Inventor · disambiguated record
Sang Ki Nam
Also filed as: NAM SANG KI
39 granted patents·22 pending applications·165 citations·filing 2004–2025
97Inventor score
Top patents by PatentIndex Score
61 records- 0197US11594400B2Multi zone gas injection upper electrode systemLAM RES CORP·Filed 2020·Granted Feb 28, 2023·6 cites·11 claims
- 0297US9829790B2Immersion field guided exposure and post-exposure bake processAPPLIED MATERIALS INC·Filed 2015·Granted Nov 28, 2017·12 cites·15 claims
- 0395US9823570B2Field guided post exposure bake application for photoresist microbridge defectsAPPLIED MATERIALS INC·Filed 2015·Granted Nov 21, 2017·6 cites·20 claims
- 0495US9793126B2Ion to neutral control for wafer processing with dual plasma source reactorLAM RES CORP·Filed 2013·Granted Oct 17, 2017·18 cites·20 claims
- 0594US9733579B2Tooling configuration for electric/magnetic field guided acid profile control in a photoresist layerAPPLIED MATERIALS INC·Filed 2014·Granted Aug 15, 2017·10 cites·15 claims
- 0693US8898889B2Chuck assembly for plasma processingNAM SANG KI·Filed 2012·Granted Dec 2, 2014·16 cites·16 claims
- 0793US7025690B2Golf club with transparent gripNAM SANG-KI·Filed 2004·Granted Apr 11, 2006·48 cites·6 claims
- 0889US11538697B2Substrate processing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Dec 27, 2022·2 cites·20 claims
- 0988US11798788B2Hollow cathode, an apparatus including a hollow cathode for manufacturing a semiconductor device, and a method of manufacturing a semiconductor device using a hollow cathodeSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Oct 24, 2023·2 cites·20 claims
- 1085US10347468B2Plasma processing system, electron beam generator, and method of fabricating semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Jul 9, 2019·5 cites·20 claims
- 1185US9396910B2Heat transfer plate for a showerhead electrode assembly of a capacitively coupled plasma processing apparatusLAM RES CORP·Filed 2015·Granted Jul 19, 2016·3 cites·18 claims
- 1284US10410874B2Plasma processing apparatus and method, and method of manufacturing semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Sep 10, 2019·5 cites·7 claims
- 1384US9330927B2System, method and apparatus for generating pressure pulses in small volume confined process reactorLAM RES CORP·Filed 2013·Granted May 3, 2016·5 cites·19 claims
- 1483US11107705B2Cleaning solution production systems and methods, and plasma reaction tanksSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Aug 31, 2021·3 cites·20 claims
- 1581US8911588B2Methods and apparatus for selectively modifying RF current paths in a plasma processing systemNAM SANG KI·Filed 2012·Granted Dec 16, 2014·4 cites·20 claims
- 1679US9018022B2Showerhead electrode assembly in a capacitively coupled plasma processing apparatusLAM RES CORP·Filed 2012·Granted Apr 28, 2015·3 cites·23 claims
- 1778US10048589B2Field guided post exposure bake application for photoresist microbridge defectsAPPLIED MATERIALS INC·Filed 2017·Granted Aug 14, 2018·1 cites·20 claims
- 1875US10950414B2Plasma processing apparatus and method of manufacturing semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Mar 16, 2021·2 cites·14 claims
- 1975US10795262B2Method of manufacturing integrated circuit deviceSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Oct 6, 2020·2 cites·13 claims
- 2073US11545372B2Plasma generator, cleaning liquid processing apparatus, semiconductor device cleaning apparatus, cleaning liquid processing method, and method of manufacturing semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Jan 3, 2023·2 cites·17 claims
- 2171US10586686B2Peripheral RF feed and symmetric RF return for symmetric RF deliveryNAM SANG KI·Filed 2012·Granted Mar 10, 2020·2 cites·15 claims
- 2271US2025201520A1Apparatus and method for treating substrateSAMSUNG ELECTRONICS CO LTD·Filed 2025·Application pending·0 cites
- 2370US10522332B2Plasma processing system, electron beam generator, and method of fabricating semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Dec 31, 2019·1 cites·7 claims
- 2469US12261021B2Apparatus and method for treating substrateSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Mar 25, 2025·0 cites·17 claims
- 2569US9245718B2Showerhead electrode assembly in a capacitively coupled plasma processing apparatusLAM RES CORP·Filed 2015·Granted Jan 26, 2016·1 cites·20 claims
- 2668US9480140B2Material modification by neutral beam source with selected collision angleAPPLIED MATERIALS INC·Filed 2014·Granted Oct 25, 2016·2 cites·20 claims
- 2767US9528185B2Plasma uniformity control by arrays of unit cell plasmasAPPLIED MATERIALS INC·Filed 2014·Granted Dec 27, 2016·1 cites·9 claims
- 2866US2025104969A1Substrate processing apparatus and a substrate processing method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 2965US11664242B2Cleaning solution production systems and methods, and plasma reaction tanksSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted May 30, 2023·0 cites·19 claims
- 3063US10622195B2Multi zone gas injection upper electrode systemBISE RYAN·Filed 2012·Granted Apr 14, 2020·2 cites·11 claims
- 3163US9230779B2Methods and apparatus for correcting for non-uniformity in a plasma processing systemNAM SANG KI·Filed 2012·Granted Jan 5, 2016·1 cites·13 claims
- 3262US2025210322A1Substrate processing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 3362US2025232948A1Ion beam reflector, substrate processing apparatus including the same, and substrate processing method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 3461US11127571B2Peripheral RF feed and symmetric RF return for symmetric RF deliveryLAM RES CORP·Filed 2020·Granted Sep 21, 2021·0 cites·17 claims
- 3561US2025266242A1Plasma etching devices and methods for fabricating semiconductor devices using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 3660US12494352B2Plasma confinement ring, semiconductor manufacturing apparatus including the same, and method of manufacturing a semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Dec 9, 2025·0 cites·15 claims
- 3760US2024304427A1Internal pressure control apparatus and substrate processing apparatus including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 3859US2025174443A1Substrate processing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 3958US2015053644A1Methods for Selectively Modifying RF Current Paths in a Plasma Processing SystemLAM RES CORP·Filed 2014·Application pending·0 cites
- 4058US2025218752A1Substrate processing apparatus, substate processing method using the same, and method of manufacturing semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 4157US2025085445A1Plasma light detection system including a scintillating windowSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 4254US2023142436A1Plasma edge ring, plasma etching apparatus including the same, and plasma etching method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
- 4353US9514918B2Guard aperture to control ion angular distribution in plasma processingNAM SANG KI·Filed 2014·Granted Dec 6, 2016·0 cites·15 claims
- 4453US2024234096A1Plasma processing apparatus and method for fabricating semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 4551US9253868B1Neutral beam source with plasma sheath-shaping neutralization gridAPPLIED MATERIALS INC·Filed 2014·Granted Feb 2, 2016·0 cites·20 claims
- 4651US2018005852A1Ion to neutral control for wafer processing with dual plasma source reactorLAM RES CORP·Filed 2017·Application pending·0 cites
- 4750US12272535B2Spectroscopic analysis method, method for fabricating semiconductor device using the same, and substrate process system using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Apr 8, 2025·0 cites·16 claims
- 4850US9927709B2Resist sensitivity and profile improvement via acid anion control during field-guided post exposure bakeAPPLIED MATERIALS INC·Filed 2016·Granted Mar 27, 2018·0 cites·19 claims
- 4950US9263240B2Dual zone temperature control of upper electrodesMARAKHTANOV ALEXEI·Filed 2012·Granted Feb 16, 2016·0 cites·10 claims
- 5049US2019122867A1Hollow cathode, an apparatus including a hollow cathode for manufacturing a semiconductor device, and a method of manufacturing a semiconductor device using a hollow cathodeSAMSUNG ELECTRONICS CO LTD·Filed 2018·Application pending·0 cites
Showing the top 50 of 61 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →