3 cites·20 claims
- 2484US10571069B2Gimbal assembly for heater pedestalAPPLIED MATERIALS INC·Filed 2017·Granted Feb 25, 2020·1 cites·16 claims
- 2584US9957601B2Apparatus for gas injection in a physical vapor deposition chamberAPPLIED MATERIALS INC·Filed 2013·Granted May 1, 2018·3 cites·11 claims
- 2684US9396933B2PVD buffer layers for LED fabricationZHU MINGWEI·Filed 2013·Granted Jul 19, 2016·6 cites·7 claims
- 2784US9343274B2Process kit shield for plasma enhanced processing chamberAPPLIED MATERIALS INC·Filed 2014·Granted May 17, 2016·2 cites·9 claims
- 2884US7789993B2Internal balanced coil for inductively coupled high density plasma processing chamberAPPLIED MATERIALS INC·Filed 2007·Granted Sep 7, 2010·8 cites·6 claims
- 2984US7572647B2Internal balanced coil for inductively coupled high density plasma processing chamberAPPLIED MATERIALS INC·Filed 2007·Granted Aug 11, 2009·10 cites·7 claims
- 3083US9222172B2Surface treated aluminum nitride baffleRASHEED MUHAMMAD M·Filed 2008·Granted Dec 29, 2015·7 cites·10 claims
- 3183US6764265B2Erosion resistant slit valveAPPLIED MATERIALS INC·Filed 2002·Granted Jul 20, 2004·30 cites·12 claims
- 3282US9960021B2Physical vapor deposition (PVD) target having low friction padsAPPLIED MATERIALS INC·Filed 2014·Granted May 1, 2018·5 cites·13 claims
- 3382US9087679B2Uniformity tuning capable ESC grounding kit for RF PVD chamberRASHEED MUHAMMAD M·Filed 2012·Granted Jul 21, 2015·5 cites·20 claims
- 3480US11732358B2High temperature chemical vapor deposition lidAPPLIED MATERIALS INC·Filed 2022·Granted Aug 22, 2023·0 cites·15 claims
- 3580US9472443B2Selectively groundable cover ring for substrate process chambersAPPLIED MATERIALS INC·Filed 2013·Granted Oct 18, 2016·4 cites·19 claims
- 3679US11767593B2High temperature vacuum sealAPPLIED MATERIALS INC·Filed 2022·Granted Sep 26, 2023·0 cites·16 claims
- 3779US10704142B2Quick disconnect resistance temperature detector assembly for rotating pedestalAPPLIED MATERIALS INC·Filed 2017·Granted Jul 7, 2020·2 cites·20 claims
- 3878US11387134B2Process kit for a substrate supportAPPLIED MATERIALS INC·Filed 2019·Granted Jul 12, 2022·2 cites·19 claims
- 3978US9834840B2Process kit shield for improved particle reductionRASHEED MUHAMMAD·Filed 2011·Granted Dec 5, 2017·1 cites·12 claims
- 4076US10704147B2Process kit design for in-chamber heater and wafer rotating mechanismAPPLIED MATERIALS INC·Filed 2017·Granted Jul 7, 2020·2 cites·20 claims
- 4175US11932939B2Lids and lid assembly kits for atomic layer deposition chambersAPPLIED MATERIALS INC·Filed 2021·Granted Mar 19, 2024·0 cites·20 claims
- 4275USD936187SGas distribution assembly lidAPPLIED MATERIALS INC·Filed 2020·Granted Nov 16, 2021·6 cites·1 claims
- 4375US9534286B2PVD target for self-centering process shieldAPPLIED MATERIALS INC·Filed 2013·Granted Jan 3, 2017·4 cites·18 claims
- 4475US8647485B2Process kit shield for plasma enhanced processing chamberRASHEED MUHAMMAD·Filed 2012·Granted Feb 11, 2014·4 cites·7 claims
- 4575US7183227B1Use of enhanced turbomolecular pump for gapfill deposition using high flows of low-mass fluent gasAPPLIED MATERIALS INC·Filed 2004·Granted Feb 27, 2007·15 cites·28 claims
- 4673US11447866B2High temperature chemical vapor deposition lidAPPLIED MATERIALS INC·Filed 2021·Granted Sep 20, 2022·0 cites·20 claims
- 4773US7141138B2Gas delivery system for semiconductor processingAPPLIED MATERIALS INC·Filed 2003·Granted Nov 28, 2006·13 cites·16 claims
- 4872US11719255B2Pumping liner for improved flow uniformityAPPLIED MATERIALS INC·Filed 2022·Granted Aug 8, 2023·0 cites·18 claims
- 4972US8409355B2Low profile process kitRASHEED MUHAMMAD M·Filed 2008·Granted Apr 2, 2013·5 cites·23 claims
- 5070US12054826B2ALD cycle time reduction using process chamber lid with tunable pumpingAPPLIED MATERIALS INC·Filed 2023·Granted Aug 6, 2024·0 cites·15 claims
Showing the top 50 of 108 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →