Inventor · disambiguated record
Richard Carl Zimmerman
Also filed as: ZIMMERMAN RICHARD · ZIMMERMAN RICHARD C · ZIMMERMAN RICHARD CARL
11 granted patents·2 pending applications·47 citations·filing 2004–2023
87Inventor score
Top patents by PatentIndex Score
13 records- 0189US8629973B2Lithographic apparatus and method for illumination uniformity correction and uniformity drift compensationZIMMERMAN RICHARD CARL·Filed 2010·Granted Jan 14, 2014·13 cites·20 claims
- 0287US10809193B2Inspection apparatus having non-linear opticsASML NETHERLANDS BV·Filed 2019·Granted Oct 20, 2020·3 cites·18 claims
- 0381US9134620B2Double EUV illumination uniformity correction system and methodZIMMERMAN RICHARD CARL·Filed 2012·Granted Sep 15, 2015·4 cites·18 claims
- 0475US7525641B2System and method for uniformity correctionASML HOLDING NV·Filed 2005·Granted Apr 28, 2009·6 cites·11 claims
- 0574US9075324B2Beam positioning and pointingZIMMERMAN RICHARD CARL·Filed 2007·Granted Jul 7, 2015·4 cites·37 claims
- 0671US7173688B2Method for calculating an intensity integral for use in lithography systemsASML HOLDING NV·Filed 2004·Granted Feb 6, 2007·12 cites·15 claims
- 0768US11126007B2Beam splitting prism systemsASML HOLDING NV·Filed 2020·Granted Sep 21, 2021·0 cites·20 claims
- 0864US12306544B2Metrology tool with position control of projection systemASML NETHERLANDS BV·Filed 2021·Granted May 20, 2025·0 cites·20 claims
- 0963US8009269B2Optimal rasterization for maskless lithographyASML HOLDING NV·Filed 2007·Granted Aug 30, 2011·2 cites·21 claims
- 1063US7333176B2De-focus uniformity correctionASML HOLDING NV·Filed 2006·Granted Feb 19, 2008·3 cites·17 claims
- 1161US10747010B2Beam splitting prism systemsASML HOLDING NV·Filed 2018·Granted Aug 18, 2020·0 cites·16 claims
- 1259US2025068090A1Mechanically controlled stress-engineered optical systems and methodsASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 1358US2024302164A1Optical element for use in metrology systemsASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →