Inventor · disambiguated record
Osamu Takaoka
Also filed as: TAKAOKA OSAMU
22 granted patents·14 pending applications·145 citations·filing 1998–2022
94Inventor score
Top patents by PatentIndex Score
36 records- 0193US7189655B2Method of correcting amplitude defect in multilayer film of EUVL maskSII NANOTECHNOLOGY INC·Filed 2005·Granted Mar 13, 2007·18 cites·7 claims
- 0284US6037589AElectron beam deviceSEIKO INSTR INC·Filed 1998·Granted Mar 14, 2000·45 cites·20 claims
- 0383US7375352B2Photomask defect correction method employing a combined device of a focused electron beam device and an atomic force microscopeSII NANOTECHNOLOGY INC·Filed 2005·Granted May 20, 2008·9 cites·15 claims
- 0480US7107826B2Scanning probe device and processing method by scanning probeSII NANOTECHNOLOGY INC·Filed 2005·Granted Sep 19, 2006·6 cites·23 claims
- 0578US7018683B2Electron beam processing methodSII NANOTECHNOLOGY INC·Filed 2004·Granted Mar 28, 2006·16 cites·12 claims
- 0675US6703626B2Mask defect repair methodSEIKO INSTR INC·Filed 2002·Granted Mar 9, 2004·13 cites·11 claims
- 0774US7571639B2Method of correcting opaque defect of photomask using atomic force microscope fine processing deviceSII NANOTECHNOLOGY INC·Filed 2007·Granted Aug 11, 2009·4 cites·5 claims
- 0869US7285792B2Scratch repairing processing method and scanning probe microscope (SPM) used thereforSII NANOTECHNOLOGY INC·Filed 2005·Granted Oct 23, 2007·4 cites·18 claims
- 0969US6544692B1Black defect correction method and black defect correction device for photomaskSEIKO INSTR INC·Filed 2000·Granted Apr 8, 2003·10 cites·5 claims
- 1068US7259372B2Processing method using probe of scanning probe microscopeSII NANOTECHNOLOGY INC·Filed 2005·Granted Aug 21, 2007·4 cites·14 claims
- 1168US2022257562A1Method for improving endometriosis and method for producing a material used thereforNICHIMO KK·Filed 2022·Application pending·0 cites
- 1264US8815474B2Photomask defect correcting method and deviceTAKAOKA OSAMU·Filed 2012·Granted Aug 26, 2014·1 cites·10 claims
- 1364US7927769B2Method for fabricating EUVL maskSII NANOTECHNOLOGY INC·Filed 2009·Granted Apr 19, 2011·1 cites·11 claims
- 1464US7232995B2Method of removing particle of photomask using atomic force microscopeSII NANOTECHNOLOGY INC·Filed 2005·Granted Jun 19, 2007·1 cites·6 claims
- 1563US8257887B2Photomask defect correcting method and deviceTAKAOKA OSAMU·Filed 2008·Granted Sep 4, 2012·1 cites·18 claims
- 1661US6467426B1Photomask correction deviceSEIKO INSTR INC·Filed 2000·Granted Oct 22, 2002·6 cites·20 claims
- 1758US7804067B2Method of observing and method of working diamond stylus for working of atomic force microscopeSII NANOTECHNOLOGY INC·Filed 2007·Granted Sep 28, 2010·0 cites·4 claims
- 1857US7278299B2Method of processing vertical cross-section using atomic force microscopeSII NANOTECHNOLOGY INC·Filed 2005·Granted Oct 9, 2007·2 cites·5 claims
- 1953US2006254347A1Scanning probe device and processing method by scanning probeWATANABE NAOYA·Filed 2006·Application pending·0 cites
- 2053US2006254348A1Scanning probe device and processing method of scanning probeWATANABE NAOYA·Filed 2006·Application pending·0 cites
- 2150US2020155499A1Material for improving endometriosis and method for producing the sameNICHIMO KK·Filed 2018·Application pending·0 cites
- 2248US2008191372A1Mold inspecting method and resin residue removing method of nanoimprint lithographyTAKAOKA OSAMU·Filed 2008·Application pending·0 cites
- 2344US2007278177A1Processing method using atomic force microscope microfabrication deviceKONDO KAZUSHIGE·Filed 2007·Application pending·0 cites
- 2443US2004209172A1Defect correction method for a photomaskFiled 2004·Application pending·0 cites
- 2542US7323685B2Ion beam processing methodSII NANOTECHNOLOGY INC·Filed 2004·Granted Jan 29, 2008·0 cites·2 claims
- 2642US2008131792A1Method of Correcting Photomask DefectTAKAOKA OSAMU·Filed 2007·Application pending·0 cites
- 2741US7442925B2Working method using scanning probeSII NANOTECHNOLOGY INC·Filed 2006·Granted Oct 28, 2008·0 cites·20 claims
- 2841US2008107975A1Method of Correcting Photomask DefectTAKAOKA OSAMU·Filed 2007·Application pending·0 cites
- 2940US2008073522A1Method of correcting opaque defect of chrome mask, in which atomic force microscope fine working apparatus has been usedTAKAOKA OSAMU·Filed 2007·Application pending·0 cites
- 3039US6335530B1Objective lens for scanning electron microscopeSEIKO INSTR INC·Filed 1998·Granted Jan 1, 2002·4 cites·34 claims
- 3139US2004154744A1Method and system for surface or cross-sectional processing and observationFiled 2004·Application pending·0 cites
- 3239US2009028420A1Photomask defect-shape recognition apparatus, photomask defect-shape recognition method, and photomask defect correction methodNAKAUE TAKUYA·Filed 2008·Application pending·0 cites
- 3339US2009092905A1Photomask defect correction device and photomask defect correction methodNAKAUE TAKUYA·Filed 2008·Application pending·0 cites
- 3435US8062494B2Micro-machining dust removing device, micro-machining apparatus, and micro-machining dust removing methodIWATA FUTOSHI·Filed 2007·Granted Nov 22, 2011·0 cites·34 claims
- 3534US2009038383A1Photomask defect correction device and photomask defect correction methodNAKAUE TAKUYA·Filed 2008·Application pending·0 cites
- 3632US7378654B2Processing probeSII NANOTECHNOLOGY INC·Filed 2005·Granted May 27, 2008·0 cites·17 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →