Holding apparatus, holding method, exposure apparatus and device manufacturing method

Abstract

A reticle holder has a first suction section facing a precision warrantable area having a predetermined surface precision, of a lower face of a reticle, a second suction section facing a precision unwarrantable area outside of the precision warrantable area, a pore connected to a suction apparatus that draws out gas in a space between the lower face of the reticle and the first suction section, and a pore connected to the suction apparatus and that draws out gas in the space between the lower face of the reticle and the second suction section. As a result, the reticle can be held stably, without deteriorating the surface precision of the precision warrantable area.

1 . A holding apparatus which holds a surface to be attracted of a flat sample, comprising: 
 a first holding section facing a first area having predetermined surface precision of the surface to be attracted;    a second holding section facing a second area other than the first area of the surface to be attracted; and    a suction apparatus which draws out gas in spaces between the surface to be attracted and the first and the second holding sections.    
   
   
       2 . A holding apparatus according to  claim 1 , wherein the suction apparatus comprises: 
 a first suction device which draws out gas in the space between the surface to be attracted and the first holding section; and    a second suction device which draws out gas in the space between the surface to be attracted and the second holding section.    
   
   
       3 . A holding apparatus according to  claim 1 , wherein each of the first holding section and the second holding section are arranged at a plurality of positions with respect to the surface to be attracted.  
   
   
       4 . A holding apparatus according to  claim 1 , wherein the first holding section and the second holding section are arranged adjacent to each other, and 
 a boundary portion between the first holding section and the second holding section is arranged at least in the first area.    
   
   
       5 . A holding apparatus according to  claim 1 , wherein the first holding section and the first area come in contact with each other, and the second holding section and the second area are set to have a predetermined gap.  
   
   
       6 . A holding apparatus according to  claim 1 , wherein 
 the first area is a planar portion formed on a substantially central portion of the surface to be attracted, and    the second area is a taper portion formed on the outside of the central portion in a direction away from the second holding section towards the outside from the central side.    
   
   
       7 . A holding apparatus according to  claim 1 , wherein 
 a height position of the second holding section is set corresponding to the shape of the surface to be attracted.    
   
   
       8 . A holding apparatus according to  claim 1 , wherein a height position of the second holding section is set to a position lower than the first holding section with respect to the surface to be attracted.  
   
   
       9 . A holding apparatus according to  claim 1 , wherein there is provided a control apparatus which separately controls a suction amount of gas per unit time by the first suction device and a suction amount of gas per unit time by the second suction device.  
   
   
       10 . A holding apparatus according to  claim 1 , wherein the suction amount of gas per unit time by the first suction device is set greater than the suction amount of gas per unit time by the second suction device.  
   
   
       11 . A holding apparatus according to  claim 1 , wherein an area of the first holding section with respect to the first area is set larger than an area of the second holding section with respect to the second area.  
   
   
       12 . A holding apparatus according to  claim 1 , having a pin and chuck holder, and the first holding section and the second holding section are suction pads of the pin and chuck holder.  
   
   
       13 . A holding method for holding a surface to be attracted of a flat sample, wherein 
 each of a first area having a predetermined surface precision of the surface to be attracted and a second area other than the first area of the surface to be attracted are attracted and held by a first holding section and a second holding section, respectively and independently.    
   
   
       14 . A holding method according to  claim 13 , wherein the holding is performed while having a predetermined gap between the second holding section and the second area.  
   
   
       15 . A holding method according to  claim 13 , wherein an area of the first holding section with respect to the first area is set larger than an area of the second holding section with respect to the second area.  
   
   
       16 . An exposure apparatus which exposes a pattern of a mask held by a mask holder onto a substrate held by a substrate holder, wherein the holding apparatus according to  claim 1  is used for at least one of the mask holder and the substrate holder.  
   
   
       17 . A device manufacturing method incorporating a lithography process, wherein the exposure apparatus according to  claim 16  is used in the lithography process.  
   
   
       18 . A holding apparatus which holds a surface to be attracted of a flat sample, having a holding section for attracting and holding a peripheral part of the flat sample, wherein the holding section comprises: 
 a first holding section which is brought into contact with a surface to be attracted of the sample, to attract the sample; and    a second holding section arranged further to the outside of the sample than the first holding section, and having a small gap with the surface to be attracted of the sample so as to suppress distortion in the surface to be attracted of the sample on the inside from the first holding section.    
   
   
       19 . A holding apparatus according to  claim 18 , wherein the holding section comprises a partition section for forming the first holding section and the second holding section, and a plurality of pin members arranged on an inside of the partition section.  
   
   
       20 . A holding apparatus according to  claim 18 , wherein a suction section of the second holding section is arranged lower than a suction section of the first holding section.  
   
   
       21 . A holding apparatus according to  claim 18 , wherein a suction section of the second holding section is communicated with a suction section of the first holding section, and further having a suction apparatus which sucks the suction section of the second holding section together with the suction section of the first holding section.  
   
   
       22 . An exposure apparatus which exposes a pattern of a mask held by a mask holder onto a substrate, wherein the holding apparatus according to  claim 18  is used for the mask holder.  
   
   
       23 . A holding apparatus which holds a surface to be attracted of a flat sample, having a holding section for attracting and holding a peripheral part of the flat sample, wherein the holding section comprises: 
 a first holding section which is brought into contact with a surface to be attracted of the sample, to attract the sample; and    a second holding section arranged further to the outside of the sample than the first holding section, and with a suction section arranged lower than the first holding section.    
   
   
       24 . An exposure apparatus which exposes a pattern of a mask held by a mask holder onto a substrate, wherein the holding apparatus according to  claim 23  is used for the mask holder.