Inventor · disambiguated record
Paul Franzen
Also filed as: FRANZEN PAUL · FRANZEN PAUL M
8 granted patents·4 pending applications·331 citations·filing 2006–2023
86Inventor score
Top patents by PatentIndex Score
12 records- 0195US7115017B1Methods for controlling the pressures of adjustable pressure zones of a work piece carrier during chemical mechanical planarizationNOVELLUS SYSTEMS INC·Filed 2006·Granted Oct 3, 2006·272 cites·21 claims
- 0289US7264537B1Methods for monitoring a chemical mechanical planarization process of a metal layer using an in-situ eddy current measuring systemNOVELLUS SYSTEMS INC·Filed 2006·Granted Sep 4, 2007·19 cites·21 claims
- 0387US8106651B2Methods and apparatuses for determining thickness of a conductive layerLAHIRI SUDEEP KUMAR·Filed 2008·Granted Jan 31, 2012·25 cites·32 claims
- 0481US9624578B2Method for RF compensation in plasma assisted atomic layer depositionLAM RES CORP·Filed 2014·Granted Apr 18, 2017·2 cites·13 claims
- 0581US7811153B1High throughput servo load cup with integrated wet chemistry deliveryNOVELLUS SYSTEMS INC·Filed 2007·Granted Oct 12, 2010·11 cites·29 claims
- 0661US7887392B2Platen assembly and work piece carrier head employing flexible circuit sensorNOVELLUS SYSTEMS INC·Filed 2007·Granted Feb 15, 2011·2 cites·16 claims
- 0760US2025315027A1Virtual semiconductor fab environmentLAM RES CORP·Filed 2023·Application pending·0 cites
- 0855US2025140542A1Evaluation of plasma uniformity using computer visionLAM RES CORP·Filed 2023·Application pending·0 cites
- 0953US2024410760A1Thermal imaging for analysis of device fabrication toolsLAM RES CORP·Filed 2022·Application pending·0 cites
- 1051US2024234112A1Image analysis of plasma conditionsLAM RES CORP·Filed 2022·Application pending·0 cites
- 1147US7428470B2Method for monitoring edge exclusion during chemical mechanical planarizationNOVELLUS SYSTEMS INC·Filed 2007·Granted Sep 23, 2008·0 cites·18 claims
- 1245US9007059B2Methods for monitoring thickness of a conductive layerLAHIRI SUDEEP KUMAR·Filed 2012·Granted Apr 14, 2015·0 cites·27 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →