Inventor · disambiguated record
Nelson Felix
Also filed as: FELIX NELSON · FELIX NELSON M
78 granted patents·8 pending applications·116 citations·filing 2008–2024
98Inventor score
Top patents by PatentIndex Score
86 records- 0198US9934970B1Self aligned pattern formation post spacer etchback in tight pitch configurationsIBM·Filed 2017·Granted Apr 3, 2018·22 cites·13 claims
- 0296US11610780B2Alternating hardmasks for tight-pitch line formationTESSERA LLC·Filed 2021·Granted Mar 21, 2023·2 cites·20 claims
- 0396US9779944B1Method and structure for cut material selectionIBM·Filed 2016·Granted Oct 3, 2017·17 cites·19 claims
- 0494US10103022B2Alternating hardmasks for tight-pitch line formationIBM·Filed 2017·Granted Oct 16, 2018·8 cites·20 claims
- 0593US10529569B2Self aligned pattern formation post spacer etchback in tight pitch configurationsIBM·Filed 2018·Granted Jan 7, 2020·5 cites·11 claims
- 0692US10347486B1Patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (EUV) lithographyIBM·Filed 2017·Granted Jul 9, 2019·5 cites·20 claims
- 0791US10410875B2Alternating hardmasks for tight-pitch line formationIBM·Filed 2017·Granted Sep 10, 2019·4 cites·20 claims
- 0889US9786554B1Self aligned conductive linesIBM·Filed 2016·Granted Oct 10, 2017·5 cites·7 claims
- 0989US2025062126A1Self aligned pattern formation post spacer etchback in tight pitch configurationsTESSERA LLC·Filed 2024·Application pending·0 cites
- 1088US11670510B2Self aligned pattern formation post spacer etchback in tight pitch configurationsTESSERA LLC·Filed 2021·Granted Jun 6, 2023·1 cites·18 claims
- 1187US11031248B2Alternating hardmasks for tight-pitch line formationTESSERA INC·Filed 2019·Granted Jun 8, 2021·2 cites·21 claims
- 1287US8638438B2Self-calibrated alignment and overlay target and measurementAUSSCHNITT CHRISTOPHER P·Filed 2011·Granted Jan 28, 2014·5 cites·16 claims
- 1385US12322601B2Alternating hardmasks for tight-pitch line formationADEIA SEMICONDUCTOR SOLUTIONS LLC·Filed 2023·Granted Jun 3, 2025·0 cites·22 claims
- 1485US11037786B2Patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (EUV) lithographyIBM·Filed 2019·Granted Jun 15, 2021·2 cites·16 claims
- 1585US10388510B2Wet strippable OPL using reversible UV crosslinking and de-crosslinkingIBM·Filed 2018·Granted Aug 20, 2019·3 cites·18 claims
- 1684US12106963B2Self aligned pattern formation post spacer etchback in tight pitch configurationsTESSERA LLC·Filed 2023·Granted Oct 1, 2024·0 cites·21 claims
- 1784US10545409B1Dynamic adjustment of post exposure bake during lithography utilizing real-time feedback for wafer exposure delayIBM·Filed 2019·Granted Jan 28, 2020·3 cites·17 claims
- 1884US10121661B2Self aligned pattern formation post spacer etchback in tight pitch configurationsIBM·Filed 2017·Granted Nov 6, 2018·2 cites·17 claims
- 1983US10580652B2Alternating hardmasks for tight-pitch line formationIBM·Filed 2018·Granted Mar 3, 2020·2 cites·20 claims
- 2083US9941142B1Tunable TiOxNy hardmask for multilayer patterningIBM·Filed 2017·Granted Apr 10, 2018·3 cites·14 claims
- 2181US11245027B2Bottom source/drain etch with fin-cut-last-VTFETIBM·Filed 2020·Granted Feb 8, 2022·1 cites·8 claims
- 2281US11239077B2Litho-etch-litho-etch with self-aligned blocksIBM·Filed 2019·Granted Feb 1, 2022·2 cites·20 claims
- 2381US8361683B2Multi-layer chip overlay target and measurementIBM·Filed 2010·Granted Jan 29, 2013·5 cites·15 claims
- 2479US12021135B2Bottom source/drain etch with fin-cut-last-VTFETIBM·Filed 2023·Granted Jun 25, 2024·0 cites·7 claims
- 2579US10056290B2Self-aligned pattern formation for a semiconductor deviceIBM·Filed 2016·Granted Aug 21, 2018·2 cites·12 claims
- 2678US10312103B2Alternating hardmasks for tight-pitch line formationIBM·Filed 2017·Granted Jun 4, 2019·1 cites·15 claims
- 2777US10831102B2Photoactive polymer brush materials and EUV patterning using the sameIBM·Filed 2018·Granted Nov 10, 2020·1 cites·10 claims
- 2877US10658521B2Enabling residue free gap fill between nanosheetsIBM·Filed 2018·Granted May 19, 2020·1 cites·14 claims
- 2977US9799534B1Application of titanium-oxide as a patterning hardmaskIBM·Filed 2017·Granted Oct 24, 2017·2 cites·20 claims
- 3076US11131919B2Extreme ultraviolet (EUV) mask stack processingIBM·Filed 2018·Granted Sep 28, 2021·1 cites·15 claims
- 3175US12019376B2Polymer brush adhesion promoter with UV cleavable linkerIBM·Filed 2021·Granted Jun 25, 2024·0 cites·20 claims
- 3275US10741454B2Boundary protection for CMOS multi-threshold voltage devicesIBM·Filed 2018·Granted Aug 11, 2020·2 cites·20 claims
- 3374US10249512B2Tunable TiOxNy hardmask for multilayer patterningIBM·Filed 2018·Granted Apr 2, 2019·1 cites·8 claims
- 3473US11695059B2Bottom source/drain etch with fin-cut-last-VTFETIBM·Filed 2021·Granted Jul 4, 2023·0 cites·6 claims
- 3573US9911647B2Self aligned conductive linesIBM·Filed 2017·Granted Mar 6, 2018·1 cites·20 claims
- 3671US9059102B2Metrology marks for unidirectional grating superposition patterning processesIBM·Filed 2013·Granted Jun 16, 2015·2 cites·17 claims
- 3770US11515431B2Enabling residue free gap fill between nanosheetsIBM·Filed 2020·Granted Nov 29, 2022·0 cites·17 claims
- 3870US11302573B2Semiconductor structure with fully aligned viasIBM·Filed 2019·Granted Apr 12, 2022·1 cites·20 claims
- 3968US11804401B2Spacer-defined process for lithography-etch double patterning for interconnectsIBM·Filed 2021·Granted Oct 31, 2023·0 cites·17 claims
- 4067US11171002B2Alternating hardmasks for tight-pitch line formationTESSERA INC·Filed 2020·Granted Nov 9, 2021·0 cites·16 claims
- 4167US11018007B2Self aligned pattern formation post spacer etchback in tight pitch configurationsTESSERA INC·Filed 2019·Granted May 25, 2021·0 cites·20 claims
- 4266US9257351B2Metrology marks for bidirectional grating superposition patterning processesIBM·Filed 2013·Granted Feb 9, 2016·2 cites·19 claims
- 4365US11682558B2Fabrication of back-end-of-line interconnectsIBM·Filed 2021·Granted Jun 20, 2023·0 cites·20 claims
- 4465US11199778B2Polymer brush adhesion promoter with UV cleavable linkerIBM·Filed 2019·Granted Dec 14, 2021·0 cites·14 claims
- 4564US11699592B2Inverse tone pillar printing method using organic planarizing layer pillarsIBM·Filed 2021·Granted Jul 11, 2023·0 cites·9 claims
- 4664US11177130B2Patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (EUV) lithographyIBM·Filed 2019·Granted Nov 16, 2021·0 cites·25 claims
- 4762US11646221B2Self-aligned pattern formation for a semiconductor deviceIBM·Filed 2019·Granted May 9, 2023·0 cites·17 claims
- 4862US11500293B2Patterning material film stack with hard mask layer configured to support selective deposition on patterned resist layerIBM·Filed 2019·Granted Nov 15, 2022·0 cites·20 claims
- 4962US11121024B2Tunable hardmask for overlayer metrology contrastIBM·Filed 2019·Granted Sep 14, 2021·0 cites·20 claims
- 5062US10586697B2Wet strippable OPL using reversible UV crosslinking and de-crosslinkingIBM·Filed 2019·Granted Mar 10, 2020·0 cites·20 claims
Showing the top 50 of 86 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →