Inventor · disambiguated record
Ramesh Chandrasekharan
Also filed as: CHANDRASEKHARAN RAMESH
56 granted patents·31 pending applications·2,100 citations·filing 2011–2025
98Inventor score
Files withLAM RES CORP78NOVELLUS SYSTEMS INC6CHANDRASEKHARAN RAMESH1LAVOIE ADRIEN1VARADARAJAN SESHASAYEE1
Top patents by PatentIndex Score
87 records- 0198US10347547B2Suppressing interfacial reactions by varying the wafer temperature throughout depositionLAM RES CORP·Filed 2016·Granted Jul 9, 2019·401 cites·20 claims
- 0298US9824884B1Method for depositing metals free ald silicon nitride films using halide-based precursorsLAM RES CORP·Filed 2016·Granted Nov 21, 2017·348 cites·16 claims
- 0398US8940646B1Sequential precursor dosing in an ALD multi-station/batch reactorLAM RES CORP·Filed 2013·Granted Jan 27, 2015·540 cites·26 claims
- 0497US9758868B1Plasma suppression behind a showerhead through the use of increased pressureLAM RES CORP·Filed 2016·Granted Sep 12, 2017·24 cites·13 claims
- 0597US9677176B2Multi-plenum, dual-temperature showerheadNOVELLUS SYSTEMS INC·Filed 2013·Granted Jun 13, 2017·41 cites·24 claims
- 0697US8728956B2Plasma activated conformal film depositionLAVOIE ADRIEN·Filed 2011·Granted May 20, 2014·541 cites·39 claims
- 0796US9698042B1Wafer centering in pocket to improve azimuthal thickness uniformity at wafer edgeLAM RES CORP·Filed 2016·Granted Jul 4, 2017·23 cites·19 claims
- 0896US9230800B2Plasma activated conformal film depositionNOVELLUS SYSTEMS INC·Filed 2014·Granted Jan 5, 2016·41 cites·22 claims
- 0995US10378107B2Low volume showerhead with faceplate holes for improved flow uniformityLAM RES CORP·Filed 2015·Granted Aug 13, 2019·11 cites·26 claims
- 1095US10287683B2Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate regionLAM RES CORP·Filed 2016·Granted May 14, 2019·6 cites·14 claims
- 1194US11072860B2Fill on demand ampoule refillLAM RES CORP·Filed 2015·Granted Jul 27, 2021·6 cites·14 claims
- 1294US10128160B2Systems and methods for detection of plasma instability by electrical measurementLAM RES CORP·Filed 2017·Granted Nov 13, 2018·6 cites·20 claims
- 1394US9870917B2Variable temperature hardware and methods for reduction of wafer backside depositionLAM RES CORP·Filed 2016·Granted Jan 16, 2018·10 cites·11 claims
- 1494US9388494B2Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate regionNOVELLUS SYSTEMS INC·Filed 2012·Granted Jul 12, 2016·16 cites·16 claims
- 1593US11028482B2Use of voltage and current measurements to control dual zone ceramic pedestalsLAM RES CORP·Filed 2020·Granted Jun 8, 2021·3 cites·13 claims
- 1693US10157755B2Purge and pumping structures arranged beneath substrate plane to reduce defectsLAM RES CORP·Filed 2015·Granted Dec 18, 2018·4 cites·17 claims
- 1793US9490149B2Chemical deposition apparatus having conductance controlLAM RES CORP·Filed 2013·Granted Nov 8, 2016·18 cites·31 claims
- 1892US11183400B2Progressive heating of components of substrate processing systems using TCR element-based heatersLAM RES CORP·Filed 2018·Granted Nov 23, 2021·5 cites·10 claims
- 1991US11725282B2Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate regionNOVELLUS SYSTEMS INC·Filed 2021·Granted Aug 15, 2023·1 cites·12 claims
- 2090US10741365B2Low volume showerhead with porous baffleLAM RES CORP·Filed 2015·Granted Aug 11, 2020·7 cites·20 claims
- 2189US11959175B2Fill on demand ampoule refillLAM RES CORP·Filed 2021·Granted Apr 16, 2024·1 cites·19 claims
- 2289US11111581B2Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate regionLAM RES CORP·Filed 2019·Granted Sep 7, 2021·3 cites·9 claims
- 2387US9824941B2Systems and methods for detection of plasma instability by electrical measurementLAM RES CORP·Filed 2016·Granted Nov 21, 2017·3 cites·21 claims
- 2487US9631276B2Systems and methods enabling low defect processing via controlled separation and delivery of chemicals during atomic layer depositionLAM RES CORP·Filed 2015·Granted Apr 25, 2017·2 cites·13 claims
- 2586US10633742B2Use of voltage and current measurements to control dual zone ceramic pedestalsLAM RES CORP·Filed 2018·Granted Apr 28, 2020·6 cites·13 claims
- 2685US9236244B2Sequential precursor dosing in an ALD multi-station/batch reactorLAM RES CORP·Filed 2014·Granted Jan 12, 2016·5 cites·20 claims
- 2785US2024218515A1Fill on demand ampoule refillLAM RES CORP·Filed 2024·Application pending·0 cites
- 2884US9334566B2Multi-tray ballast vapor draw systemsLAM RES CORP·Filed 2013·Granted May 10, 2016·5 cites·22 claims
- 2984US2025019825A1Pedestals for modulating film properties in atomic layer deposition (ald) substrate processing chambersLAM RES CORP·Filed 2024·Application pending·0 cites
- 3083US9997422B2Systems and methods for frequency modulation of radiofrequency power supply for controlling plasma instabilityLAM RES CORP·Filed 2016·Granted Jun 12, 2018·2 cites·20 claims
- 3180US11236422B2Multi zone substrate support for ALD film property correction and tunabilityLAM RES CORP·Filed 2018·Granted Feb 1, 2022·3 cites·8 claims
- 3280US2024395569A1Progressive heating of components of substrate processing systems using tcr element-based heatersLAM RES CORP·Filed 2024·Application pending·0 cites
- 3379US10622243B2Planar substrate edge contact with open volume equalization pathways and side containmentLAM RES CORP·Filed 2017·Granted Apr 14, 2020·2 cites·19 claims
- 3478US12322617B2Dual zone heaters for metallic pedestalsLAM RES CORP·Filed 2024·Granted Jun 3, 2025·0 cites·12 claims
- 3578US11332824B2Systems and methods for reducing effluent build-up in a pumping exhaust systemLAM RES CORP·Filed 2016·Granted May 17, 2022·3 cites·11 claims
- 3678US10128116B2Integrated direct dielectric and metal depositionLAM RES CORP·Filed 2017·Granted Nov 13, 2018·2 cites·20 claims
- 3776US11661654B2Substrate processing systems including gas delivery system with reduced dead legsLAM RES CORP·Filed 2018·Granted May 30, 2023·2 cites·10 claims
- 3876US2025062150A1Electrostatic chuck with seal surfaceLAM RES CORP·Filed 2024·Application pending·0 cites
- 3975US2025121465A1Substrate processing aparatuses with rotating mechanisms including shafts with gas flow pathsLAM RES CORP·Filed 2024·Application pending·0 cites
- 4074US12062554B2Progressive heating of components of substrate processing systems using TCR element-based heatersLAM RES CORP·Filed 2021·Granted Aug 13, 2024·0 cites·7 claims
- 4174US10781516B2Chemical deposition chamber having gas sealLAM RES CORP·Filed 2016·Granted Sep 22, 2020·2 cites·14 claims
- 4274US8985152B2Point of use valve manifold for semiconductor fabrication equipmentCHANDRASEKHARAN RAMESH·Filed 2012·Granted Mar 24, 2015·5 cites·30 claims
- 4374US2025279299A1Rapid tuning of critical dimension non-uniformity by modulating temperature transients of multi-zone substrate supportsLAM RES CORP·Filed 2025·Application pending·0 cites
- 4473US11908715B2Dynamic temperature control of substrate support in substrate processing systemLAM RES CORP·Filed 2019·Granted Feb 20, 2024·1 cites·23 claims
- 4570US11232966B2Electrostatic chucking pedestal with substrate backside purging and thermal sinkingLAM RES CORP·Filed 2018·Granted Jan 25, 2022·1 cites·19 claims
- 4670US2024392443A1Trim and deposition profile control with multi-zone heated substrate support for multi-patterning processesLAM RES CORP·Filed 2024·Application pending·0 cites
- 4770US2019122871A1Purge and pumping structures arranged beneath substrate plane to reduce defectsLAM RES CORP·Filed 2018·Application pending·0 cites
- 4869US11959172B2Substrate processing systems including gas delivery system with reduced dead legsLAM RES CORP·Filed 2023·Granted Apr 16, 2024·0 cites·10 claims
- 4968US12110586B2Pedestals for modulating film properties in atomic layer deposition (ALD) substrate processing chambersLAM RES CORP·Filed 2020·Granted Oct 8, 2024·0 cites·13 claims
- 5064US2025171902A1Temperature control of a multi-zone pedestalLAM RES CORP·Filed 2025·Application pending·0 cites
Showing the top 50 of 87 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →