Inventor · disambiguated record
Ralf Stuetzle
Also filed as: STUETZLE RALF
12 granted patents·3 pending applications·32 citations·filing 2007–2015
87Inventor score
Top patents by PatentIndex Score
15 records- 0192US8587767B2Illumination optics for EUV microlithography and related system and apparatusFIOLKA DAMIAN·Filed 2010·Granted Nov 19, 2013·12 cites·22 claims
- 0279US8253925B2Catoptric illumination system for microlithography toolOSSMANN JENS·Filed 2009·Granted Aug 28, 2012·5 cites·24 claims
- 0376US9310692B2Component for setting a scan-integrated illumination energy in an object plane of a microlithography projection exposure apparatusSTUETZLE RALF·Filed 2010·Granted Apr 12, 2016·3 cites·35 claims
- 0473US8174677B2Illumination optical system for microlithographyOSSMANN JENS·Filed 2008·Granted May 8, 2012·4 cites·20 claims
- 0571US8937708B2Illumination optics for microlithographyENDRES MARTIN·Filed 2010·Granted Jan 20, 2015·2 cites·30 claims
- 0668US7910900B2Collector for an illumination systemZEISS CARL SMT GMBH·Filed 2007·Granted Mar 22, 2011·2 cites·43 claims
- 0766US9110378B2Illumination optical system for projection lithographyZEISS CARL SMT GMBH·Filed 2013·Granted Aug 18, 2015·1 cites·24 claims
- 0864US8179519B2Adjusting device with a laser light source and a reflector for aligning a microlithography projection exposure installationSTUETZLE RALF·Filed 2008·Granted May 15, 2012·2 cites·21 claims
- 0958US9235137B2Illumination optical unit for microlithographyFIOLKA DAMIAN·Filed 2012·Granted Jan 12, 2016·1 cites·23 claims
- 1052US9588434B2Catoptric illumination system for microlithography toolOSSMANN JENS·Filed 2012·Granted Mar 7, 2017·0 cites·25 claims
- 1145US2008259303A1Projection exposure apparatus for microlithographyZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 1245US2009251677A1Illuminating optical unit and projection exposure apparatus for microlithographyZEISS CARL SMT AG·Filed 2009·Application pending·0 cites
- 1343US9304400B2Illumination system for EUV microlithographyLAYH MICHAEL·Filed 2011·Granted Apr 5, 2016·0 cites·34 claims
- 1437US9690203B2Method for adjusting an illumination settingZEISS CARL SMT GMBH·Filed 2015·Granted Jun 27, 2017·0 cites·20 claims
- 1536US2011235015A1Illumination optics for euv microlithographyCarl Zeiss GmbH·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →