Exposure apparatus, exposure method, and method for producing device

Abstract

An exposure apparatus includes a sensor for detecting light arriving from a projection optical system via a liquid provided on an image plane side of the projection optical system. The sensor includes a light transmissive member provided on a stage and a light receiving element for receiving light arriving from the projection optical system via the light transmissive member. The light transmissive member includes a first surface and a second surface. The first surface is arranged on the stage, comes into contact with the liquid, and is a surface on which the light arriving from the projection optical system is incident via the liquid. At least one of the first and second surfaces diffuses or diffracts the light having arrived from the projection optical system. The light receiving element receives the light that has been diffused or diffracted.

What is claimed is: 
     
         1 . An exposure apparatus for exposing a substrate to light via liquid, the exposure apparatus comprising:
 a stage for holding the substrate;   a projection optical system for projecting a pattern image onto the substrate held on the stage via the liquid provided on an image plane side of the projection optical system; and   a sensor for detecting light arriving from the projection optical system via the liquid provided on the image plane side of the projection optical system, wherein   the sensor comprises a light transmissive member provided on the stage and a light receiving element for receiving light arriving from the projection optical system via the light transmissive member,   the light transmissive member includes a first surface and a second surface, the first surface being arranged on the stage so as to come into contact with the liquid and being a surface on which the light arriving from the projection optical system is incident via the liquid, at least one of the first surface and the second surface being configured to diffuse or diffract the light having arrived from the projection optical system, the light transmissive member being configured so that light from the projection optical system arrives at the second surface via the liquid and the first surface without passing through a gas portion, and   the light receiving element is arranged to receive light diffused or diffracted by at least one of the first surface and the second surface of the light transmissive member.   
     
     
         2 . The exposure apparatus according to  claim 1 , wherein the first surface is arranged in an opening formed on the stage so that the first surface is flush with an upper surface of the stage, the opening being surrounded by the upper surface. 
     
     
         3 . The exposure apparatus according to  claim 2 , wherein the stage comprises a substrate holder for holding the substrate so that the upper surface of the stage is flush with an upper surface of the substrate. 
     
     
         4 . The exposure apparatus according to  claim 1 , wherein the light transmissive member is configured so that a gas does not exist in an optical path of the light between the first surface and the second surface. 
     
     
         5 . The exposure apparatus according to  claim 1 , wherein the light transmissive member includes a diffusing member or a diffractive optical element. 
     
     
         6 . The exposure apparatus according to  claim 1 , wherein the light transmissive member includes a light shielding section configured to shield a part of the light from the projection optical system. 
     
     
         7 . The exposure apparatus according to  claim 1 , wherein a receiving surface of the light receiving element and the second surface of the light transmissive member are arranged separate from each other. 
     
     
         8 . The exposure apparatus according to  claim 1 , further comprising an aperture diaphragm configured to set an open angle of the light from the projection optical system,
 wherein the light transmissive member is configured to allow an outermost ray of the light, which is within the open angle set by the aperture diaphragm, to pass through the light transmissive member.   
     
     
         9 . The exposure apparatus according to  claim 1 , further comprising an aperture diaphragm configured to set an incident angle of the light from the projection optical system with respect to the first surface,
 wherein the light transmissive member is configured to allow an outermost ray of the light, which has passed through the aperture diaphragm, to pass through the light transmissive member.   
     
     
         10 . The exposure apparatus according to  claim 1 , wherein the light receiving element is arranged to receive an outermost ray of the light from the projection optical system via the light transmissive member. 
     
     
         11 . The exposure apparatus according to  claim 1 , wherein the sensor is configured to measure a spatial image formed by the projection optical system based on a light-receiving result of the light by the light receiving element. 
     
     
         12 . The exposure apparatus according to  claim 1 , wherein a discharge port for discharging the liquid is arranged at an upper surface of the stage. 
     
     
         13 . The exposure apparatus according to  claim 1 , further comprising an illumination optical system configured to illuminate the light to the substrate via the projection optical system,
 wherein, under a same illumination condition as an illumination condition in an exposure process with respect to the substrate, the sensor is configured to detect the light irradiated to the light transmissive member from the illumination optical system via the projection optical system.   
     
     
         14 . The exposure apparatus according to  claim 1 , further comprising a controller configured to set a control parameter relating to an exposure process with respect to the substrate based on a detection result of the light by the sensor. 
     
     
         15 . The exposure apparatus according to  claim 1 , wherein the projection optical system is a catadioptric system. 
     
     
         16 . A method of manufacturing a device, the method comprising:
 exposing a substrate using the exposure apparatus according to  claim 1 ; and   developing the substrate that has been exposed.