Inventor · disambiguated record
Sai Mantripragada
Also filed as: MANTRIPRAGADA SAI
11 granted patents·3 pending applications·450 citations·filing 1999–2018
90Inventor score
Top patents by PatentIndex Score
14 records- 0195US6335293B1Systems and methods for two-sided etch of a semiconductor substrateMATTSON TECH INC·Filed 1999·Granted Jan 1, 2002·384 cites·20 claims
- 0294US8697197B2Methods for plasma processingSAVAS STEPHEN EDWARD·Filed 2010·Granted Apr 15, 2014·23 cites·31 claims
- 0383US7976263B2Integrated wafer transfer mechanismBARKER DAVID·Filed 2007·Granted Jul 12, 2011·10 cites·25 claims
- 0481US9443702B2Methods for plasma processingAIXTRON SE·Filed 2015·Granted Sep 13, 2016·2 cites·17 claims
- 0581US9096933B2Methods for plasma processingAIXTRON INC·Filed 2014·Granted Aug 4, 2015·3 cites·21 claims
- 0679US6624082B2Systems and methods for two-sided etch of a semiconductor substrateMATTSON TECH INC·Filed 2001·Granted Sep 23, 2003·23 cites·18 claims
- 0771US8765232B2Apparatus and method for dielectric depositionSAVAS STEPHEN EDWARD·Filed 2012·Granted Jul 1, 2014·2 cites·20 claims
- 0870US9096932B2Methods for plasma processingAIXTRON INC·Filed 2014·Granted Aug 4, 2015·1 cites·34 claims
- 0969US10526708B2Methods for forming thin protective and optical layers on substratesAIXTRON SE·Filed 2018·Granted Jan 7, 2020·1 cites·20 claims
- 1069US9359674B2Apparatus and method for dielectric depositionAIXTRON INC·Filed 2014·Granted Jun 7, 2016·0 cites·5 claims
- 1166US10049859B2Plasma generating units for processing a substrateSAVAS STEPHEN EDWARD·Filed 2010·Granted Aug 14, 2018·1 cites·24 claims
- 1250US2013337657A1Apparatus and method for forming thin protective and optical layers on substratesPLASMASI INC·Filed 2013·Application pending·0 cites
- 1347US2016289837A1Apparatus and method for forming thin protective and optical layers on substratesAIXTRON INC·Filed 2016·Application pending·0 cites
- 1426US2001009177A1Systems and methods for two-sided etch of a semiconductor substrateFiled 1999·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →