Inventor · disambiguated record
Ryo Miyama
Also filed as: MIYAMA RYO
4 granted patents·14 pending applications·0 citations·filing 2015–2025
53Inventor score
Top patents by PatentIndex Score
18 records- 0175US2024150894A1Exhaust component cleaning method and substrate processing apparatus including exhaust componentASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 0275US2025207249A1Exhaust component cleaning method and substrate processing apparatus including exhaust componentASM IP HOLDING BV·Filed 2025·Application pending·0 cites
- 0369US2025236952A1Method of forming a structure including carbon material, structure formed using the method, and system for forming the structureASM IP HOLDING BV·Filed 2025·Application pending·0 cites
- 0468US12506000B2Method of filling gap with flowable carbon layerASM IP HOLDING BV·Filed 2022·Granted Dec 23, 2025·0 cites·21 claims
- 0567US2025191896A1Substrate treatment apparatus and method of cleaning inside of chamberASM IP HOLDING BV·Filed 2025·Application pending·0 cites
- 0662US2021071296A1Exhaust component cleaning method and substrate processing apparatus including exhaust componentASM IP HOLDING BV·Filed 2020·Application pending·0 cites
- 0760US2025195429A1Lipid nanoparticles for delivering nucleic acid to peripheral blood mononuclear cells, and method for delivering nucleic acid to peripheral blood mononuclear cells using sameNOF CORP·Filed 2023·Application pending·0 cites
- 0857US2021238742A1Method of forming a structure including carbon material, structure formed using the method, and system for forming the structureASM IP HOLDING BV·Filed 2021·Application pending·0 cites
- 0955US11705333B2Structures including multiple carbon layers and methods of forming and using sameASM IP HOLDING BV·Filed 2021·Granted Jul 18, 2023·0 cites·23 claims
- 1055US2020395199A1Substrate treatment apparatus and method of cleaning inside of chamberASM IP HOLDING BV·Filed 2020·Application pending·0 cites
- 1151US2023137026A1Method and system for selectively removing material at an edge of a substrateASM IP HOLDING BV·Filed 2022·Application pending·0 cites
- 1249US2025329540A1Method for processing wafer and processing apparatusDISCO CORP·Filed 2025·Application pending·0 cites
- 1346US2023126912A1Plasma cvd apparatus with a bevel mask with a planar inner edgeASM IP HOLDING BV·Filed 2022·Application pending·0 cites
- 1444US2017011886A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 1540US2021384033A1Shower plate, substrate treatment device, and substrate treatment methodASM IP HOLDING BV·Filed 2021·Application pending·0 cites
- 1638US10074550B2Plasma stability determination method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Sep 11, 2018·0 cites·12 claims
- 1734US2017125261A1Method of etching transition metal film and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 1833US9659752B2Method for presetting tuner of plasma processing apparatus and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2016·Granted May 23, 2017·0 cites·3 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →