Inventor · disambiguated record
Olaf Dittmann
Also filed as: DITTMANN OLAF
14 granted patents·4 pending applications·38 citations·filing 2004–2015
89Inventor score
Top patents by PatentIndex Score
18 records- 0193US7982854B2Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a systemZEISS CARL SMT GMBH·Filed 2006·Granted Jul 19, 2011·15 cites·12 claims
- 0286US7728975B1Method for describing, evaluating and improving optical polarization properties of a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2006·Granted Jun 1, 2010·8 cites·27 claims
- 0374US8854606B2Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a systemMANN HANS-JÜRGEN·Filed 2011·Granted Oct 7, 2014·2 cites·20 claims
- 0474US8264668B2Illumination system of a microlithographic projection exposure apparatusFIOLKA DAMIAN·Filed 2009·Granted Sep 11, 2012·5 cites·16 claims
- 0573US8928859B2Illumination system of a microlithographic projection exposure apparatusFIOLKA DAMIAN·Filed 2012·Granted Jan 6, 2015·2 cites·20 claims
- 0666US9170499B2Illumination system of a microlithographic projection exposure apparatus comprising a depolarizing elementZEISS CARL SMT GMBH·Filed 2014·Granted Oct 27, 2015·1 cites·20 claims
- 0765US9946161B2Optical system for a microlithographic projection exposure apparatus and microlithographic exposure methodZEISS CARL SMT GMBH·Filed 2012·Granted Apr 17, 2018·1 cites·27 claims
- 0860US7961297B2Method for determining intensity distribution in the image plane of a projection exposure arrangementZEISS CARL SMS GMBH·Filed 2006·Granted Jun 14, 2011·1 cites·25 claims
- 0959US7808615B2Projection exposure apparatus and method for operating the sameZEISS CARL SMT AG·Filed 2006·Granted Oct 5, 2010·2 cites·18 claims
- 1057US7982969B2Projection objective of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2008·Granted Jul 19, 2011·1 cites·47 claims
- 1151US8325426B2Projection objective of a microlithographic projection exposure apparatusSCHUSTER KARL-HEINZ·Filed 2011·Granted Dec 4, 2012·0 cites·24 claims
- 1247US9323156B2Optical system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2012·Granted Apr 26, 2016·0 cites·23 claims
- 1345US7474469B2Arrangement of optical elements in a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2005·Granted Jan 6, 2009·0 cites·54 claims
- 1443US9581910B2Method of lithographically transferring a pattern on a light sensitive surface and illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Feb 28, 2017·0 cites·21 claims
- 1541US2005094268A1Optical system with birefringent optical elementsZEISS CARL SMT AG·Filed 2004·Application pending·0 cites
- 1640US2007007491A1Optical element, in particular for an objective or an illumination system of a microlithographic projection exposure apparatusMUELLER RALF·Filed 2006·Application pending·0 cites
- 1738US2005190446A1Catadioptric reduction objectiveCARL ZEISS AMT AG·Filed 2004·Application pending·0 cites
- 1835US2004218271A1Retardation element made from cubic crystal and an optical system therewithZEISS CARL SMT AG·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →