Inventor · disambiguated record
Nipun Misra
Also filed as: MISRA NIPUN
13 granted patents·5 pending applications·410 citations·filing 2007–2023
91Inventor score
Top patents by PatentIndex Score
18 records- 0198US11587766B2Symmetric VHF source for a plasma reactorAPPLIED MATERIALS INC·Filed 2021·Granted Feb 21, 2023·4 cites·15 claims
- 0298US9653267B2Temperature controlled chamber linerCARDUCCI JAMES D·Filed 2012·Granted May 16, 2017·319 cites·20 claims
- 0396US8734664B2Method of differential counter electrode tuning in an RF plasma reactorAPPLIED MATERIALS INC·Filed 2013·Granted May 27, 2014·28 cites·19 claims
- 0494US7786024B2Selective processing of semiconductor nanowires by polarized visible radiationNANOSYS INC·Filed 2007·Granted Aug 31, 2010·33 cites·13 claims
- 0590US8920597B2Symmetric VHF source for a plasma reactorRAMASWAMY KARTIK·Filed 2011·Granted Dec 30, 2014·9 cites·8 claims
- 0688US11043361B2Symmetric VHF source for a plasma reactorAPPLIED MATERIALS INC·Filed 2017·Granted Jun 22, 2021·3 cites·20 claims
- 0786US9824862B2Symmetric VHF source for a plasma reactorAPPLIED MATERIALS INC·Filed 2014·Granted Nov 21, 2017·4 cites·6 claims
- 0885US9443700B2Electron beam plasma source with segmented suppression electrode for uniform plasma generationAPPLIED MATERIALS INC·Filed 2014·Granted Sep 13, 2016·6 cites·14 claims
- 0984US11935724B2Symmetric VHF source for a plasma reactorAPPLIED MATERIALS INC·Filed 2023·Granted Mar 19, 2024·0 cites·15 claims
- 1071US9269546B2Plasma reactor with electron beam plasma source having a uniform magnetic fieldAPPLIED MATERIALS INC·Filed 2013·Granted Feb 23, 2016·2 cites·17 claims
- 1160US9129777B2Electron beam plasma source with arrayed plasma sources for uniform plasma generationDORF LEONID·Filed 2012·Granted Sep 8, 2015·1 cites·16 claims
- 1255US8951384B2Electron beam plasma source with segmented beam dump for uniform plasma generationDORF LEONID·Filed 2012·Granted Feb 10, 2015·1 cites·16 claims
- 1345US9721760B2Electron beam plasma source with reduced metal contaminationAPPLIED MATERIALS INC·Filed 2013·Granted Aug 1, 2017·0 cites·7 claims
- 1444US2013277333A1Plasma processing using rf return path variable impedance controller with two-dimensional tuning spaceAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 1543US2014069584A1Differential counter electrode tuning in a plasma reactor with an rf-driven ceiling electrodeAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 1643US2014034239A1Differential counter electrode tuning in a plasma reactor with an rf-driven workpiece support electrodeAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 1739US2013098872A1Switched electron beam plasma source array for uniform plasma productionDORF LEONID·Filed 2012·Application pending·0 cites
- 1839US2013098552A1E-beam plasma source with profiled e-beam extraction grid for uniform plasma generationDORF LEONID·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →