Inventor · disambiguated record
Nobuo Konishi
Also filed as: KONISHI NOBUO
27 granted patents·3 pending applications·1,667 citations·filing 1991–2004
98Inventor score
Top patents by PatentIndex Score
30 records- 0198US5826129ASubstrate processing systemTOKYO ELECTRON LTD·Filed 1995·Granted Oct 20, 1998·552 cites·23 claims
- 0295US6514073B1Resist processing method and resist processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Feb 4, 2003·61 cites·4 claims
- 0395US5608943AApparatus for removing process liquidTOKYO ELECTRON LTD·Filed 1994·Granted Mar 11, 1997·241 cites·24 claims
- 0492US5722875AMethod and apparatus for polishingTOKYO ELECTRON LTD·Filed 1996·Granted Mar 3, 1998·133 cites·17 claims
- 0586US6551400B2Coating apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Apr 22, 2003·21 cites·7 claims
- 0686US6228561B1Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 1997·Granted May 8, 2001·36 cites·17 claims
- 0786US6012858AApparatus and method for forming liquid filmTOKYO ELECTRON LTD·Filed 1998·Granted Jan 11, 2000·82 cites·9 claims
- 0884US6683006B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2002·Granted Jan 27, 2004·26 cites·5 claims
- 0984US6503003B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Jan 7, 2003·19 cites·5 claims
- 1083US6106369APolishing systemTOKYO ELECTRON LTD·Filed 1998·Granted Aug 22, 2000·68 cites·19 claims
- 1181US6491452B2Developing method and developing apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Dec 10, 2002·16 cites·3 claims
- 1278US6385805B2Scrubbing apparatusTOKYO ELECTRON LTD·Filed 1999·Granted May 14, 2002·55 cites·5 claims
- 1378US6165270AProcess solution supplying apparatusTOKYO ELECTRON LTD·Filed 1998·Granted Dec 26, 2000·41 cites·16 claims
- 1477US5250114ACoating apparatus with nozzle moving meansTOKYO ELECTRON LTD·Filed 1991·Granted Oct 5, 1993·61 cites·8 claims
- 1576US6238848B1Developing method and developing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted May 29, 2001·12 cites·6 claims
- 1675US6800546B2Film forming method by radiating a plasma on a surface of a low dielectric constant filmTOKYO ELECTRON LTD·Filed 2002·Granted Oct 5, 2004·20 cites·9 claims
- 1775US6656273B1Film forming method and film forming systemTOKYO ELECTRON LTD·Filed 2000·Granted Dec 2, 2003·18 cites·3 claims
- 1873US6053977ACoating apparatusTOKYO ELECTRON LTD·Filed 1998·Granted Apr 25, 2000·43 cites·15 claims
- 1971US6383291B1Process solution supplying apparatusTOKYO ELECTRON LTD·Filed 2000·Granted May 7, 2002·10 cites·4 claims
- 2067US6431258B1Process solution supplying apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Aug 13, 2002·8 cites·6 claims
- 2167US5416047AMethod for applying process solution to substratesTOKYO ELECTRON LTD·Filed 1993·Granted May 16, 1995·42 cites·10 claims
- 2263US6001739AMethod of manufacturing a semiconductor deviceTOKYO ELECTRON LTD·Filed 1997·Granted Dec 14, 1999·28 cites·16 claims
- 2362US6300043B1Method of forming resist filmTOKYO ELECTRON LTD·Filed 1998·Granted Oct 9, 2001·20 cites·16 claims
- 2462US6143478AResist processing methodTOKYO ELECTRON LTD·Filed 1998·Granted Nov 7, 2000·17 cites·13 claims
- 2561US7300598B2Substrate processing method and apparatusTOKYO ELECTRON LTD·Filed 2004·Granted Nov 27, 2007·7 cites·6 claims
- 2656US6120361APolishing apparatus, polishing memberTOKYO ELECTRON LTD·Filed 1998·Granted Sep 19, 2000·18 cites·13 claims
- 2752US6257778B1Method for developing front surface of substrate with improved developing function of developing solution and apparatus thereofTOKYO ELECTRON LTD·Filed 1999·Granted Jul 10, 2001·12 cites·14 claims
- 2843US2004127019A1Film forming method and film forming apparatusFiled 2003·Application pending·0 cites
- 2940US2005026454A1Film forming method and film forming apparatusFiled 2004·Application pending·0 cites
- 3039US2005260771A1Processing device and processing methodIWASHITA MITSUAKI·Filed 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →