Inventor · disambiguated record
Roel Gronheid
Also filed as: GRONHEID ROEL
21 granted patents·8 pending applications·92 citations·filing 2006–2024
92Inventor score
Top patents by PatentIndex Score
29 records- 0198US11782411B2System and method for mitigating overlay distortion patterns caused by a wafer bonding toolKLA CORP·Filed 2022·Granted Oct 10, 2023·5 cites·15 claims
- 0297US10204782B2Combined anneal and selective deposition processASM IP HOLDING BV·Filed 2016·Granted Feb 12, 2019·52 cites·24 claims
- 0394US12164277B2System and method for mitigating overlay distortion patterns caused by a wafer bonding toolKLA CORP·Filed 2023·Granted Dec 10, 2024·1 cites·18 claims
- 0492US9391141B2Method for producing fin structures of a semiconductor device in a substrateIMEC VZW·Filed 2015·Granted Jul 12, 2016·11 cites·10 claims
- 0591US11460783B2System and method for focus control in extreme ultraviolet lithography systems using a focus-sensitive metrology targetKLA CORP·Filed 2021·Granted Oct 4, 2022·2 cites·8 claims
- 0684US10901325B2Determining the impacts of stochastic behavior on overlay metrology dataKLA TENCOR CORP·Filed 2018·Granted Jan 26, 2021·4 cites·28 claims
- 0782US10048212B2Quality assessment of directed self-assembling methodIMEC VZW·Filed 2015·Granted Aug 14, 2018·6 cites·18 claims
- 0881US2025103019A1System and method for mitigating overlay distortion patterns caused by a wafer bonding toolKLA CORP·Filed 2024·Application pending·0 cites
- 0980US12013634B2Reduction or elimination of pattern placement error in metrology measurementsKLA TENCOR CORP·Filed 2022·Granted Jun 18, 2024·0 cites·11 claims
- 1078US7695877B2Methods and devices for lithography using electromagnetic radiation with short wavelengthsIMEC·Filed 2006·Granted Apr 13, 2010·5 cites·8 claims
- 1175US10741394B2Combined anneal and selective deposition processASM IP HOLDING BV·Filed 2019·Granted Aug 11, 2020·1 cites·20 claims
- 1274US11537043B2Reduction or elimination of pattern placement error in metrology measurementsKLA TENCOR CORP·Filed 2021·Granted Dec 27, 2022·0 cites·10 claims
- 1373US12153352B2System and method for focus control in extreme ultraviolet lithography systems using a focus-sensitive metrology targetKLA CORP·Filed 2022·Granted Nov 26, 2024·0 cites·13 claims
- 1473US10720336B2Method for manufacturing a maskIMEC VZW·Filed 2018·Granted Jul 21, 2020·2 cites·20 claims
- 1565US2023030116A1System and method for optimizing through silicon via overlayKLA CORP·Filed 2022·Application pending·0 cites
- 1659US9041164B2Conformal anti-reflective coatingIMEC·Filed 2014·Granted May 26, 2015·1 cites·20 claims
- 1758US2023032406A1System and method for detecting particle contamination on a bonding toolKLA CORP·Filed 2022·Application pending·0 cites
- 1857US8257911B2Method of process optimization for dual tone developmentGRONHEID ROEL·Filed 2008·Granted Sep 4, 2012·2 cites·20 claims
- 1956US11092893B2Inspection sensitivity improvements for optical and electron beam inspectionKLA CORP·Filed 2019·Granted Aug 17, 2021·0 cites·13 claims
- 2056US2019250504A1Reduction or elimination of pattern placement error in metrology measurementsKLA TENCOR CORP·Filed 2018·Application pending·0 cites
- 2153US12372345B23D profilometry with a Linnik interferometerKLA CORP·Filed 2022·Granted Jul 29, 2025·0 cites·55 claims
- 2251US10192956B2Method for producing fin structures of a semiconductor device in a substrateIMEC VZW·Filed 2016·Granted Jan 29, 2019·0 cites·10 claims
- 2346US10551741B2Method of forming a directed self-assembled layer on a substrateASM IP HOLDING BV·Filed 2017·Granted Feb 4, 2020·0 cites·24 claims
- 2443US10824078B2Lithographic mask layerIMEC VZW·Filed 2017·Granted Nov 3, 2020·0 cites·15 claims
- 2543US2008213689A1Watermark defect reduction by resist optimizationIMEC INTER UNI MICRO ELECTR·Filed 2007·Application pending·0 cites
- 2643US2010055624A1Method of patterning a substrate using dual tone developmentTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 2741US10186459B2Selective fin cutIMEC VZW·Filed 2017·Granted Jan 22, 2019·0 cites·18 claims
- 2837US2007117232A1Method of studying interaction between immersion fluid and substrateGRONHEID ROEL·Filed 2006·Application pending·0 cites
- 2934US2017330760A1Method for Manufacturing Pillar or Hole Structures in a Layer of a Semiconductor Device, and Associated Semiconductor StructureIMEC VZW·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →