Inventor · disambiguated record
Naoto Tsuji
Also filed as: TSUJI NAOTO
37 granted patents·12 pending applications·8,445 citations·filing 1995–2025
98Inventor score
Top patents by PatentIndex Score
49 records- 0199US9370863B2Anti-slip end-effector for transporting workpieceASM IP HOLDING BV·Filed 2014·Granted Jun 21, 2016·473 cites·13 claims
- 0299USD753269STop plateASM IP HOLDING BV·Filed 2015·Granted Apr 5, 2016·479 cites·1 claims
- 0399USD743513SSeal ringASM IP HOLDING BV·Filed 2014·Granted Nov 17, 2015·548 cites·1 claims
- 0499USD735836SShower plateASM IP HOLDING BV·Filed 2015·Granted Aug 4, 2015·527 cites·1 claims
- 0599USD733843SShower plateASM IP HOLDING BV·Filed 2014·Granted Jul 7, 2015·523 cites·1 claims
- 0699USD733261STop plateASM IP HOLDING BV·Filed 2015·Granted Jun 30, 2015·530 cites·1 claims
- 0799USD732644STop plateASM IP HOLDING BV·Filed 2014·Granted Jun 23, 2015·540 cites·1 claims
- 0899USD732145SShower plateASM IP HOLDING BV·Filed 2014·Granted Jun 16, 2015·528 cites·1 claims
- 0999USD726884SHeater blockASM IP HOLDING BV·Filed 2014·Granted Apr 14, 2015·528 cites·1 claims
- 1099USD725168SHeater blockASM IP HOLDING BV·Filed 2014·Granted Mar 24, 2015·507 cites·1 claims
- 1199USD724701SShower plateASM IP HOLDING BV·Filed 2014·Granted Mar 17, 2015·528 cites·1 claims
- 1299USD720838SShower plateASM IP HOLDING BV·Filed 2014·Granted Jan 6, 2015·548 cites·1 claims
- 1399US7955650B2Method for forming dielectric film using porogen gasASM JAPAN·Filed 2007·Granted Jun 7, 2011·464 cites·17 claims
- 1499US7807566B2Method for forming dielectric SiOCH film having chemical stabilityASM JAPAN·Filed 2007·Granted Oct 5, 2010·464 cites·17 claims
- 1598US8912101B2Method for forming Si-containing film using two precursors by ALDASM IP HOLDING BV·Filed 2013·Granted Dec 16, 2014·522 cites·17 claims
- 1697US9018093B2Method for forming layer constituted by repeated stacked layersASM IP HOLDING BV·Filed 2013·Granted Apr 28, 2015·519 cites·17 claims
- 1794US9963782B2Semiconductor manufacturing apparatusASM IP HOLDING BV·Filed 2015·Granted May 8, 2018·10 cites·12 claims
- 1893US10844484B2Apparatus for dispensing a vapor phase reactant to a reaction chamber and related methodsASM IP HOLDING BV·Filed 2018·Granted Nov 24, 2020·10 cites·11 claims
- 1992US7418921B2Plasma CVD apparatus for forming uniform filmASM JAPAN·Filed 2005·Granted Sep 2, 2008·14 cites·14 claims
- 2092US6740602B1Method of forming low-dielectric constant film on semiconductor substrate by plasma reaction using high-RF powerASM JAPAN·Filed 2003·Granted May 25, 2004·65 cites·31 claims
- 2191US9885112B2Film forming apparatusASM IP HOLDING BV·Filed 2014·Granted Feb 6, 2018·5 cites·6 claims
- 2290US11339476B2Substrate processing device having connection plates, substrate processing methodASM IP HOLDING BV·Filed 2020·Granted May 24, 2022·3 cites·15 claims
- 2386US6818570B2Method of forming silicon-containing insulation film having low dielectric constant and high mechanical strengthASM JAPAN·Filed 2003·Granted Nov 16, 2004·35 cites·49 claims
- 2484US2025379040A1Gas distribution assembly and method of using sameASM IP HOLDING BV·Filed 2025·Application pending·0 cites
- 2582US10435789B2Substrate treatment apparatusASM IP HOLDING BV·Filed 2016·Granted Oct 8, 2019·4 cites·7 claims
- 2677US11118262B2Substrate processing apparatus having a gas-mixing manifoldASM IP HOLDING BV·Filed 2018·Granted Sep 14, 2021·1 cites·14 claims
- 2776US7641761B2Apparatus and method for forming thin film using surface-treated shower plateASM JAPAN·Filed 2005·Granted Jan 5, 2010·6 cites·6 claims
- 2870US5626679AMethod and apparatus for preparing a silicon oxide filmFUJI ELECTRIC CO LTD·Filed 1995·Granted May 6, 1997·40 cites·26 claims
- 2968US12431334B2Gas distribution assemblyASM IP HOLDING BV·Filed 2021·Granted Sep 30, 2025·0 cites·16 claims
- 3064US7799134B2Shower plate having projections and plasma CVD apparatus using sameASM JAPAN·Filed 2005·Granted Sep 21, 2010·1 cites·13 claims
- 3158US7147900B2Method for forming silicon-containing insulation film having low dielectric constant treated with electron beam radiationASM JAPAN·Filed 2003·Granted Dec 12, 2006·6 cites·36 claims
- 3257US7718544B2Method of forming silicon-containing insulation film having low dielectric constant and low diffusion coefficientASM JAPAN·Filed 2006·Granted May 18, 2010·1 cites·20 claims
- 3357US2023253232A1Substrate treatment apparatusASM IP HOLDING BV·Filed 2023·Application pending·0 cites
- 3456US7098129B2Interlayer insulation film used for multilayer interconnect of semiconductor integrated circuit and method of manufacturing the sameASM JAPAN·Filed 2003·Granted Aug 29, 2006·3 cites·13 claims
- 3555US7012268B2Gas-shield electron-beam gun for thin-film curing applicationASM JAPAN·Filed 2004·Granted Mar 14, 2006·2 cites·23 claims
- 3653US11199247B2Winding transmission body tension deviceDAIDO KOGYO KK·Filed 2019·Granted Dec 14, 2021·0 cites·7 claims
- 3753US2022259731A1Substrate processing apparatus with flow control ring, and substrate processing methodASM IP HOLDING BV·Filed 2022·Application pending·0 cites
- 3853US2024287679A1Wafer processing apparatus with film uniformity improvement capabilitiesASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 3950US7037855B2Method of forming fluorine-doped low-dielectric-constant insulating filmASM JAPAN·Filed 2004·Granted May 2, 2006·3 cites·24 claims
- 4047US6905978B2Method of forming interlayer insulation filmASM JAPAN·Filed 2003·Granted Jun 14, 2005·1 cites·25 claims
- 4147US2010003833A1Method of forming fluorine-containing dielectric filmASM JAPAN·Filed 2008·Application pending·0 cites
- 4246US2007032048A1Method for depositing thin film by controlling effective distance between showerhead and susceptorASM JAPAN·Filed 2006·Application pending·0 cites
- 4345US2008220619A1Method for increasing mechanical strength of dielectric film by using sequential combination of two types of uv irradiationASM JAPAN·Filed 2007·Application pending·0 cites
- 4444US6935351B2Method of cleaning CVD device and cleaning device thereforRENESAS TECH CORP·Filed 2002·Granted Aug 30, 2005·7 cites·14 claims
- 4542US2014099798A1UV-Curing Apparatus Provided With Wavelength-Tuned Excimer Lamp and Method of Processing Semiconductor Substrate Using SameASM IP HOLDING BV·Filed 2012·Application pending·0 cites
- 4641US2002124866A1Plasma film-forming apparatus and cleaning method for the sameULVAC INC·Filed 2001·Application pending·0 cites
- 4740US2004007247A1Plasma film-forming apparatus and cleaning method for the sameULVAC INC·Filed 2003·Application pending·0 cites
- 4837US2003192478A1Plasma CVD apparatus comprising susceptor with ringASM JAPAN·Filed 2003·Application pending·0 cites
- 4937US2014116335A1UV Irradiation Apparatus with Cleaning Mechanism and Method for Cleaning UV Irradiation ApparatusASM IP HOLDING BV·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →