Inventor · disambiguated record
Oscar Franciscus Jozephus Noordman
Also filed as: NOORDMAN OSCAR · NOORDMAN OSCAR F J · NOORDMAN OSCAR FRANCISCUS JOZEPHUS
16 granted patents·69 citations·filing 1999–2020
89Inventor score
Files withASML NETHERLANDS BV12ASML HOLDING NV1JANSSENS MARCEL HENK ANDRE1JOOBEUR ADEL1ZEISS CARL SMT GMBH1
Top patents by PatentIndex Score
16 records- 0176US6455862B1Lithographic projection apparatusASML NETHERLANDS BV·Filed 1999·Granted Sep 24, 2002·51 cites·12 claims
- 0274US10139618B2Multi-mirror arrayZEISS CARL SMT GMBH·Filed 2017·Granted Nov 27, 2018·3 cites·20 claims
- 0374US9835950B2Radiation sourceASML NETHERLANDS BV·Filed 2014·Granted Dec 5, 2017·4 cites·24 claims
- 0474US7898646B2Using an interferometer as a high speed variable attenuatorASML NETHERLANDS BV·Filed 2007·Granted Mar 1, 2011·3 cites·3 claims
- 0572US7924406B2Stage apparatus, lithographic apparatus and device manufacturing method having switch device for two illumination channelsASML NETHERLANDS BV·Filed 2006·Granted Apr 12, 2011·3 cites·36 claims
- 0667US7453551B2Increasing pulse-to-pulse radiation beam uniformityASML NETHERLANDS BV·Filed 2006·Granted Nov 18, 2008·2 cites·33 claims
- 0762US8004770B2Pulse modifier with adjustable etendueASML HOLDING NV·Filed 2009·Granted Aug 23, 2011·1 cites·10 claims
- 0862US7671968B2Lithographic apparatus having masking parts and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Mar 2, 2010·1 cites·24 claims
- 0956US12099306B2Method for controlling a lithographic systemASML NETHERLANDS BV·Filed 2020·Granted Sep 24, 2024·0 cites·12 claims
- 1056US7683300B2Using an interferometer as a high speed variable attenuatorASML NETHERLANDS BV·Filed 2006·Granted Mar 23, 2010·1 cites·30 claims
- 1153US7738079B2Radiation beam pulse trimmingASML NETHERLANDS BV·Filed 2006·Granted Jun 15, 2010·0 cites·25 claims
- 1252US7826037B2Radiation beam pulse trimmingASML NETHERLANDS BV·Filed 2007·Granted Nov 2, 2010·0 cites·23 claims
- 1347US7626182B2Radiation pulse energy control system, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Dec 1, 2009·0 cites·11 claims
- 1445US9645500B2Radiation source and lithographic apparatusASML NETHERLANDS BV·Filed 2014·Granted May 9, 2017·0 cites·20 claims
- 1542US8625199B2Pulse modifier with adjustable etendueJOOBEUR ADEL·Filed 2011·Granted Jan 7, 2014·0 cites·16 claims
- 1639US8189173B2Polarization control apparatus and methodJANSSENS MARCEL HENK ANDRE·Filed 2009·Granted May 29, 2012·0 cites·34 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →