Inventor · disambiguated record
Ryoung-Han Kim
Also filed as: KIM RYOUNG-HAN
21 granted patents·5 pending applications·148 citations·filing 2006–2021
94Inventor score
Files withGLOBALFOUNDRIES INC8KIM RYOUNG-HAN7TEXAS INSTRUMENTS INC4ADVANCED MICRO DEVICES INC3LAFONTAINE BRUNO M1
Top patents by PatentIndex Score
26 records- 0195US9029263B1Method of printing multiple structure widths using spacer double patterningTEXAS INSTRUMENTS INC·Filed 2014·Granted May 12, 2015·25 cites·20 claims
- 0295US7767985B2EUV pellicle and method for fabricating semiconductor dies using sameGLOBALFOUNDRIES INC·Filed 2006·Granted Aug 3, 2010·38 cites·14 claims
- 0392US8450833B2Spacer double patterning that prints multiple CD in front-end-of-lineKIM RYOUNG-HAN·Filed 2010·Granted May 28, 2013·17 cites·17 claims
- 0492US7723704B2EUV pellicle with increased EUV light transmittanceGLOBALFOUNDRIES INC·Filed 2006·Granted May 25, 2010·15 cites·15 claims
- 0590US8664113B2Multilayer interconnect structure and method for integrated circuitsKIM RYOUNG-HAN·Filed 2011·Granted Mar 4, 2014·11 cites·12 claims
- 0688US7663127B2EUV debris mitigation filter and method for fabricating semiconductor dies using sameGLOBALFOUNDRIES INC·Filed 2007·Granted Feb 16, 2010·9 cites·20 claims
- 0785US7718529B2Inverse self-aligned spacer lithographyGLOBALFOUNDRIES INC·Filed 2007·Granted May 18, 2010·10 cites·20 claims
- 0882US10950488B2Integration of finFET deviceTEXAS INSTRUMENTS INC·Filed 2019·Granted Mar 16, 2021·2 cites·15 claims
- 0975US7851136B2Stabilization of deep ultraviolet photoresistGLOBALFOUNDRIES INC·Filed 2006·Granted Dec 14, 2010·4 cites·17 claims
- 1074US8435884B2Method for forming an interconnect structureKIM RYOUNG-HAN·Filed 2010·Granted May 7, 2013·3 cites·23 claims
- 1174US8303831B2Methods for fabricating semiconductor devicesKIM RYOUNG-HAN·Filed 2009·Granted Nov 6, 2012·4 cites·19 claims
- 1271USRE50384EMultilayer interconnect structure and method for integrated circuitsTESSERA ADVANCED TECH INC·Filed 2021·Granted Apr 15, 2025·0 cites·168 claims
- 1370US8586269B2Method for forming a high resolution resist pattern on a semiconductor waferOKOROANYANWU UZODINMA·Filed 2007·Granted Nov 19, 2013·3 cites·20 claims
- 1466US7829266B2Multiple exposure technique using OPC to correct distortionGLOBALFOUNDRIES INC·Filed 2007·Granted Nov 9, 2010·2 cites·20 claims
- 1565US8236592B2Method of forming semiconductor deviceKIM RYOUNG-HAN·Filed 2007·Granted Aug 7, 2012·2 cites·20 claims
- 1663US8009274B2In-die focus monitoring with binary maskGLOBALFOUNDRIES INC·Filed 2008·Granted Aug 30, 2011·1 cites·21 claims
- 1762US7704680B2Double exposure technology using high etching selectivityADVANCED MICRO DEVICES INC·Filed 2006·Granted Apr 27, 2010·1 cites·20 claims
- 1861US8642474B2Spacer lithographyKIM RYOUNG-HAN·Filed 2007·Granted Feb 4, 2014·1 cites·19 claims
- 1955US2015171217A1Design and integration of finfet deviceTEXAS INSTRUMENTS INC·Filed 2014·Application pending·0 cites
- 2054US2018108564A1Design and integration of finfet deviceTEXAS INSTRUMENTS INC·Filed 2017·Application pending·0 cites
- 2148US8445182B2Double exposure technology using high etching selectivityKIM RYOUNG-HAN·Filed 2010·Granted May 21, 2013·0 cites·21 claims
- 2246US8792161B2Optical polarizer with nanotube arrayLAFONTAINE BRUNO M·Filed 2007·Granted Jul 29, 2014·0 cites·15 claims
- 2345US2008259458A1EUV diffractive optical element for semiconductor wafer lithography and method for making sameADVANCED MICRO DEVICES INC·Filed 2007·Application pending·0 cites
- 2445US2008292991A1High fidelity multiple resist patterningADVANCED MICRO DEVICES INC·Filed 2007·Application pending·0 cites
- 2541US8815748B2Method of forming semiconductor device with multiple level patterningWALLOW THOMAS INGOLF·Filed 2007·Granted Aug 26, 2014·0 cites·19 claims
- 2640US2013043589A1Methods of Forming a Non-Planar Cap Layer Above Conductive Lines on a Semiconductor DeviceGLOBALFOUNDRIES INC·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →