Inventor · disambiguated record
Paul Graeupner
Also filed as: GRAEUPNER PAUL
21 granted patents·4 pending applications·214 citations·filing 2003–2020
94Inventor score
Files withZEISS CARL SMT AG11ZEISS CARL SMT GMBH5GRAEUPNER PAUL4ASML NETHERLANDS BV2DEGUENTHER MARKUS1
Top patents by PatentIndex Score
25 records- 0197US7227616B2Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2005·Granted Jun 5, 2007·63 cites·11 claims
- 0294US7233386B2Method of optimizing imaging performanceZEISS CARL SMT AG·Filed 2005·Granted Jun 19, 2007·16 cites·33 claims
- 0394US7209292B2Projection objective, especially for microlithography, and method for adjusting a projection objectiveZEISS CARL SMT AG·Filed 2003·Granted Apr 24, 2007·56 cites·99 claims
- 0490US7352435B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Apr 1, 2008·26 cites·22 claims
- 0588US7570345B2Method of optimizing imaging performanceZEISS CARL SMT AG·Filed 2007·Granted Aug 4, 2009·7 cites·4 claims
- 0687US7800732B2Projection exposure method and projection exposure apparatus for microlithographyZEISS CARL SMT AG·Filed 2009·Granted Sep 21, 2010·9 cites·21 claims
- 0787US7310187B2Projection objective, especially for microlithography, and method for adjusting a projection objectiveZEISS CARL SMT AG·Filed 2007·Granted Dec 18, 2007·8 cites·32 claims
- 0885US7961293B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2008·Granted Jun 14, 2011·5 cites·25 claims
- 0978US8027091B2Method for correcting optical proximity effectsZEISS CARL SMT GMBH·Filed 2007·Granted Sep 27, 2011·4 cites·37 claims
- 1076US11366382B2Method and apparatus for performing an aerial image simulation of a photolithographic maskZEISS CARL SMT GMBH·Filed 2020·Granted Jun 21, 2022·1 cites·21 claims
- 1173US8605257B2Projection system with compensation of intensity variations and compensation element thereforPAZIDIS ALEXANDRA·Filed 2005·Granted Dec 10, 2013·7 cites·45 claims
- 1269US7209241B2Method for determining wavefront aberrationsZEISS CARL SMT AG·Filed 2006·Granted Apr 24, 2007·2 cites·25 claims
- 1363US8917379B2Projection exposure methods and systemsGRAEUPNER PAUL·Filed 2009·Granted Dec 23, 2014·1 cites·24 claims
- 1463US7019846B2Method for determining wavefront aberrationsZEISS CARL SMT AG·Filed 2003·Granted Mar 28, 2006·8 cites·12 claims
- 1562US9885958B2Projection exposure methods and systemsZEISS CARL SMT GMBH·Filed 2014·Granted Feb 6, 2018·0 cites·19 claims
- 1662US8416390B2Illumination system for illuminating a mask in a microlithographic exposure apparatusDEGUENTHER MARKUS·Filed 2009·Granted Apr 9, 2013·1 cites·31 claims
- 1759US2018164691A1Projection exposure methods and systemsZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 1856US8711330B2Lithographic apparatus and device manufacturing methodSTREEFKERK BOB·Filed 2011·Granted Apr 29, 2014·0 cites·14 claims
- 1956US8237915B2Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatusGRAEUPNER PAUL·Filed 2008·Granted Aug 7, 2012·0 cites·12 claims
- 2055US2007195299A1Method for improving an Optical Imaging Property of a Projection Objective of a Microlithographic Projection Exposure ApparatusZEISS CARL SMT AG·Filed 2007·Application pending·0 cites
- 2155US2013114056A1Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatusGRAEUPNER PAUL·Filed 2012·Application pending·0 cites
- 2252US8405907B2Method for correcting optical proximity effectsGRAEUPNER PAUL·Filed 2011·Granted Mar 26, 2013·0 cites·17 claims
- 2350US7649702B2Immersion lithography objectiveZEISS CARL SMT AG·Filed 2008·Granted Jan 19, 2010·0 cites·10 claims
- 2440US2008036982A1Method For Structuring A Substrate Using Multiple ExposureZEISS CARL SMT AG·Filed 2005·Application pending·0 cites
- 2537US9690203B2Method for adjusting an illumination settingZEISS CARL SMT GMBH·Filed 2015·Granted Jun 27, 2017·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →