Inventor · disambiguated record
Nader Shamma
Also filed as: SHAMMA NADER
25 granted patents·1 pending application·1,051 citations·filing 1991–2024
96Inventor score
Top patents by PatentIndex Score
26 records- 0199US9390909B2Soft landing nanolaminates for advanced patterningNOVELLUS SYSTEMS INC·Filed 2014·Granted Jul 12, 2016·500 cites·18 claims
- 0298US12094711B2Tin oxide films in semiconductor device manufacturingLAM RES CORP·Filed 2022·Granted Sep 17, 2024·5 cites·18 claims
- 0398US11257674B2Eliminating yield impact of stochastics in lithographyLAM RES CORP·Filed 2020·Granted Feb 22, 2022·15 cites·19 claims
- 0498US9618846B2PECVD films for EUV lithographyLAM RES CORP·Filed 2016·Granted Apr 11, 2017·284 cites·11 claims
- 0597US10796912B2Eliminating yield impact of stochastics in lithographyLAM RES CORP·Filed 2018·Granted Oct 6, 2020·18 cites·16 claims
- 0697US10546748B2Tin oxide films in semiconductor device manufacturingLAM RES CORP·Filed 2018·Granted Jan 28, 2020·25 cites·20 claims
- 0796US11322351B2Tin oxide films in semiconductor device manufacturingLAM RES CORP·Filed 2019·Granted May 3, 2022·15 cites·32 claims
- 0896US10269566B2Etching substrates using ale and selective depositionLAM RES CORP·Filed 2017·Granted Apr 23, 2019·15 cites·24 claims
- 0995US10685836B2Etching substrates using ALE and selective depositionLAM RES CORP·Filed 2019·Granted Jun 16, 2020·10 cites·20 claims
- 1094US9362133B2Method for forming a mask by etching conformal film on patterned ashable hardmaskLAM RES CORP·Filed 2013·Granted Jun 7, 2016·19 cites·17 claims
- 1193US12474640B2Integration of dry development and etch processes for EUV patterning in a single process chamberLAM RES CORP·Filed 2024·Granted Nov 18, 2025·4 cites·20 claims
- 1292US5208124AMethod of making a mask for proximity effect correction in projection lithographyHEWLETT PACKARD CO·Filed 1991·Granted May 4, 1993·99 cites·5 claims
- 1391US9922839B2Low roughness EUV lithographyLAM RES CORP·Filed 2016·Granted Mar 20, 2018·6 cites·16 claims
- 1491US9905423B2Soft landing nanolaminates for advanced patterningNOVELLUS SYSTEMS INC·Filed 2016·Granted Feb 27, 2018·5 cites·14 claims
- 1590US12437995B2Tin oxide films in semiconductor device manufacturingLAM RES CORP·Filed 2022·Granted Oct 7, 2025·1 cites·5 claims
- 1687US12417916B2Tin oxide films in semiconductor device manufacturingLAM RES CORP·Filed 2021·Granted Sep 16, 2025·1 cites·16 claims
- 1786US10438807B2Low roughness EUV lithographyLAM RES CORP·Filed 2018·Granted Oct 8, 2019·3 cites·17 claims
- 1886US9304396B2PECVD films for EUV lithographyLAM RES CORP·Filed 2014·Granted Apr 5, 2016·9 cites·14 claims
- 1985US10192759B2Image reversal with AHM gap fill for multiple patterningLAM RES CORP·Filed 2016·Granted Jan 29, 2019·4 cites·16 claims
- 2077US10192742B2Soft landing nanolaminates for advanced patterningNOVELLUS SYSTEMS INC·Filed 2018·Granted Jan 29, 2019·1 cites·20 claims
- 2174US12315727B2Eliminating yield impact of stochastics in lithographyLAM RES CORP·Filed 2021·Granted May 27, 2025·0 cites·13 claims
- 2269US11048174B2Method of controlling a patterning process, lithographic apparatus, metrology apparatus lithographic cell and associated computer programASML NETHERLANDS BV·Filed 2017·Granted Jun 29, 2021·1 cites·21 claims
- 2352US5331370AMethod and apparatus for determining a feature-forming variant of a lithographic systemHEWLETT PACKARD CO·Filed 1993·Granted Jul 19, 1994·11 cites·20 claims
- 2450US12372872B2Extreme ultraviolet (EUV) lithography using an intervening layer or a multi-layer stack with varying mean free paths for secondary electron generationLAM RES CORP·Filed 2020·Granted Jul 29, 2025·0 cites·13 claims
- 2545US11031244B2Modification of SNO2 surface for EUV lithographyLAM RES CORP·Filed 2018·Granted Jun 8, 2021·0 cites·19 claims
- 2643US2005057754A1Measurement of thin film properties using plasmonsFiled 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →