Inventor · disambiguated record
Osamu Tanitsu
Also filed as: TANITSU OSAMU
57 granted patents·35 pending applications·1,384 citations·filing 1994–2019
99Inventor score
Top patents by PatentIndex Score
92 records- 0198US7423731B2Illumination optical system, exposure apparatus, and exposure method with polarized switching deviceNIKON CORP·Filed 2005·Granted Sep 9, 2008·59 cites·58 claims
- 0297US7515248B2Illumination optical system, exposure apparatus, and exposure method with polarized state detection result and adjustmentNIKON CORP·Filed 2007·Granted Apr 7, 2009·25 cites·28 claims
- 0397US6563567B1Method and apparatus for illuminating a surface using a projection imaging apparatusNIKON CORP·Filed 2000·Granted May 13, 2003·143 cites·24 claims
- 0497US5581605AOptical element, production method of optical element, optical system, and optical apparatusNIKON CORP·Filed 1995·Granted Dec 3, 1996·148 cites·31 claims
- 0596US8456624B2Inspection device and inspecting method for spatial light modulator, illumination optical system, method for adjusting the illumination optical system, exposure apparatus, and device manufacturing methodTANITSU OSAMU·Filed 2010·Granted Jun 4, 2013·14 cites·29 claims
- 0696US6913373B2Optical illumination device, exposure device and exposure methodNIKON CORP·Filed 2003·Granted Jul 5, 2005·136 cites·34 claims
- 0796US6597430B1Exposure method, illuminating device, and exposure systemNIKON CORP·Filed 2000·Granted Jul 22, 2003·92 cites·38 claims
- 0895US9140990B2Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure methodTANITSU OSAMU·Filed 2011·Granted Sep 22, 2015·8 cites·9 claims
- 0995US6741394B1Optical integrator, illumination optical apparatus, exposure apparatus and observation apparatusNIKON CORP·Filed 2000·Granted May 25, 2004·63 cites·46 claims
- 1094US8379187B2Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing methodNIKON CORP·Filed 2008·Granted Feb 19, 2013·12 cites·28 claims
- 1193US8446579B2Inspection device and inspecting method for spatial light modulator, illumination optical system, method for adjusting the illumination optical system, exposure apparatus, and device manufacturing methodTANITSU OSAMU·Filed 2012·Granted May 21, 2013·7 cites·18 claims
- 1293US8039807B2Exposure apparatus, exposure method, and method for producing deviceNIKON CORP·Filed 2007·Granted Oct 18, 2011·9 cites·14 claims
- 1392US9423694B2Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure methodNIKON CORP·Filed 2013·Granted Aug 23, 2016·4 cites·34 claims
- 1491US7095560B2Diffractive optical device, refractive optical device, illumination optical system, exposure apparatus and exposure methodNIKON CORP·Filed 2004·Granted Aug 22, 2006·44 cites·47 claims
- 1591US5669708AOptical element, production method of optical element, optical system, and optical apparatusNIKON CORP·Filed 1996·Granted Sep 23, 1997·90 cites·17 claims
- 1690US6238063B1Illumination optical apparatus and projection exposure apparatusNIKON CORP·Filed 1999·Granted May 29, 2001·89 cites·23 claims
- 1790US6236449B1Illumination optical apparatus and exposure apparatusNIKON CORP·Filed 1999·Granted May 22, 2001·70 cites·33 claims
- 1889US5636003AIllumination optical apparatus and scanning exposure apparatusNIKON CORP·Filed 1994·Granted Jun 3, 1997·56 cites·42 claims
- 1987US8913227B2Illumination optical system, aligner, and process for fabricating deviceTANITSU OSAMU·Filed 2011·Granted Dec 16, 2014·5 cites·28 claims
- 2085US5867319AIllumination optical system, an exposure apparatus having the illumination system, and a method for manufacturing a semiconductor deviceNIKON CORP·Filed 1997·Granted Feb 2, 1999·64 cites·44 claims
- 2184US10768409B2Spatial light modulator unit, illumination optical system, exposure device, and device manufacturing methodNIKON CORP·Filed 2019·Granted Sep 8, 2020·1 cites·9 claims
- 2283US8094290B2Illumination optical apparatus, exposure apparatus, and device manufacturing methodOWA SOICHI·Filed 2008·Granted Jan 10, 2012·12 cites·20 claims
- 2383US5640284AOptical reflector, illumination optical system, light source system and illumination optical apparatusNIKON CORP·Filed 1994·Granted Jun 17, 1997·40 cites·60 claims
- 2482US9366970B2Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing methodNIKON CORP·Filed 2014·Granted Jun 14, 2016·2 cites·17 claims
- 2580US10025194B2Exposure apparatus, exposure method, and method for producing deviceNIKON CORP·Filed 2016·Granted Jul 17, 2018·1 cites·15 claims
- 2679US10175583B2Illumination optical system, exposure apparatus, device production method, and light polarization unitNIKON CORP·Filed 2017·Granted Jan 8, 2019·2 cites·24 claims
- 2776US9513558B2Exposure apparatus, exposure method, and method for producing deviceNIKON CORP·Filed 2014·Granted Dec 6, 2016·1 cites·38 claims
- 2876US9429848B2Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure methodTANITSU OSAMU·Filed 2008·Granted Aug 30, 2016·6 cites·17 claims
- 2976US8749759B2Exposure apparatus, exposure method, and method for producing deviceNIKON CORP·Filed 2012·Granted Jun 10, 2014·1 cites·30 claims
- 3075US7515247B2Illumination optical system, exposure apparatus, and exposure method with polarized state fluctuation correcting deviceNIKON CORP·Filed 2007·Granted Apr 7, 2009·2 cites·30 claims
- 3175US5731577AIllumination apparatus and projection exposure apparatus using the sameNIKON CORP·Filed 1996·Granted Mar 24, 1998·36 cites·47 claims
- 3273US9857599B2Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing methodNIPPON KOGAKU KK·Filed 2016·Granted Jan 2, 2018·1 cites·18 claims
- 3372US9057963B2Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing methodNIKON CORP·Filed 2013·Granted Jun 16, 2015·1 cites·10 claims
- 3472US5955243AIllumination optical system and method of manufacturing semiconductor devicesNIKON CORP·Filed 1998·Granted Sep 21, 1999·31 cites·35 claims
- 3570US9341954B2Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing methodNIKON CORP·Filed 2015·Granted May 17, 2016·1 cites·17 claims
- 3667US9678332B2Illumination apparatus, illumination method, exposure apparatus, and device manufacturing methodNIKON CORP·Filed 2015·Granted Jun 13, 2017·1 cites·17 claims
- 3766US10691026B2Illumination optical system, exposure apparatus, device production method, and light polarization unitNIKON CORP·Filed 2019·Granted Jun 23, 2020·0 cites·21 claims
- 3865US9116346B2Illumination apparatus, illumination method, exposure apparatus, and device manufacturing methodTANITSU OSAMU·Filed 2008·Granted Aug 25, 2015·1 cites·32 claims
- 3965US8451427B2Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing methodTANITSU OSAMU·Filed 2008·Granted May 28, 2013·1 cites·13 claims
- 4065US2018348643A1Exposure apparatus, exposure method, and method for producing deviceNIKON CORP·Filed 2018·Application pending·0 cites
- 4165US2018341185A1Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure methodNIKON CORP·Filed 2018·Application pending·0 cites
- 4264US10203496B2Spatial light modulator unit, illumination optical system, exposure device, and device manufacturing methodNIKON CORP·Filed 2017·Granted Feb 12, 2019·0 cites·8 claims
- 4364US2018143444A1Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing methodNIKON CORP·Filed 2017·Application pending·0 cites
- 4463US10007194B2Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure methodTANITSU OSAMU·Filed 2008·Granted Jun 26, 2018·1 cites·7 claims
- 4563US5912725AIllumination optical system to be used in an exposure apparatus and a method of manufacturing a semiconductor structure using the exposure apparatusNIKON CORP·Filed 1996·Granted Jun 15, 1999·21 cites·62 claims
- 4662US8908151B2Illumination optical system, exposure apparatus, device manufacturing method, compensation filter, and exposure optical systemMURAMATSU KOUJI·Filed 2009·Granted Dec 9, 2014·4 cites·39 claims
- 4762US2017227854A1Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure methodNIKON CORP·Filed 2017·Application pending·0 cites
- 4861US9817229B2Spatial light modulator unit, illumination optical system, exposure device, and device manufacturing methodNIKON CORP·Filed 2016·Granted Nov 14, 2017·0 cites·16 claims
- 4960US10241417B2Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure methodNIKON CORP·Filed 2013·Granted Mar 26, 2019·0 cites·32 claims
- 5060US10234770B2Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure methodNIKON CORP·Filed 2013·Granted Mar 19, 2019·0 cites·33 claims
Showing the top 50 of 92 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Osamu Tanitsu files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →