Inventor · disambiguated record
Tsuneyuki Hagiwara
Also filed as: HAGIWARA TSUNEYUKI
37 granted patents·7 pending applications·1,166 citations·filing 1992–2021
98Inventor score
Top patents by PatentIndex Score
44 records- 0198US6992751B2Scanning exposure apparatusNIKON CORP·Filed 2003·Granted Jan 31, 2006·175 cites·32 claims
- 0296US7230680B2Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semiconductor device manufacturing method using a wafer evaluated by the evaluation methodNIKON CORP·Filed 2003·Granted Jun 12, 2007·109 cites·20 claims
- 0394US6727980B2Apparatus and method for pattern exposure and method for adjusting the apparatusNIKON CORP·Filed 2001·Granted Apr 27, 2004·55 cites·39 claims
- 0494US5764363AApparatus for observing a surface using polarized lightNIKON CORP·Filed 1996·Granted Jun 9, 1998·137 cites·104 claims
- 0593US6381004B1Exposure apparatus and device manufacturing methodNIKON CORP·Filed 2000·Granted Apr 30, 2002·64 cites·30 claims
- 0691US7474386B2Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semiconductor device manufacturing method using a wafer evaluated by the evaluation methodTOSHIBA KK·Filed 2007·Granted Jan 6, 2009·14 cites·12 claims
- 0790US7965387B2Image plane measurement method, exposure method, device manufacturing method, and exposure apparatusNIKON CORP·Filed 2005·Granted Jun 21, 2011·12 cites·30 claims
- 0886US6538721B2Scanning exposure apparatusNIKON CORP·Filed 2002·Granted Mar 25, 2003·23 cites·27 claims
- 0984US7791718B2Measurement method, exposure method, and device manufacturing methodNIKON CORP·Filed 2005·Granted Sep 7, 2010·7 cites·18 claims
- 1084US5838433AApparatus for detecting defects on a maskNIKON CORP·Filed 1996·Granted Nov 17, 1998·71 cites·34 claims
- 1184US5436464AForeign particle inspecting method and apparatus with correction for pellicle transmittanceNIKON CORP·Filed 1993·Granted Jul 25, 1995·73 cites·14 claims
- 1283US5471066ADefect inspection apparatus of rotary typeNIKON CORP·Filed 1994·Granted Nov 28, 1995·51 cites·8 claims
- 1381US5798831ADefect inspecting apparatus and defect inspecting methodNIKON CORP·Filed 1997·Granted Aug 25, 1998·61 cites·32 claims
- 1480US10025194B2Exposure apparatus, exposure method, and method for producing deviceNIKON CORP·Filed 2016·Granted Jul 17, 2018·1 cites·15 claims
- 1578US7365830B2Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semiconductor device manufacturing method using a wafer evaluated by the evaluation methodTOSHIBA KK·Filed 2007·Granted Apr 29, 2008·4 cites·6 claims
- 1678US5790251ADefect inspecting apparatusNIKON CORP·Filed 1997·Granted Aug 4, 1998·50 cites·18 claims
- 1776US9513558B2Exposure apparatus, exposure method, and method for producing deviceNIKON CORP·Filed 2014·Granted Dec 6, 2016·1 cites·38 claims
- 1876US8749759B2Exposure apparatus, exposure method, and method for producing deviceNIKON CORP·Filed 2012·Granted Jun 10, 2014·1 cites·30 claims
- 1976US7566893B2Best focus detection method, exposure method, and exposure apparatusNIKON CORP·Filed 2005·Granted Jul 28, 2009·7 cites·27 claims
- 2076US5363187ALight scanning apparatus for detecting foreign particles on surface having circuit patternNIKON CORP·Filed 1993·Granted Nov 8, 1994·45 cites·26 claims
- 2175US5680207ADefect inspecting apparatus and defect inspecting methodNIKON CORP·Filed 1996·Granted Oct 21, 1997·43 cites·7 claims
- 2268US7344808B2Method of making photomask blank substratesSHINETSU CHEMICAL CO·Filed 2004·Granted Mar 18, 2008·10 cites·5 claims
- 2365US7351504B2Photomask blank substrate, photomask blank and photomaskSHINETSU CHEMICAL CO·Filed 2004·Granted Apr 1, 2008·8 cites·7 claims
- 2465US2018348643A1Exposure apparatus, exposure method, and method for producing deviceNIKON CORP·Filed 2018·Application pending·0 cites
- 2564US7081946B2Holding apparatus, holding method, exposure apparatus and device manufacturing methodNIKON CORP·Filed 2003·Granted Jul 25, 2006·8 cites·45 claims
- 2662US5907396AOptical detection system for detecting defects and/or particles on a substrateNIKON CORP·Filed 1997·Granted May 25, 1999·25 cites·15 claims
- 2762US5629768ADefect inspecting apparatusNIKON CORP·Filed 1995·Granted May 13, 1997·25 cites·14 claims
- 2858US5623340AForeign particle inspection apparatusNIKON CORP·Filed 1995·Granted Apr 22, 1997·22 cites·22 claims
- 2953US11928794B2Image processing device, image processing program, image processing method, and imaging deviceNIKON CORP·Filed 2021·Granted Mar 12, 2024·0 cites·20 claims
- 3050US5442189AApparatus for inspecting defects and foreign substances having a spot illuminated focusing systemNIKON CORP·Filed 1993·Granted Aug 15, 1995·14 cites·9 claims
- 3149US5646725AForeign matter inspection apparatus for large-scale substrateNIKON CORP·Filed 1995·Granted Jul 8, 1997·13 cites·12 claims
- 3248US2006146312A1Holding apparatus, holding method, exposure apparatus and device manufacturing methodNIKON CORP·Filed 2006·Application pending·0 cites
- 3347US5149982AForeign particle inspection apparatusNIKON CORP·Filed 1992·Granted Sep 22, 1992·13 cites·11 claims
- 3446US8305553B2Exposure apparatus and device manufacturing methodNAKANO KATSUSHI·Filed 2005·Granted Nov 6, 2012·0 cites·58 claims
- 3546US5736735AOptical scanning device and foreign matter inspection apparatusNIKON CORP·Filed 1996·Granted Apr 7, 1998·11 cites·15 claims
- 3645US2008013090A1Measurement method, measurement unit, processing unit, pattern forming method , and device manufacturing methodNIKON CORP·Filed 2007·Application pending·0 cites
- 3744US2007146708A1Mark structure, mark measurement apparatus, pattern forming apparatus and detection apparatus, and detection method and device manufacturing methodNIKON CORP·Filed 2006·Application pending·0 cites
- 3843US2009047607A1Exposure method, exposure apparatus and device fabricating methodsNAGASAKA HIROYUKI·Filed 2006·Application pending·0 cites
- 3942US5365330AForeign particle inspection apparatusNIKON CORP·Filed 1992·Granted Nov 15, 1994·9 cites·26 claims
- 4038US7329475B2Method of selecting photomask blank substratesSHIN ESTU CHEMICAL CO LTD·Filed 2004·Granted Feb 12, 2008·0 cites·2 claims
- 4138US7070888B2Method of selecting photomask blank substratesNIKON CORP·Filed 2004·Granted Jul 4, 2006·0 cites·6 claims
- 4235US2002021433A1scanning exposure apparatusFiled 2001·Application pending·0 cites
- 4333US5695268ALight source apparatusNIKON CORP·Filed 1996·Granted Dec 9, 1997·4 cites·4 claims
- 4432US2002041377A1Aerial image measurement method and unit, optical properties measurement method and unit, adjustment method of projection optical system, exposure method and apparatus, making method of exposure apparatus, and device manufacturing methodNIKON CORP·Filed 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →