Inventor · disambiguated record
Naoaki Sakurai
Also filed as: SAKURAI NAOAKI
33 granted patents·20 pending applications·525 citations·filing 1996–2018
97Inventor score
Top patents by PatentIndex Score
53 records- 0196US10135050B2Secondary batteryTOSHIBA KK·Filed 2015·Granted Nov 20, 2018·9 cites·11 claims
- 0291US6235186B1Apparatus for producing electrolytic waterPERMELEC ELCTRODE LTD·Filed 1999·Granted May 22, 2001·92 cites·23 claims
- 0387US6082373ACleaning methodTOSHIBA KK·Filed 1998·Granted Jul 4, 2000·86 cites·26 claims
- 0485US7884020B2Polishing cloth and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2007·Granted Feb 8, 2011·10 cites·23 claims
- 0584US10700327B2Secondary batteryTOSHIBA KK·Filed 2018·Granted Jun 30, 2020·1 cites·8 claims
- 0684US6046110ACopper-based metal polishing solution and method for manufacturing a semiconductor deviceTOSHIBA KK·Filed 1996·Granted Apr 4, 2000·67 cites·33 claims
- 0782US6444255B2Method for producing liquid crystal display and method for cleaning substrateTOSHIBA KK·Filed 2001·Granted Sep 3, 2002·26 cites·5 claims
- 0881US6143163AMethod of water electrolysisPERMELEC ELECTRODE LTD·Filed 1998·Granted Nov 7, 2000·51 cites·20 claims
- 0978US9099619B2Semiconductor light emitting device and method for manufacturing the sameKOIZUMI HIROSHI·Filed 2012·Granted Aug 4, 2015·3 cites·5 claims
- 1074US7814919B2Ultrasonic cleaning apparatusTOSHIBA KK·Filed 2008·Granted Oct 19, 2010·3 cites·4 claims
- 1173US6875696B2Ultrasonic-wave washing unit, ultrasonic-wave washing apparatus, ultrasonic-wave washing method, method of manufacturing a semiconductor device, and method of manufacturing a liquid crystal displayTOSHIBA KK·Filed 2003·Granted Apr 5, 2005·10 cites·8 claims
- 1270US6210748B1Method for producing liquid crystal display and method for cleaning substrateTOSHIBA KK·Filed 1998·Granted Apr 3, 2001·35 cites·4 claims
- 1367US6426294B1Copper-based metal polishing composition, method for manufacturing a semiconductor device, polishing composition, aluminum-based metal polishing composition, and tungsten-based metal polishing compositionTOSHIBA KK·Filed 1999·Granted Jul 30, 2002·29 cites·21 claims
- 1466US6861010B2Copper-based metal polishing composition, method for manufacturing a semiconductor device, polishing composition, aluminum-based metal polishing composition, and tungsten-based metal polishing compositionTOSHIBA KK·Filed 2002·Granted Mar 1, 2005·9 cites·7 claims
- 1565US8132903B2Ink jet system and method for removing air bubbles inside of an ink jet nozzleSAKURAI NAOAKI·Filed 2009·Granted Mar 13, 2012·2 cites·9 claims
- 1664US5980703AElectrolytic cell for producing acidic water and alkaline waterPERMELEC ELECTRODE LTD·Filed 1998·Granted Nov 9, 1999·28 cites·15 claims
- 1763US8490571B2Coater, method for manufacturing coated article, and fluid blowing unitSATO TSUYOSHI·Filed 2008·Granted Jul 23, 2013·2 cites·20 claims
- 1862US7799728B2Photocatalyst dispersing element, method for manufacturing photocatalyst dispersing element, photocatalyst element, method for manufacturing photocatalyst elementTOSHIBA KK·Filed 2009·Granted Sep 21, 2010·2 cites·6 claims
- 1961US8136920B2Nozzle plate, method for manufacturing nozzle plate, droplet discharge head, and droplet discharge apparatusSAKURAI NAOAKI·Filed 2007·Granted Mar 20, 2012·3 cites·14 claims
- 2061US6521574B1Copper-based metal polishing solution and method for manufacturing a semiconductor deviceTOSHIBA KK·Filed 1999·Granted Feb 18, 2003·21 cites·17 claims
- 2160US7112125B2Polishing cloth, polishing apparatus and method of manufacturing semiconductor devicesNOF CORP·Filed 2003·Granted Sep 26, 2006·6 cites·21 claims
- 2258US2009044829A1Ultrasonic-wave washing unit, ultrasonic-wave washing apparatus, ultrasonic-wave washing method, method of manufacturing a semiconductor device, and method of manufacturing a liquid crystal displayTOSHIBA KK·Filed 2008·Application pending·0 cites
- 2357US2010047716A1Method for forming a patternTOSHIBA KK·Filed 2009·Application pending·0 cites
- 2456US2008110473A1Ultrasonic-wave washing unit, ultrasonic-wave washing apparatus, ultrasonic-wave washing method, method of manufacturing a semiconductor device, and method of manufacturing a liquid crystal displayTOSHIBA KK·Filed 2007·Application pending·0 cites
- 2555US2006029740A1Coating apparatus and coating methodTOSHIBA KK·Filed 2005·Application pending·0 cites
- 2655US2014113451A1Method for forming a patternTOSHIBA KK·Filed 2013·Application pending·0 cites
- 2753US7632359B2Cleaning liquid and nozzle plate cleaning methodTOSHIBA KK·Filed 2007·Granted Dec 15, 2009·0 cites·10 claims
- 2853US2014061023A1Treatment apparatus and treatment methodTOSHIBA KK·Filed 2013·Application pending·0 cites
- 2953US2015004497A1Secondary battery electrode and lithium-ion secondary batteryTOSHIBA KK·Filed 2014·Application pending·0 cites
- 3053US2008029132A1Ultrasonic cleaning apparatusSAKURAI NAOAKI·Filed 2007·Application pending·0 cites
- 3152US7291188B2Polishing cloth and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2004·Granted Nov 6, 2007·4 cites·10 claims
- 3252US2012135135A1Coating apparatus and coating methodSAKURAI NAOAKI·Filed 2012·Application pending·0 cites
- 3351US8535765B2Method of producing a low-molecular luminous material dispersant, an apparatus for producing a low-molecular luminous material dispersant and a low-molecular luminous material dispersantSAKURAI NAOAKI·Filed 2009·Granted Sep 17, 2013·0 cites·17 claims
- 3451US8419178B2Ink-jet application method and display device producing methodSAKURAI NAOAKI·Filed 2010·Granted Apr 16, 2013·0 cites·5 claims
- 3551US2005145264A1Ultrasonic-wave washing unit, ultrasonic-wave washing apparatus, ultrasonic-wave washing method, method of manufacturing a semiconductor device, and method of manufacturing a liquid crystal displayTOSHIBA KK·Filed 2005·Application pending·0 cites
- 3651US2006076314A1Method for forming a patternTOSHIBA KK·Filed 2005·Application pending·0 cites
- 3750US6192903B1Spin-processing apparatus and spin-processing methodSHIBAURA MECHATRONICS CORP·Filed 1997·Granted Feb 27, 2001·17 cites·10 claims
- 3850US2006066702A1Ink-jet application method and display device producing methodTOSHIBA KK·Filed 2005·Application pending·0 cites
- 3949US2005284509A1Ultrasonic cleaning apparatusSAKURAI NAOAKI·Filed 2005·Application pending·0 cites
- 4049US2006276113A1Polishing cloth, polishing apparatus and method of manufacturing semiconductor devicesHIRABAYASHI HIDEAKI·Filed 2006·Application pending·0 cites
- 4147US8039858B2Fluorescer solution, light-emitting device, and method for manufacturing sameTOSHIBA KK·Filed 2009·Granted Oct 18, 2011·0 cites·7 claims
- 4243US9692052B2Electrode material for battery, electrode material paste for battery, and solar cell using same, storage battery, and method for manufacturing solar cellTOSHIBA KK·Filed 2013·Granted Jun 27, 2017·0 cites·2 claims
- 4343US8201922B2Method of applying ink-repellent film and nozzle plate provided with ink-repellent filmSAKURAI NAOAKI·Filed 2007·Granted Jun 19, 2012·0 cites·5 claims
- 4442US2012234387A1Solar cell and method for manufacturing the sameSAWADA MASATO·Filed 2012·Application pending·0 cites
- 4541US9303976B2Substrate processing system and substrate processing programUEKITA MASAHIRO·Filed 2012·Granted Apr 5, 2016·0 cites·25 claims
- 4638US2011234477A1Organic light emitting device, lighting apparatus, display apparatus and method for manufacturing the organic light emitting deviceTOSHIBA KK·Filed 2011·Application pending·0 cites
- 4738US2012067847A1Apparatus and method of processing substrateSAKURAI NAOAKI·Filed 2011·Application pending·0 cites
- 4837US2011204400A1Light emitting device, method for manufacturing the same and apparatus for manufacturing light emitting deviceTOSHIBA KK·Filed 2011·Application pending·0 cites
- 4937US2007200903A1Droplet jetting applicator and method for manufacturing coated bodyTOSHIBA KK·Filed 2006·Application pending·0 cites
- 5035US8614500B2Film forming apparatus, film forming method, and semiconductor deviceSATO TSUYOSHI·Filed 2011·Granted Dec 24, 2013·0 cites·11 claims
Showing the top 50 of 53 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →