Inventor · disambiguated record
Ohad Bachar
Also filed as: BACHAR OHAD
27 granted patents·4 pending applications·164 citations·filing 2010–2024
96Inventor score
Top patents by PatentIndex Score
31 records- 0197US8441639B2Metrology systems and methodsKANDEL DANIEL·Filed 2010·Granted May 14, 2013·35 cites·22 claims
- 0296US9080971B2Metrology systems and methodsKLA TENCOR CORP·Filed 2014·Granted Jul 14, 2015·21 cites·12 claims
- 0394US8873054B2Metrology systems and methodsKLA TENCOR CORP·Filed 2013·Granted Oct 28, 2014·14 cites·26 claims
- 0493US10422508B2System and method for spectral tuning of broadband light sourcesKLA TENCOR CORP·Filed 2016·Granted Sep 24, 2019·8 cites·56 claims
- 0592US10371626B2System and method for generating multi-channel tunable illumination from a broadband sourceKLA TENCOR CORP·Filed 2016·Granted Aug 6, 2019·5 cites·50 claims
- 0692US9958385B2Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrologyKLA TENCOR CORP·Filed 2014·Granted May 1, 2018·9 cites·36 claims
- 0791US10203247B2Systems for providing illumination in optical metrologyKLA TENCOR CORP·Filed 2016·Granted Feb 12, 2019·10 cites·21 claims
- 0890US11353321B2Metrology system and method for measuring diagonal diffraction-based overlay targetsKLA CORP·Filed 2020·Granted Jun 7, 2022·2 cites·23 claims
- 0990US9581430B2Phase characterization of targetsKLA TENCOR CORP·Filed 2013·Granted Feb 28, 2017·15 cites·12 claims
- 1089US10533940B2Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrologyKLA TENCOR CORP·Filed 2018·Granted Jan 14, 2020·2 cites·20 claims
- 1189US9784987B2Apodization for pupil imaging scatterometryKLA TENCOR CORP·Filed 2015·Granted Oct 10, 2017·5 cites·26 claims
- 1289US8582114B2Overlay metrology by pupil phase analysisMANASSEN AMNON·Filed 2011·Granted Nov 12, 2013·7 cites·23 claims
- 1386US9164397B2Optics symmetrization for metrologyMANASSEN AMNON·Filed 2011·Granted Oct 20, 2015·7 cites·15 claims
- 1486US9091650B2Apodization for pupil imaging scatterometryKLA TENCOR CORP·Filed 2013·Granted Jul 28, 2015·5 cites·30 claims
- 1584US10677588B2Localized telecentricity and focus optimization for overlay metrologyKLA TENCOR CORP·Filed 2018·Granted Jun 9, 2020·5 cites·44 claims
- 1684US10444161B2Systems and methods for metrology with layer-specific illumination spectraKLA TENCOR CORP·Filed 2017·Granted Oct 15, 2019·2 cites·57 claims
- 1781US10831108B2Method of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrologyKLA CORP·Filed 2016·Granted Nov 10, 2020·5 cites·77 claims
- 1877US11156846B2High-brightness illumination source for optical metrologyKLA TENCOR CORP·Filed 2019·Granted Oct 26, 2021·2 cites·50 claims
- 1975US11852590B1Systems and methods for metrology with layer-specific illumination spectraKLA TENCOR CORP·Filed 2019·Granted Dec 26, 2023·1 cites·34 claims
- 2069US9512985B2Systems for providing illumination in optical metrologyKLA TENCOR CORP·Filed 2013·Granted Dec 6, 2016·2 cites·50 claims
- 2169US9341769B2Spectral control systemKLA TENCOR CORP·Filed 2013·Granted May 17, 2016·2 cites·9 claims
- 2267US10126238B2Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrologyKLA TENCOR CORP·Filed 2017·Granted Nov 13, 2018·0 cites·20 claims
- 2362US2025138435A1Massive measurement sampling using multiple chucks and optical columnsKLA CORP·Filed 2023·Application pending·0 cites
- 2458US2025054872A1Overlay metrology target for die-to-wafer overlay metrologyKLA CORP·Filed 2024·Application pending·0 cites
- 2556US2023324809A1Extra tall target metrologyKLA CORP·Filed 2022·Application pending·0 cites
- 2654US9921050B2Spectral control systemKLA TENCOR CORP·Filed 2016·Granted Mar 20, 2018·0 cites·28 claims
- 2753US12131959B2Systems and methods for improved metrology for semiconductor device wafersKLA CORP·Filed 2021·Granted Oct 29, 2024·0 cites·24 claims
- 2850US2024093985A1System and method for acquiring alignment measurements of structures of a bonded sampleKLA CORP·Filed 2022·Application pending·0 cites
- 2947US11454894B2Systems and methods for scatterometric single-wavelength measurement of misregistration and amelioration thereofKLA CORP·Filed 2021·Granted Sep 27, 2022·0 cites·21 claims
- 3047US11187838B2Spectral filter for high-power fiber illumination sourcesKLA TENCOR CORP·Filed 2017·Granted Nov 30, 2021·0 cites·34 claims
- 3144US10976562B2Nano-structured non-polarizing beamsplitterKLA TENCOR CORP·Filed 2018·Granted Apr 13, 2021·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →