Inventor · disambiguated record
Robert John Socha
Also filed as: SOCHA ROBERT · SOCHA ROBERT J · SOCHA ROBERT JOHN
38 granted patents·3 pending applications·420 citations·filing 1981–2022
97Inventor score
Top patents by PatentIndex Score
41 records- 0197US10670973B2Coloring aware optimizationASML NETHERLANDS BV·Filed 2016·Granted Jun 2, 2020·16 cites·20 claims
- 0297US8751979B1Determining the gradient and Hessian of the image log slope for design rule optimization for accelerating source mask optimization (SMO)ASML NETHERLANDS BV·Filed 2013·Granted Jun 10, 2014·18 cites·27 claims
- 0397US8356261B1Determining the gradient and hessian of the image log slope for design rule optimization for accelerating source mask optimization (SMO)ASML NETHERLANDS BV·Filed 2010·Granted Jan 15, 2013·28 cites·20 claims
- 0495US6871337B2Illumination optimization for specific mask patternsASML NETHERLANDS BV·Filed 2002·Granted Mar 22, 2005·88 cites·16 claims
- 0594US7864301B2Source and mask optimization by changing intensity and shape of the illumination sourceASML MASKTOOLS BV·Filed 2008·Granted Jan 4, 2011·19 cites·18 claims
- 0693US7493589B2Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure processASML MASKTOOLS BV·Filed 2006·Granted Feb 17, 2009·14 cites·14 claims
- 0791US11079684B2Measurement apparatus and a method for determining a substrate gridASML NETHERLANDS BV·Filed 2018·Granted Aug 3, 2021·3 cites·20 claims
- 0891US8572521B2Method for performing pattern decomposition for a full chip designCHEN LUOQI·Filed 2008·Granted Oct 29, 2013·18 cites·20 claims
- 0991US7506299B2Feature optimization using interference mapping lithographyASML HOLDING NV·Filed 2004·Granted Mar 17, 2009·46 cites·30 claims
- 1088US11966166B2Measurement apparatus and a method for determining a substrate gridASML NETHERLANDS BV·Filed 2021·Granted Apr 23, 2024·1 cites·20 claims
- 1188US10054862B2Inspection apparatus, inspection method, lithographic apparatus, patterning device and manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Aug 21, 2018·3 cites·19 claims
- 1288US7548302B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2007·Granted Jun 16, 2009·12 cites·45 claims
- 1387US7865865B2Method, program product and apparatus for performing decomposition of a pattern for use in a DPT processASML MASKTOOLS BV·Filed 2007·Granted Jan 4, 2011·7 cites·18 claims
- 1486US8640058B2Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure processSOCHA ROBERT JOHN·Filed 2011·Granted Jan 28, 2014·4 cites·19 claims
- 1585US10670975B2Adjustment of a metrology apparatus or a measurement thereby based on a characteristic of a target measuredASML NETHERLANDS BV·Filed 2016·Granted Jun 2, 2020·2 cites·20 claims
- 1685US10417359B2Optical metrology of lithographic processes using asymmetric sub-resolution features to enhance measurementASML NETHERLANDS BV·Filed 2016·Granted Sep 17, 2019·6 cites·26 claims
- 1785US8060842B2Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure processSOCHA ROBERT JOHN·Filed 2008·Granted Nov 15, 2011·6 cites·13 claims
- 1884US7639864B2Method, program product and apparatus for optimizing illumination for full-chip layerASML MASKTOOLS BV·Filed 2006·Granted Dec 29, 2009·7 cites·31 claims
- 1983US7398508B2Eigen decomposition based OPC modelASML MASKTOOKS B V·Filed 2004·Granted Jul 8, 2008·27 cites·22 claims
- 2083US7292315B2Optimized polarization illuminationASML MASKTOOLS BV·Filed 2004·Granted Nov 6, 2007·17 cites·16 claims
- 2182US10437158B2Metrology by reconstructionASML NETHERLANDS BV·Filed 2016·Granted Oct 8, 2019·2 cites·13 claims
- 2282US7594199B2Method of optical proximity correction design for contact hole maskASML MASKTOOLS BV·Filed 2004·Granted Sep 22, 2009·22 cites·13 claims
- 2382US6887625B2Assist features for use in lithographic projectionASML NETHERLANDS BV·Filed 2001·Granted May 3, 2005·25 cites·62 claims
- 2479US8730452B2Source and mask optimization by changing intensity and shape of the illumination source and magnitude and phase of mask diffraction ordersSOCHA ROBERT·Filed 2010·Granted May 20, 2014·5 cites·18 claims
- 2573US8340394B2Method, program product and apparatus for performing a model based coloring process for geometry decomposition for use in a multiple exposure processSOCHA ROBERT JOHN·Filed 2009·Granted Dec 25, 2012·3 cites·20 claims
- 2672US7710544B2Optimized polarization illuminationASML MASKTOOLS BV·Filed 2007·Granted May 4, 2010·2 cites·13 claims
- 2771US10132763B2Inspection method and apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted Nov 20, 2018·2 cites·16 claims
- 2870US10996571B2Adjustment of a metrology apparatus or a measurement thereby based on a characteristic of a target measuredASML NETHERLANDS BV·Filed 2020·Granted May 4, 2021·0 cites·21 claims
- 2967US8612900B2Rule optimization in lithographic imaging based on correlation of functions representing mask and predefined optical conditionsSOCHA ROBERT JOHN·Filed 2011·Granted Dec 17, 2013·2 cites·18 claims
- 3066US8395757B2Optimized polarization illuminationSOCHA ROBERT·Filed 2010·Granted Mar 12, 2013·1 cites·14 claims
- 3166US7317506B2Variable illumination sourceASML NETHERLANDS BV·Filed 2005·Granted Jan 8, 2008·2 cites·20 claims
- 3261US10657641B2Source and mask optimization by changing intensity and shape of the illumination source and magnitude and phase of mask diffraction ordersASML NETHERLANDS BV·Filed 2014·Granted May 19, 2020·0 cites·23 claims
- 3357US2024184221A1Alignment method and associated alignment and lithographic apparatusesASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 3454US9053280B2Rule optimization in lithographic imaging based on correlation of functions representing mask and predefined optical conditionsASML NETHERLANDS BV·Filed 2013·Granted Jun 9, 2015·0 cites·18 claims
- 3554US2018046091A1Inspection Apparatus, Inspection Method, Lithographic Apparatus, Patterning Device and Manufacturing MethodASML NETHERLANDS BV·Filed 2017·Application pending·0 cites
- 3652US8224061B2Method, program product, and apparatus for performing a model based coloring process for pattern decomposition for use in a multiple exposure processSOCHA ROBERT JOHN·Filed 2009·Granted Jul 17, 2012·0 cites·16 claims
- 3746US8495526B2Method, program product and apparatus for performing decomposition of a pattern for use in a DPT processSOCHA ROBERT J·Filed 2011·Granted Jul 23, 2013·0 cites·18 claims
- 3846US4342271AStitch length range indicating arrangement in a multiple pattern sewing machineSINGER CO·Filed 1981·Granted Aug 3, 1982·10 cites·7 claims
- 3942US2004265707A1Source and mask optimizationFiled 2004·Application pending·0 cites
- 4036US4462323APresser foot lift for needle feed in a sewing machineSINGER CO·Filed 1983·Granted Jul 31, 1984·1 cites·7 claims
- 4136US4406236ANeedle shift warning arrangement in an electronically controlled sewing machineSINGER CO·Filed 1982·Granted Sep 27, 1983·1 cites·3 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →