Inventor · disambiguated record
Philip S. H. Chen
Also filed as: CHEN PHILIP · CHEN PHILIP S · CHEN PHILIP S H
37 granted patents·17 pending applications·1,784 citations·filing 1997–2024
98Inventor score
Top patents by PatentIndex Score
54 records- 0198US7838329B2Antimony and germanium complexes useful for CVD/ALD of metal thin filmsADVANCED TECH MATERIALS·Filed 2007·Granted Nov 23, 2010·55 cites·21 claims
- 0298US7475588B2Apparatus and process for sensing fluoro species in semiconductor processing systemsADVANCED TECH MATERIALS·Filed 2005·Granted Jan 13, 2009·474 cites·64 claims
- 0398US7296460B2Apparatus and process for sensing fluoro species in semiconductor processing systemsADVANCED TECH MATERIALS·Filed 2005·Granted Nov 20, 2007·481 cites·23 claims
- 0498US7080545B2Apparatus and process for sensing fluoro species in semiconductor processing systemsADVANCED TECH MATERIALS·Filed 2002·Granted Jul 25, 2006·495 cites·81 claims
- 0597US9537095B2Tellurium compounds useful for deposition of tellurium containing materialsENTEGRIS INC·Filed 2014·Granted Jan 3, 2017·14 cites·20 claims
- 0696US8796068B2Tellurium compounds useful for deposition of tellurium containing materialsADVANCED TECH MATERIALS·Filed 2013·Granted Aug 5, 2014·12 cites·10 claims
- 0795US8008117B2Antimony and germanium complexes useful for CVD/ALD of metal thin filmsADVANCED TECH MATERIALS·Filed 2010·Granted Aug 30, 2011·14 cites·20 claims
- 0893US8268665B2Antimony and germanium complexes useful for CVD/ALD of metal thin filmsHUNKS WILLIAM·Filed 2011·Granted Sep 18, 2012·12 cites·20 claims
- 0992US8709863B2Antimony and germanium complexes useful for CVD/ALD of metal thin filmsADVANCED TECH MATERIALS·Filed 2012·Granted Apr 29, 2014·9 cites·22 claims
- 1089US11466038B2Vapor deposition precursor compounds and process of useENTEGRIS INC·Filed 2020·Granted Oct 11, 2022·2 cites·2 claims
- 1189US8330136B2High concentration nitrogen-containing germanium telluride based memory devices and processes of makingZHENG JUN-FEI·Filed 2009·Granted Dec 11, 2012·9 cites·20 claims
- 1288US8093140B2Amorphous Ge/Te deposition processCHEN PHILIP S H·Filed 2008·Granted Jan 10, 2012·11 cites·20 claims
- 1387US6599447B2Zirconium-doped BST materials and MOCVD process forming sameADVANCED TECH MATERIALS·Filed 2000·Granted Jul 29, 2003·36 cites·35 claims
- 1485US10186570B2ALD processes for low leakage current and low equivalent oxide thickness BiTaO filmsENTEGRIS INC·Filed 2014·Granted Jan 22, 2019·9 cites·14 claims
- 1585US9997362B2Cobalt CVDENTEGRIS INC·Filed 2015·Granted Jun 12, 2018·4 cites·14 claims
- 1685US6361584B1High temperature pressure swing adsorption system for separation of oxygen-containing gas mixturesADVANCED TECH MATERIALS·Filed 1999·Granted Mar 26, 2002·67 cites·49 claims
- 1783US11371138B2Chemical vapor deposition processes using ruthenium precursor and reducing gasENTEGRIS INC·Filed 2019·Granted Jun 28, 2022·2 cites·18 claims
- 1882US7296458B2Nickel-coated free-standing silicon carbide structure for sensing fluoro or halogen species in semiconductor processing systems, and processes of making and using sameADVANCED TECH MATERIALS·Filed 2004·Granted Nov 20, 2007·21 cites·38 claims
- 1982US7228724B2Apparatus and process for sensing target gas species in semiconductor processing systemsADVANCED TECH MATERIALS·Filed 2004·Granted Jun 12, 2007·19 cites·41 claims
- 2080US7370511B1Gas sensor with attenuated drift characteristicMST TECHNOLOGY GMBH·Filed 2004·Granted May 13, 2008·18 cites·50 claims
- 2178US8109130B2Apparatus and process for sensing fluoro species in semiconductor processing systemsDIMEO JR FRANK·Filed 2009·Granted Feb 7, 2012·8 cites·22 claims
- 2276US12252787B2Methods for depositing tungsten or molybdenum filmsENTEGRIS INC·Filed 2023·Granted Mar 18, 2025·0 cites·3 claims
- 2376US11560625B2Vapor deposition of molybdenum using a bis(alkyl-arene) molybdenum precursorENTEGRIS INC·Filed 2019·Granted Jan 24, 2023·0 cites·17 claims
- 2474US11987878B2Chemical vapor deposition processes using ruthenium precursor and reducing gasENTEGRIS INC·Filed 2022·Granted May 21, 2024·0 cites·20 claims
- 2573US11761081B2Methods for depositing tungsten or molybdenum filmsENTEGRIS INC·Filed 2019·Granted Sep 19, 2023·1 cites·3 claims
- 2673US9219232B2Antimony and germanium complexes useful for CVD/ALD of metal thin filmsENTEGRIS INC·Filed 2014·Granted Dec 22, 2015·1 cites·20 claims
- 2772US2023128330A1Vapor deposition of molybdenum using a bis(alkyl-arene) molybdenum precursorENTEGRIS INC·Filed 2022·Application pending·0 cites
- 2871US9034688B2Antimony compounds useful for deposition of antimony-containing materialsADVANCED TECH MATERIALS·Filed 2014·Granted May 19, 2015·2 cites·20 claims
- 2970US2025084113A1Nitrosyl precursors and related methodsENTEGRIS INC·Filed 2024·Application pending·0 cites
- 3067US12209105B2Vapor deposition precursor compounds and process of useENTEGRIS INC·Filed 2022·Granted Jan 28, 2025·0 cites·12 claims
- 3164US11476158B2Cobalt deposition selectivity on copper and dielectricsENTEGRIS INC·Filed 2015·Granted Oct 18, 2022·1 cites·16 claims
- 3263US2025075314A1Forming films with improved step coverageENTEGRIS INC·Filed 2024·Application pending·0 cites
- 3363US2009215225A1Tellurium compounds useful for deposition of tellurium containing materialsADVANCED TECH MATERIALS·Filed 2009·Application pending·0 cites
- 3461US12264392B2Silicon precursor compounds and method for forming silicon-containing filmsENTEGRIS INC·Filed 2021·Granted Apr 1, 2025·0 cites·11 claims
- 3561US8674127B2Antimony compounds useful for deposition of antimony-containing materialsCHEN TIANNIU·Filed 2009·Granted Mar 18, 2014·1 cites·26 claims
- 3660US2011180905A1GeSbTe MATERIAL INCLUDING SUPERFLOW LAYER(S), AND USE OF Ge TO PREVENT INTERACTION OF Te FROM SbXTeY AND GeXTeY RESULTING IN HIGH Te CONTENT AND FILM CRYSTALLINITYADVANCED TECH MATERIALS·Filed 2009·Application pending·0 cites
- 3759US11761086B2Cobalt precursorsENTEGRIS INC·Filed 2015·Granted Sep 19, 2023·0 cites·17 claims
- 3858US2012108038A1Amorphous ge/te deposition processCHEN PHILIP S H·Filed 2012·Application pending·0 cites
- 3957US11107675B2CVD Mo deposition by using MoOCl4ENTEGRIS INC·Filed 2018·Granted Aug 31, 2021·0 cites·17 claims
- 4057US2025079157A1Methods of improving metal oxide deposition with nitrogen oxide and related systemsENTEGRIS INC·Filed 2024·Application pending·0 cites
- 4156US2024170290A1Methods for selective deposition of precursor materials and related devicesENTEGRIS INC·Filed 2023·Application pending·0 cites
- 4256US2023245894A1Process for selectively depositing highly-conductive metal filmsENTEGRIS INC·Filed 2023·Application pending·0 cites
- 4355US2020157680A1Peald processes using ruthenium precursorENTEGRIS INC·Filed 2019·Application pending·0 cites
- 4454US2023279545A1Process for preparing silicon-rich silicon nitride filmsENTEGRIS INC·Filed 2023·Application pending·0 cites
- 4553US12359309B2Group VI metal deposition processENTEGRIS INC·Filed 2020·Granted Jul 15, 2025·0 cites·16 claims
- 4653US2020131628A1Method for forming molybdenum films on a substrateENTEGRIS INC·Filed 2019·Application pending·0 cites
- 4749US2008134757A1Method And Apparatus For Monitoring Plasma Conditions In An Etching Plasma Processing FacilityADVANCED TECH MATERIALS·Filed 2006·Application pending·0 cites
- 4849US2022238330A1High throughput deposition processENTEGRIS INC·Filed 2022·Application pending·0 cites
- 4948US10793947B2Alloys of Co to reduce stressENTEGRIS INC·Filed 2017·Granted Oct 6, 2020·0 cites·17 claims
- 5048US2018019165A1CVD Mo DEPOSITION BY USING MoOCl4ENTEGRIS INC·Filed 2017·Application pending·0 cites
Showing the top 50 of 54 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →