Inventor · disambiguated record
Rajinder Dhindsa
Also filed as: DHINDSA RAJINDER
199 granted patents·53 pending applications·6,749 citations·filing 1996–2025
99Inventor score
Top patents by PatentIndex Score
252 records- 0199US10312048B2Creating ion energy distribution functions (IEDF)APPLIED MATERIALS INC·Filed 2017·Granted Jun 4, 2019·48 cites·19 claims
- 0299US8484846B2Method of joining components for a composite showerhead electrode assembly for a plasma processing apparatusDHINDSA RAJINDER·Filed 2012·Granted Jul 16, 2013·525 cites·15 claims
- 0399US8313610B2Temperature control modules for showerhead electrode assemblies for plasma processing apparatusesDHINDSA RAJINDER·Filed 2008·Granted Nov 20, 2012·199 cites·16 claims
- 0499US7758764B2Methods and apparatus for substrate processingLAM RES CORP·Filed 2007·Granted Jul 20, 2010·76 cites·28 claims
- 0599US6391787B1Stepped upper electrode for plasma processing uniformityLAM RES CORP·Filed 2000·Granted May 21, 2002·153 cites·29 claims
- 0698US11848176B2Plasma processing using pulsed-voltage and radio-frequency powerAPPLIED MATERIALS INC·Filed 2021·Granted Dec 19, 2023·5 cites·25 claims
- 0798US11776789B2Plasma processing assembly using pulsed-voltage and radio-frequency powerAPPLIED MATERIALS INC·Filed 2022·Granted Oct 3, 2023·6 cites·20 claims
- 0898US11728124B2Creating ion energy distribution functions (IEDF)APPLIED MATERIALS INC·Filed 2021·Granted Aug 15, 2023·5 cites·13 claims
- 0998US11699572B2Feedback loop for controlling a pulsed voltage waveformAPPLIED MATERIALS INC·Filed 2020·Granted Jul 11, 2023·8 cites·30 claims
- 1098US11462388B2Plasma processing assembly using pulsed-voltage and radio-frequency powerAPPLIED MATERIALS INC·Filed 2021·Granted Oct 4, 2022·6 cites·20 claims
- 1198US11284500B2Method of controlling ion energy distribution using a pulse generatorAPPLIED MATERIALS INC·Filed 2020·Granted Mar 22, 2022·21 cites·20 claims
- 1298US11232933B2Temperature and bias control of edge ringAPPLIED MATERIALS INC·Filed 2020·Granted Jan 25, 2022·5 cites·20 claims
- 1398US11069504B2Creating ion energy distribution functions (IEDF)APPLIED MATERIALS INC·Filed 2020·Granted Jul 20, 2021·7 cites·21 claims
- 1498US10923321B2Apparatus and method of generating a pulsed waveformAPPLIED MATERIALS INC·Filed 2020·Granted Feb 16, 2021·52 cites·25 claims
- 1598US10916408B2Apparatus and method of forming plasma using a pulsed waveformAPPLIED MATERIALS INC·Filed 2020·Granted Feb 9, 2021·54 cites·26 claims
- 1698US10791617B2Method of controlling ion energy distribution using a pulse generator with a current-return output stageAPPLIED MATERIALS INC·Filed 2020·Granted Sep 29, 2020·62 cites·20 claims
- 1798US10685807B2Creating ion energy distribution functions (IEDF)APPLIED MATERIALS INC·Filed 2019·Granted Jun 16, 2020·38 cites·16 claims
- 1898US10555412B2Method of controlling ion energy distribution using a pulse generator with a current-return output stageAPPLIED MATERIALS INC·Filed 2018·Granted Feb 4, 2020·67 cites·32 claims
- 1998US10448495B1Method of controlling ion energy distribution using a pulse generator with a current-return output stageAPPLIED MATERIALS INC·Filed 2019·Granted Oct 15, 2019·63 cites·15 claims
- 2098US10448494B1Method of controlling ion energy distribution using a pulse generator with a current-return output stageAPPLIED MATERIALS INC·Filed 2019·Granted Oct 15, 2019·68 cites·30 claims
- 2198US10103010B2Adjustable extended electrode for edge uniformity controlAPPLIED MATERIALS INC·Filed 2018·Granted Oct 16, 2018·34 cites·10 claims
- 2298US9947517B1Adjustable extended electrode for edge uniformity controlAPPLIED MATERIALS INC·Filed 2016·Granted Apr 17, 2018·48 cites·20 claims
- 2398US9039911B2Plasma-enhanced etching in an augmented plasma processing systemLAM RES CORP·Filed 2012·Granted May 26, 2015·57 cites·23 claims
- 2498US8652298B2Triode reactor design with multiple radiofrequency powersDHINDSA RAJINDER·Filed 2011·Granted Feb 18, 2014·160 cites·20 claims
- 2598US8573152B2Showerhead electrodeDE LA LLERA ANTHONY·Filed 2010·Granted Nov 5, 2013·595 cites·17 claims
- 2698US8206506B2Showerhead electrodeKADKHODAYAN BABAK·Filed 2008·Granted Jun 26, 2012·434 cites·13 claims
- 2798US6824627B2Stepped upper electrode for plasma processing uniformityLAM RES CORP·Filed 2002·Granted Nov 30, 2004·104 cites·15 claims
- 2898US6432831B2Gas distribution apparatus for semiconductor processingLAM RES CORP·Filed 2001·Granted Aug 13, 2002·315 cites·17 claims
- 2998US6415736B1Gas distribution apparatus for semiconductor processingLAM RES CORP·Filed 1999·Granted Jul 9, 2002·365 cites·17 claims
- 3098US6245192B1Gas distribution apparatus for semiconductor processingLAM RES CORP·Filed 1999·Granted Jun 12, 2001·407 cites·15 claims
- 3197US12237148B2Plasma processing assembly using pulsed-voltage and radio-frequency powerAPPLIED MATERIALS INC·Filed 2023·Granted Feb 25, 2025·2 cites·21 claims
- 3297US11594400B2Multi zone gas injection upper electrode systemLAM RES CORP·Filed 2020·Granted Feb 28, 2023·6 cites·11 claims
- 3397US11462389B2Pulsed-voltage hardware assembly for use in a plasma processing systemAPPLIED MATERIALS INC·Filed 2021·Granted Oct 4, 2022·12 cites·17 claims
- 3497US8869742B2Plasma processing chamber with dual axial gas injection and exhaustDHINDSA RAJINDER·Filed 2010·Granted Oct 28, 2014·195 cites·21 claims
- 3597US8443756B2Showerhead electrodes and showerhead electrode assemblies having low-particle performance for semiconductor material processing apparatusesFISCHER ANDREAS·Filed 2011·Granted May 21, 2013·16 cites·9 claims
- 3697US8216486B2Temperature control module using gas pressure to control thermal conductance between liquid coolant and component bodyDHINDSA RAJINDER·Filed 2011·Granted Jul 10, 2012·131 cites·17 claims
- 3797US8211324B2Methods and arrangements for controlling plasma processing parametersDHINDSA RAJINDER·Filed 2010·Granted Jul 3, 2012·29 cites·22 claims
- 3897US8161906B2Clamped showerhead electrode assemblyKADKHODAYAN BABAK·Filed 2008·Granted Apr 24, 2012·49 cites·17 claims
- 3997US8012306B2Plasma processing reactor with multiple capacitive and inductive power sourcesLAM RES CORP·Filed 2006·Granted Sep 6, 2011·34 cites·10 claims
- 4097US7740736B2Methods and apparatus for preventing plasma un-confinement events in a plasma processing chamberLAM RES CORP·Filed 2006·Granted Jun 22, 2010·40 cites·15 claims
- 4197US7708859B2Gas distribution system having fast gas switching capabilitiesLAM RES CORP·Filed 2004·Granted May 4, 2010·268 cites·17 claims
- 4296US10991556B2Adjustable extended electrode for edge uniformity controlAPPLIED MATERIALS INC·Filed 2019·Granted Apr 27, 2021·11 cites·20 claims
- 4396US10553404B2Adjustable extended electrode for edge uniformity controlAPPLIED MATERIALS INC·Filed 2017·Granted Feb 4, 2020·13 cites·20 claims
- 4496US10504702B2Adjustable extended electrode for edge uniformity controlAPPLIED MATERIALS INC·Filed 2018·Granted Dec 10, 2019·14 cites·20 claims
- 4596US8563619B2Methods and arrangements for plasma processing system with tunable capacitanceDHINDSA RAJINDER·Filed 2007·Granted Oct 22, 2013·29 cites·20 claims
- 4696US8485128B2Movable ground ring for a plasma processing chamberKELLOGG MICHAEL C·Filed 2010·Granted Jul 16, 2013·38 cites·20 claims
- 4796US8147648B2Composite showerhead electrode assembly for a plasma processing apparatusDHINDSA RAJINDER·Filed 2008·Granted Apr 3, 2012·34 cites·16 claims
- 4896US8069817B2Showerhead electrodes and showerhead electrode assemblies having low-particle performance for semiconductor material processing apparatusesFISCHER ANDREAS·Filed 2007·Granted Dec 6, 2011·26 cites·13 claims
- 4996US7854820B2Upper electrode backing member with particle reducing featuresLAM RES CORP·Filed 2006·Granted Dec 21, 2010·38 cites·7 claims
- 5096US7430986B2Plasma confinement ring assemblies having reduced polymer deposition characteristicsLAM RES CORP·Filed 2005·Granted Oct 7, 2008·28 cites·20 claims
Showing the top 50 of 252 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →